Abstract: A plasma processing apparatus includes a processing chamber in which a sample is subjected to plasma processing, a first radio frequency power supply that supplies radio frequency power for generating plasma, a sample stage on which the sample is mounted, and a second radio frequency power supply that supplies radio frequency power to the sample stage, the plasma processing apparatus further includes a DC power supply that applies a DC voltage, that is changed according to a periodically repeated waveform, to the sample stage, and the waveform of one cycle has a period in which amplitude changes by a predetermined amount or more during a predetermined time. Accordingly, charged particles on a wafer surface are removed, a trench shape with high verticality can be obtained, and damage to a film that is not to be etched inside a trench can be reduced.

Abstract: An electrical connection structure comprises a base member, a connector, and a mating connector. The electrical connection structure comprises a half-fitting detecting mechanism including a half-fitting detecting portion in the connector and a short-circuiting member in the mating connector. The half-fitting detecting portion includes a conductive member and an inspecting member. The half-fitting detecting portion allows a half-fitting state to be detected by the short-circuiting member being in non-contact with the inspecting member when in the half-fitting state. The inspecting member short-circuits with the conductive member via the short-circuiting member by the mating engaging portion of the short-circuiting member being engaged with the engaging portion of the connector and being in contact with a contact part of the inspecting member and the short-circuiting member being in contact with the conductive member when in a normal fitting state.

Abstract: An electrical connection structure comprises a base member, a connector, and a mating connector. The electrical connection structure comprises a half-fitting detecting mechanism including a half-fitting detecting portion in the connector and a short-circuiting member in the mating connector. The half-fitting detecting portion includes a conductive member and an inspecting member. The half-fitting detecting portion allows a half-fitting state to be detected by the short-circuiting member being in non-contact with the inspecting member when in the half-fitting state. The inspecting member short-circuits with the conductive member via the short-circuiting member by the mating engaging portion of the short-circuiting member being engaged with the engaging portion of the connector and being in contact with a contact part of the inspecting member and the short-circuiting member being in contact with the conductive member when in a normal fitting state.