Abstract: A static pressure gas bearing used in a vacuum environment includes a guide shaft and a tubular slider which is movable in an axial direction in a state where the guide shaft is accommodated therein. The slider is configured by fastening a plurality of plate-shaped members. A film formed of a soft material having a smaller elastic modulus than that of each of the plate-shaped members is interposed between joint surfaces of the plate-shaped members.

Abstract: The present invention provides a vacuum stage device that moves a substrate to be processed in a vacuum environment. In a substrate transfer device in accordance with the present invention, a wafer mounted to a wafer platen is moved in a vacuum processing chamber. This substrate transfer device includes a first driving mechanism for moving the wafer platen in a Y1 direction, and a second driving mechanism that is provided in the vacuum processing chamber and linearly reciprocates the wafer platen in X1 and X2 directions at a high speed.

Abstract: The present invention provides a vacuum stage device that moves a substrate to be processed in a vacuum environment. In a substrate transfer device in accordance with the present invention, a wafer mounted to a wafer platen is moved in a vacuum processing chamber. This substrate transfer device includes a first driving mechanism for moving the wafer platen in a Y1 direction, and a second driving mechanism that is provided in the vacuum processing chamber and linearly reciprocates the wafer platen in X1 and X2 directions at a high speed.

Abstract: The present invention provides a vacuum stage device that moves a substrate to be processed in a vacuum environment. In a substrate transfer device in accordance with the present invention, a wafer mounted to a wafer platen is moved in a vacuum processing chamber. This substrate transfer device includes a first driving mechanism for moving the wafer platen in a Y1 direction, and a second driving mechanism that is provided in the vacuum processing chamber and linearly reciprocates the wafer platen in X1 and X2 directions at a high speed.

Abstract: A controlling and computing device performs the steps of: differentiating a slider position represented by a position detection signal fed from a position sensor, and calculating the velocity of the slider, differentiating the calculated velocity so as to calculate an acceleration: using a slider target position, the slider position, the velocity and the acceleration to calculate position instruction values to be fed to two servo amplifiers; performing a computation on the respectively calculated position instruction values, so as to compensate for a pressure change which has occurred in each of pressure chambers due to a change in the position of a pressure receiving plate in a cylinder chamber; and producing the respectively compensated position instruction values to the two servo amplifiers.

Abstract: An air pressure actuator has a partition wall provided on one of a slider and a guide shaft to form two cylinder chambers between the guide shaft and the slider. Intake/exhaust systems are connected with the two cylinder chambers for supplying a compressed air into the cylinder chambers or discharging the same therefrom. Two servo valves including a large capacity servo valve and a small capacity servo valve are respectively connected with the intake/exhaust systems. A position detector for detecting the position of the slider is provided on the slider. A control device receives the detection results of the position detector and a position instruction value, to select the large capacity servo valve or the small capacity servo valve in accordance with an acceleration or deceleration zone and a constant speed zone of the slider, and to control an opening degree of a selected servo valve.

Abstract: A controlling and computing device performs the steps of: differentiating a slider position represented by a position detection signal fed from a position sensor, and calculating the velocity of the slider, differentiating the calculated velocity so as to calculate an acceleration: using a slider target position, the slider position, the velocity and the acceleration to calculate position instruction values to be fed to two servo amplifiers; performing a computation on the respectively calculated position instruction values, so as to compensate for a pressure change which has occurred in each of pressure chambers due to a change in the position of a pressure receiving plate in a cylinder chamber; and producing the respectively compensated position instruction values to the two servo amplifiers.

Abstract: An air pressure actuator has a partition wall provided on one of a slider and a guide shaft to form two cylinder chambers between the guide shaft and the slider. Intake/exhaust systems are connected with the two cylinder chambers for supplying a compressed air into the cylinder chambers or discharging the same therefrom. Two servo valves including a large capacity servo valve and a small capacity servo valve are respectively connected with the intake/exhaust systems. A position detector for detecting the position of the slider is provided on the slider. A control device receives the detection results of the position detector and a position instruction value, to select the large capacity servo valve or the small capacity servo valve in accordance with an acceleration or deceleration zone and a constant speed zone of the slider, and to control an opening degree of a selected servo valve.

Abstract: A press apparatus includes a movable member having a mold-mounting surface for mounting a movable mold thereon and at least four guide surfaces; and a guide member having at least four guide surfaces facing the corresponding guide surfaces of the movable member. Fluid is injected into a space formed between the guide surfaces of the movable member and the corresponding guide surfaces of the guide member such that the mutually facing guide surfaces are held in a noncontacting condition.

Abstract: The present invention provides a vacuum stage device that moves a substrate to be processed in a vacuum environment. In a substrate transfer device in accordance with the present invention, a wafer mounted to a wafer platen is moved in a vacuum processing chamber. This substrate transfer device includes a first driving mechanism for moving the wafer platen in a Y1 direction, and a second driving mechanism that is provided in the vacuum processing chamber and linearly reciprocates the wafer platen in X1 and X2 directions at a high speed.