Patents by Inventor Kazutomo Miyazaki
Kazutomo Miyazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230201765Abstract: An abatement apparatus capable of treating exhaust gas with less wet treatment devices than a conventional abatement apparatus is disclosed. The abatement apparatus includes: a pre-wet treatment device; a combustion treatment device; gas introduction lines coupled to process chambers of a film forming device; first flow-path switching devices coupled to the plurality of gas it lines, respectively; a first gas delivery line extending from the first flow-path switching devices to the pre-wet treatment device; a second gas delivery line extending from the first flow-path switching devices to the combustion treatment device; and an operation controller configured to control operations of the first flow-path switching devices to deliver the process gas to the pre-wet treatment device and deliver the cleaning gas to the combustion treatment device.Type: ApplicationFiled: December 19, 2022Publication date: June 29, 2023Inventors: Satoru NAKAMURA, Kazutomo MIYAZAKI, Takeshi EDA
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Publication number: 20230017834Abstract: A sub-fab area installation apparatus capable of reducing a power consumption used in manufacturing of semiconductors is disclosed. The sub-fab area installation apparatus includes: a vacuum pump configured to evacuate a processing gas from a processing chamber of the semiconductor manufacturing equipment; a cooling unit configured to cool a first circulation liquid used in the processing chamber; a heating unit configured to heat a second circulation liquid used in the processing chamber; an abatement device configured to detoxify the processing gas discharged from the vacuum pump; and a cooling-liquid line configured to pass a cooling liquid therethrough. The cooling liquid is supplied from a cooling source. The cooling-liquid line includes: a first downstream line, a second downstream line, and a third downstream line configured to supply the cooling liquid that has passed through the abatement device, the vacuum pump, and the cooling unit to the heating unit.Type: ApplicationFiled: May 13, 2022Publication date: January 19, 2023Applicants: EBARA CORPORATION, EBARA REFRIGERATION EQUIPMENT & SYSTEMS CO., LTD.Inventors: Motoshi KOHAKU, Yukihiro FUKUSUMI, Nobutaka BANNAI, Hiromasa MIYATA, Naoya HANAFUSA, Ken TAOKA, Kazutomo MIYAZAKI
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Patent number: 11527422Abstract: There is provided an exhaust gas processing apparatus configured to cause a processing gas to be exposed to or come into contact with a liquid and thereby detoxify the processing gas. The exhaust gas processing apparatus comprises a suction casing provided with an inlet which the processing gas is sucked into and with an outlet which the processing gas is flowed out from; a liquid tank configured to receive an outlet-side part of the suction casing and store the liquid therein; and one or multiple spray nozzles placed in the liquid tank. The outlet of the suction casing is arranged to be located above a liquid surface of the liquid stored in the liquid tank. The one or multiple spray nozzles are configured to spray the liquid from around the outlet of the suction casing to a peripheral part of the outlet.Type: GrantFiled: August 3, 2020Date of Patent: December 13, 2022Assignee: EBARA CORPORATIONInventors: Takafumi Sekine, Takanori Inada, Kazutomo Miyazaki, Naoya Hanafusa
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Patent number: 11511226Abstract: A process gas suction structure for preventing a generation of products from a process gas due to a temperature drop is disclosed. The process gas suction structure includes a double tube structure, and a heating device configured to heat the double tube structure. The double tube structure includes a process-gas flow passage portion where the process gas flows, and a partition portion arranged outside of the process-gas flow passage portion.Type: GrantFiled: November 9, 2021Date of Patent: November 29, 2022Assignee: EBARA CORPORATIONInventors: Takafumi Sekine, Kazutomo Miyazaki
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Publication number: 20220375771Abstract: A sub-fab area installation apparatus includes: a vacuum pump configured to evacuate a processing gas from a processing chamber of the semiconductor manufacturing equipment; a cooling unit configured to cool a first circulation liquid used in the processing chamber; a heating unit configured to heat a second circulation liquid used in the processing chamber; and a cooling-liquid line configured to pass a cooling liquid therethrough. The cooling liquid is supplied from a cooling source. The cooling-liquid line includes: a distribution line configured to supply the cooling liquid to the vacuum pump and the cooling unit; and a merging return line configured to merge the cooling liquid that has passed through the vacuum pump and the cooling unit and return the cooling liquid to the cooling source.Type: ApplicationFiled: May 17, 2022Publication date: November 24, 2022Applicants: EBARA CORPORATION, EBARA REFRIGERATION EQUIPMENT & SYSTEMS CO., LTD.Inventors: Motoshi KOHAKU, Yukihiro FUKUSUMI, Nobutaka BANNAI, Hiromasa MIYATA, Naoya HANAFUSA, Ken TAOKA, Kazutomo MIYAZAKI
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Patent number: 11400406Abstract: A wet abatement system which can suppress the accumulation of foreign matters in a treatment gas line is proposed. There is provided a wet abatement system for detoxifying treatment gas by bringing the treatment gas into contact with liquid. The wet abatement system includes an inlet casing having an inlet port from which the treatment gas is let in and an outlet port provided below the inlet port and through which the treatment gas flows, and a liquid film forming device provided between the inlet port and the outlet port and configured to form a liquid film on an inner wall surface of the inlet casing. A heater configured to heat the inlet casing is embedded in an interior of a wall portion of the inlet casing, the wall portion constituting a portion situated above the liquid film forming device.Type: GrantFiled: February 20, 2019Date of Patent: August 2, 2022Assignee: EBARA CORPORATIONInventors: Takanori Inada, Kazumasa Hosotani, Kazutomo Miyazaki, Kohei Matsumoto
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Publication number: 20220193605Abstract: A process gas suction structure for preventing a generation of products from a process gas due to a temperature drop is disclosed. The process gas suction structure includes a double tube structure, and a heating device configured to heat the double tube structure. The double tube structure includes a process-gas flow passage portion where the process gas flows, and a partition portion arranged outside of the process-gas flow passage portion.Type: ApplicationFiled: November 9, 2021Publication date: June 23, 2022Inventors: Takafumi SEKINE, Kazutomo MIYAZAKI
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Patent number: 11090619Abstract: An exhaust system capable of diluting a hydrogen gas to a concentration below the lower explosive limit without requiring a large amount of dilution gas while preventing an increase in a pressure of an exhaust gas in a buffer tank is disclosed. The exhaust system performs, when a main valve disposed in an exhaust line is closed, an initial exhaust operation in which a gas heavier than the hydrogen gas is discharged from a lower part of a buffer tank while an inlet valve disposed in an inlet line and a first outlet valve disposed in an outlet line are opened to introduce the exhaust gas from an equipment in a tangential direction of a buffer tank.Type: GrantFiled: October 2, 2020Date of Patent: August 17, 2021Assignee: EBARA CORPORATIONInventors: Keisuke Matsushima, Kazutomo Miyazaki
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Publication number: 20210106955Abstract: An exhaust system capable of diluting a hydrogen gas to a concentration below the lower explosive limit without requiring a large amount of dilution gas while preventing an increase in a pressure of an exhaust gas in a buffer tank is disclosed. The exhaust system performs, when a main valve disposed in an exhaust line is closed, an initial exhaust operation in which a gas heavier than the hydrogen gas is discharged from a lower part of a buffer tank while an inlet valve disposed in an inlet line and a first outlet valve disposed in an outlet line are opened to introduce the exhaust gas from an equipment in a tangential direction of a buffer tank.Type: ApplicationFiled: October 2, 2020Publication date: April 15, 2021Inventors: Keisuke MATSUSHIMA, Kazutomo MIYAZAKI
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Publication number: 20210057236Abstract: There is provided an exhaust gas processing apparatus configured to cause a processing gas to be exposed to or come into contact with a liquid and thereby detoxify the processing gas. The exhaust gas processing apparatus comprises a suction casing provided with an inlet which the processing gas is sucked into and with an outlet which the processing gas is flowed out from; a liquid tank configured to receive an outlet-side part of the suction casing and store the liquid therein; and one or multiple spray nozzles placed in the liquid tank. The outlet of the suction casing is arranged to be located above a liquid surface of the liquid stored in the liquid tank. The one or multiple spray nozzles are configured to spray the liquid from around the outlet of the suction casing to a peripheral part of the outlet.Type: ApplicationFiled: August 3, 2020Publication date: February 25, 2021Inventors: Takafumi SEKINE, Takanori INADA, Kazutomo MIYAZAKI, Naoya HANAFUSA
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Patent number: 10920981Abstract: A burner head that constitutes a combustion chamber for an exhaust gas processing apparatus by being attached to an upper portion of a combustion chamber main body is provided. The burner head includes a chassis which has a cylindrical portion having a lower opening and in which a fastening module for removably fastening to the combustion chamber main body is provided, a fuel nozzle that blows fuel into the cylindrical portion, a combustion supporting gas nozzle that blows combustion supporting gas into the cylindrical portion, a processing gas nozzle that blows processing gas into the cylindrical portion, and a pilot burner that ignites the fuel and/or the combustion supporting gas.Type: GrantFiled: August 18, 2017Date of Patent: February 16, 2021Assignee: EBARA CORPORATIONInventors: Kazutomo Miyazaki, Tetsuo Komai, Seiji Kashiwagi, Kazumasa Hosotani, Takeshi Eda
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Patent number: 10557631Abstract: An exhaust gas treatment apparatus for treating an exhaust gas discharged from an EUV (Extreme Ultra Violet) exposure equipment by combustion treatment to make the exhaust gas harmless is disclosed. The exhaust gas treatment apparatus includes a cylindrical combustion chamber configured to combust a processing gas containing hydrogen, and a processing gas nozzle and an oxidizing gas nozzle provided on the combustion chamber and configured to blow the processing gas and an oxidizing gas, respectively, in a tangential direction to an inner circumferential surface of the combustion chamber, wherein the processing gas nozzle and the oxidizing gas nozzle are positioned in the same plane perpendicular to an axis of the combustion chamber.Type: GrantFiled: July 31, 2018Date of Patent: February 11, 2020Assignee: EBARA CORPORATIONInventors: Kazutomo Miyazaki, Tetsuo Komai, Seiji Kashiwagi
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Publication number: 20190262760Abstract: A wet abatement system which can suppress the accumulation of foreign matters in a treatment gas line is proposed. There is provided a wet abatement system for detoxifying treatment gas by bringing the treatment gas into contact with liquid. The wet abatement system includes an inlet casing having an inlet port from which the treatment gas is let in and an outlet port provided below the inlet port and through which the treatment gas flows, and a liquid film forming device provided between the inlet port and the outlet port and configured to form a liquid film on an inner wall surface of the inlet casing. A heater configured to heat the inlet casing is embedded in an interior of a wall portion of the inlet casing, the wall portion constituting a portion situated above the liquid film forming device.Type: ApplicationFiled: February 20, 2019Publication date: August 29, 2019Inventors: Takanori INADA, Kazumasa HOSOTANI, Kazutomo MIYAZAKI, Kohei MATSUMOTO
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Publication number: 20190212007Abstract: A burner head that constitutes a combustion chamber for an exhaust gas processing apparatus by being attached to an upper portion of a combustion chamber main body is provided. The burner head includes a chassis which has a cylindrical portion having a lower opening and in which a fastening module for removably fastening to the combustion chamber main body is provided, a fuel nozzle that blows fuel into the cylindrical portion, a combustion supporting gas nozzle that blows combustion supporting gas into the cylindrical portion, a processing gas nozzle that blows processing gas into the cylindrical portion, and a pilot burner that ignites the fuel and/or the combustion supporting gas.Type: ApplicationFiled: August 18, 2017Publication date: July 11, 2019Inventors: Kazutomo MIYAZAKI, Tetsuo KOMAI, Seiji KASHIWAGI, Kazumasa HOSOTANI, Takeshi EDA
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Patent number: 10215407Abstract: A hybrid stepping motor has a connector housing formed integrally with an insulator having an upper insulator and a lower insulator. The hybrid stepping motor includes a stator core and output terminals concentrically disposed outside the stator core. A wiring pattern serving as the output terminals has connector pins and land portions disposed eccentrically with respect to one another. The land portions are formed on an outer edge side of the wiring pattern. A surface, which is an uppermost surface of the wiring pattern, is located below a lowermost surface, in which jumper wires and lead wires pass, of the lower insulator. The lead wires are pulled out from a lower side, and are pulled out to guiding grooves.Type: GrantFiled: November 6, 2015Date of Patent: February 26, 2019Assignee: EBARA CORPORATIONInventors: Kazutomo Miyazaki, Tetsuo Komai, Toyoji Shinohara, Seiji Kashiwagi
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Publication number: 20190041058Abstract: An exhaust gas treatment apparatus for treating an exhaust gas discharged from an EUV (Extreme Ultra Violet) exposure equipment by combustion treatment to make the exhaust gas harmless is disclosed. The exhaust gas treatment apparatus includes a cylindrical combustion chamber configured to combust a processing gas containing hydrogen, and a processing gas nozzle and an oxidizing gas nozzle provided on the combustion chamber and configured to blow the processing gas and an oxidizing gas, respectively, in a tangential direction to an inner circumferential surface of the combustion chamber, wherein the processing gas nozzle and the oxidizing gas nozzle are positioned in the same plane perpendicular to an axis of the combustion chamber.Type: ApplicationFiled: July 31, 2018Publication date: February 7, 2019Inventors: Kazutomo MIYAZAKI, Tetsuo KOMAI, Seiji KASHIWAGI
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Patent number: 10086413Abstract: A powder discharge system is installed in a circulating water tank for collecting powder generated when an exhaust gas is treated in an exhaust gas treatment apparatus. The powder discharge system includes at least one eductor provided in the circulating water tank. The eductor has a nozzle configured to throttle a flow of water supplied from a pump for pumping water in the circulating water tank, a suction port configured to suck water in the circulating water tank into the eductor by utilizing a reduction of pressure generated when the flow of water is throttled by the nozzle, and a discharge port configured to eject the water sucked from the suction port together with the water discharged from the nozzle toward a bottom of the circulating water tank.Type: GrantFiled: June 12, 2014Date of Patent: October 2, 2018Assignee: EBARA CORPORATIONInventors: Kazutomo Miyazaki, Hiroshi Ikeda
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Publication number: 20180051878Abstract: A hybrid stepping motor has a connector housing formed integrally with an insulator having an upper insulator and a lower insulator. The hybrid stepping motor includes a stator core and output terminals concentrically disposed outside the stator core. A wiring pattern serving as the output terminals has connector pins and land portions disposed eccentrically with respect to one another. The land portions are formed on an outer edge side of the wiring pattern. A surface, which is an uppermost surface of the wiring pattern, is located below a lowermost surface, in which jumper wires and lead wires pass, of the lower insulator. The lead wires are pulled out from a lower side, and are pulled out to guiding grooves.Type: ApplicationFiled: November 6, 2015Publication date: February 22, 2018Inventors: Kazutomo MIYAZAKI, Tetsuo KOMAI, Toyoji SHINOHARA, Seiji KASHIWAGI
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Publication number: 20140366958Abstract: A powder discharge system is installed in a circulating water tank for collecting powder generated when an exhaust gas is treated in an exhaust gas treatment apparatus. The powder discharge system includes at least one eductor provided in the circulating water tank. The eductor has a nozzle configured to throttle a flow of water supplied from a pump for pumping water in the circulating water tank, a suction port configured to suck water in the circulating water tank into the eductor by utilizing a reduction of pressure generated when the flow of water is throttled by the nozzle, and a discharge port configured to eject the water sucked from the suction port together with the water discharged from the nozzle toward a bottom of the circulating water tank.Type: ApplicationFiled: June 12, 2014Publication date: December 18, 2014Inventors: Kazutomo Miyazaki, Hiroshi Ikeda
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Patent number: D700696Type: GrantFiled: September 13, 2012Date of Patent: March 4, 2014Assignee: Ebara CorporationInventors: Seiji Kashiwagi, Hiroshi Ikeda, Kazutomo Miyazaki