Abstract: In a rotating electrical machine, a magnet unit and an armature core member are configured to satisfy the following relation Br×Ma?Bsc×Wsc. In the relation, Br represents a remanent flux density of the magnet unit, Ma represents a distance of a farther circumferential surface of each of first magnets in the circumferential direction, Bsc represents a saturation magnetic flux density of the armature core member, and Wsc represents a thickness of the armature core member in a radial direction thereof.

Abstract: An armature winding includes a plurality of winding segments each of which is made of a winding of a conductor wire member. The winding segments are arranged at a given interval away from each other in a circumferential direction of the armature winding and face a magnet unit. Each of the conductor wire members is made of a bundle of a plurality of wires. Each winding segment includes a pair of straight portions and link portions. The straight portions extend straight in an axial direction of a rotor. The link portion connect the straight portions together. Each of the straight portions is made of turns of the conductor wire member which are arranged in the form of multiple columns and layers. Each link portion is shaped to have a space factor lower than those in the straight portions of the winding segment.

Abstract: A stator with a multi-phase stator winding including phase windings each made of several winding segments, the segments including intermediate conductor portions arranged away from each other in a circumferential direction and link portions located at first and second radial end sides and connect the paired intermediate conductor portions into an annular shape. The winding segments are adjacent each other in a circumferential direction partially overlapping in the circumferential direction and include first and second winding segments overlapping each other in the circumferential direction. The link portions of the first winding segments are bent radially inward at at least one of axially opposed ends of the stator winding. The link portions of the second winding segments are bent radially outward at the at least one of the axially opposed ends of the stator winding. These link portions are arranged not overlapping in an axial direction of the stator.

Abstract: An armature includes an armature coil including a plurality of coil modules and a base member including a cylindrical back core. Each of the coil modules includes a corresponding partial winding of the armature coil and a back-yoke-side insulating wall formed on the back yoke side of the corresponding partial winding. The coil modules are arranged, on a radially inner side or a radially outer side of the base member, in alignment with each other in a circumferential direction. The base member has a plurality of first engaging portions formed therein and each of the coil modules has at least one second engaging portion formed in the back-yoke-side insulating wall thereof. The coil modules are fixed to the base member with each of the first engaging portions of the base member engaging with a corresponding one of the second engaging portions of the coil modules in the circumferential direction.

Abstract: The rotating electric machine includes a stator having a stator winding and a rotor facing the stator in a radial direction. The rotor includes a carrier having a disk-shaped end plate section fixed to a rotating shaft and arranged coaxially with the rotating shaft, and an annular magnet unit arranged coaxially with the rotating shaft. The magnet has a cylindrical magnet holder whose one end in an axial direction is fixed to the end plate section, and a magnet fixed to a peripheral surface on a stator side in the radial direction in the magnet holder and having an alternating polarity in a circumferential direction. The magnet holder is made of a non-magnetic material. In the magnet, an orientation of an axis of easy magnetization on a q-axis is deviated from an orientation parallel to the q-axis.

Abstract: In a rotating electrical machine, a field generator includes a magnet unit and a cylindrical magnet holder. The magnet unit includes circular-arc magnets arranged in the circumferential direction. Each magnet has an outer peripheral surface, and first and second end surfaces in the circumferential direction. Recesses are formed in the outer peripheral surface of the magnet unit. Each recess is configured to open toward a radially outside direction. Elastic members are respectively located in installation spaces. Each installation space is defined between a corresponding one recess and the inner peripheral surface of the magnet holder. Each elastic member is installed in a corresponding one installation space while being in compressed state therein to create elastic force. The elastic forces of the respective elastic members are configured to press the magnets radially inward.

Abstract: In a rotating electric machine, a field element includes: a circular annular magnet portion that includes magnetic poles of which polarities alternate in a circumferential direction; and a cylindrical magnet holding portion where the magnet portion is fixed on an inner circumferential surface of the magnet portion. An armature is arranged to oppose the magnet portion on an inner side in a radial direction of the magnet portion. The magnet portion includes circular-arc-shaped magnets arranged in an array in the circumferential direction. In each magnet, both end surfaces in the circumferential direction are along the radial direction and in contact with a magnet adjacent in the circumferential direction. The magnet holding portion is reduced in size such that, in a state where the magnets are arrayed in the circumferential direction, an outer circumference of the magnets is reduced from an outer side toward an inner side in the radial direction.

Abstract: In a rotating electrical machine, a field generator includes a magnet unit and a cylindrical magnet holder. The magnet unit includes circular-arc magnets arranged in the circumferential direction. Each magnet has an outer peripheral surface. The magnet unit includes a magnet fastening member configured to fasten the magnets. Each magnet has first and second end surfaces in the circumferential direction. The first end surface of each magnet is located to be in contact with the magnet located adjacent to the first end surface thereof. The second end surface of each magnet is located to be in contact with the magnet located adjacent to the second end surface thereof. The magnet fastening member is wound around the outer peripheral surfaces of the circumferentially arranged magnets to radially and inwardly press the outer peripheral surfaces of the circumferentially arranged magnets.

Abstract: In a rotating electrical machine, a magnet unit and an armature core member are configured to satisfy the following relation Br×Ma?Bsc×Wsc. In the relation, Br represents a remanent flux density of the magnet unit, Ma represents a distance of a farther circumferential surface of each of first magnets in the circumferential direction, Bsc represents a saturation magnetic flux density of the armature core member, and Wsc represents a thickness of the armature core member in a radial direction thereof.

Abstract: There is provided a roller including: a roller body part; and a rubber part attached to the roller body part, the rubber part including: a rubber body part provided on an outer circumference of the roller body part; and a side extending part extending on a side face of the roller body part from a side face of the rubber body part, wherein the roller body part has a recess portion formed on the side face of the roller body part, and into which the side extending part is fitted.

Abstract: There is provided a roller including: a roller body part; and a rubber part attached to the roller body part, the rubber part including: a rubber body part provided on an outer circumference of the roller body part; and a side extending part extending on a side face of the roller body part from a side face of the rubber body part, wherein the roller body part has a recess portion formed on the side face of the roller body part, and into which the side extending part is fitted.

Abstract: A method and system are described for determining lithographic processing conditions for a lithographic process. After obtaining input, a first optimization is made for illumination source and mask design under conditions of allowing non-rectangular sub-resolution assist features. Thereafter, mask design is optimized in one or more further optimizations for which only rectangular sub-resolution assist features are allowed. The latter results in good lithographic processing while limiting the complexity of the mask design.

Abstract: A method and system are described for determining lithographic processing conditions for a lithographic process. After obtaining input, a first optimization is made for illumination source and mask design under conditions of allowing non-rectangular sub-resolution assist features. Thereafter, mask design is optimized in one or more further optimizations for which only rectangular sub-resolution assist features are allowed. The latter results in good lithographic processing while limiting the complexity of the mask design.

Abstract: To provide a mask that it becomes possible to perform destructive inspection without a mask for inspection or to perform more accurately non-destructive inspection and a method of inspecting the same. A mask comprising a thin film for exposure that has a transmission portion and a non-transmission portion of a beam for exposure, a thick film portion that is formed around the thin film for exposure and that supports the thin film for exposure, and a thin film for inspection that has a transmission portion and a non-transmission portion of the beam for exposure, that is formed at a distance from a thin film for exposure and that has thickness and material equal to those of a thin film for exposure, and a method of inspection of a mask that inspection is performed by using a thin film for inspection, and a method of producing a semiconductor device that lithography is performed by using a thin film for exposure of the mask.