Patents by Inventor Kazuya Konaga
Kazuya Konaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10062551Abstract: A sputtering apparatus includes a chamber, a substrate holder, first to fourth target holders, a shutter unit, and a gate valve through which the substrate is conveyed. The first to fourth target holders are arranged on vertices of a virtual rectangle having long sides and short sides and inscribed in a virtual circle centered on the axis, the first target holder and the second target holder are respectively arranged on two vertices defining one short side of the virtual rectangle, and a distance to the gate valve is shorter than distances from the third target holder and the fourth target holder to the gate valve.Type: GrantFiled: May 28, 2015Date of Patent: August 28, 2018Assignee: CANON ANELVA CORPORATIONInventors: Shigenori Ishihara, Kazuya Konaga, Hiroyuki Toya, Shintaro Suda, Yasushi Yasumatsu, Yuu Fujimoto, Toshikazu Nakazawa, Eiji Nakamura, Shin Imai
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Patent number: 9322095Abstract: A film-forming apparatus includes a plurality of target electrodes, a substrate holder for holding a substrate, a first shutter member rotatably provided between the plurality of target electrodes and the substrate holder and having a plurality of openings, first separating walls provided on a surface of the first shutter member, the surface being on the target electrode side; and second separating walls provided between the first shutter member and the target electrodes, wherein the first separating walls are provided so as to sandwich each of the plurality of openings of the first shutter member.Type: GrantFiled: October 15, 2013Date of Patent: April 26, 2016Assignee: CANON ANELVA CORPORATIONInventors: Yuji Kajihara, Yasushi Yasumatsu, Kazuya Konaga
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Patent number: 9322094Abstract: The present invention provides a film forming apparatus configured such that the occurrence of contamination is reduced between targets. The film forming apparatus includes: a plurality of target electrodes respectively having attachment surfaces to which targets can be attached; a substrate holder for holding a substrate at a position opposing the plurality of target electrodes; a first shutter member rotatably provided between the plurality of target electrodes and the substrate holder and having a plurality of openings that can oppose the attachment surfaces; and a shield member disposed adjacent to the first shutter member and having a number of openings equal to the number of the target electrodes, wherein a gap between the first shutter member and the shield member widens toward an outer perimeter from a portion where adjacent target electrodes are closest.Type: GrantFiled: November 1, 2013Date of Patent: April 26, 2016Assignee: CANON ANELVA CORPORATIONInventors: Yuji Kajihara, Yasushi Yasumatsu, Kazuya Konaga
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Publication number: 20150262796Abstract: A sputtering apparatus includes a chamber, a substrate holder, first to fourth target holders, a shutter unit, and a gate valve through which the substrate is conveyed. The first to fourth target holders are arranged on vertices of a virtual rectangle having long sides and short sides and inscribed in a virtual circle centered on the axis, the first target holder and the second target holder are respectively arranged on two vertices defining one short side of the virtual rectangle, and a distance to the gate valve is shorter than distances from the third target holder and the fourth target holder to the gate valve.Type: ApplicationFiled: May 28, 2015Publication date: September 17, 2015Applicant: CANON ANELVA CORPORATIONInventors: Shigenori ISHIHARA, Kazuya KONAGA, Hiroyuki TOYA, Shintaro SUDA, Yasushi YASUMATSU, Yuu FUJIMOTO, Toshikazu NAKAZAWA, Eiji NAKAMURA, Shin IMAI
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Patent number: 9109285Abstract: An apparatus includes a plurality of target electrodes having attachment surfaces, a substrate holder, a first shutter member provided between the plurality of target electrodes and the substrate holder and having a plurality of openings, a first separating portion disposed between the openings of the first shutter member on its surface of the target electrode side, and a second separating portion disposed between the first shutter member and the target electrodes. The first shutter member is driven so as to bring the first separating portion and the second separating portion toward each other so that an indirect path can be formed between the first separating portion and the second separating portion, and driven so as to bring the first separating portion and the second separating portion away from each other so that the first shutter plate can be rotated.Type: GrantFiled: December 16, 2013Date of Patent: August 18, 2015Assignee: Canon Anelva CorporationInventors: Yuji Kajihara, Yasushi Yasumatsu, Kazuya Konaga
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Publication number: 20140102889Abstract: An apparatus includes a plurality of target electrodes having attachment surfaces, a substrate holder, a first shutter member provided between the plurality of target electrodes and the substrate holder and having a plurality of openings, a first separating portion disposed between the openings of the first shutter member on its surface of the target electrode side, and a second separating portion disposed between the first shutter member and the target electrodes. The first shutter member is driven so as to bring the first separating portion and the second separating portion toward each other so that an indirect path can be formed between the first separating portion and the second separating portion, and driven so as to bring the first separating portion and the second separating portion away from each other so that the first shutter plate can be rotated.Type: ApplicationFiled: December 16, 2013Publication date: April 17, 2014Applicant: CANON ANELVA CORPORATIONInventors: Yuji Kajihara, Yasushi Yasumatsu, Kazuya Konaga
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Publication number: 20140054167Abstract: The present invention provides a film forming apparatus configured such that the occurrence of contamination is reduced between targets. The film forming apparatus includes: a plurality of target electrodes respectively having attachment surfaces to which targets can be attached; a substrate holder for holding a substrate at a position opposing the plurality of target electrodes; a first shutter member rotatably provided between the plurality of target electrodes and the substrate holder and having a plurality of openings that can oppose the attachment surfaces; and a shield member disposed adjacent to the first shutter member and having a number of openings equal to the number of the target electrodes, wherein a gap between the first shutter member and the shield member widens toward an outer perimeter from a portion where adjacent target electrodes are closest.Type: ApplicationFiled: November 1, 2013Publication date: February 27, 2014Applicant: CANON ANELVA CORPORATIONInventors: Yuji Kajihara, Yasushi Yasumatsu, Kazuya Konaga
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Publication number: 20140034489Abstract: A film-forming apparatus includes a plurality of target electrodes, a substrate holder for holding a substrate, a fires shutter member rotatably provided between the plurality of target electrodes and the substrate holder and having a plurality of openings, first separating walls provided on a surface of the first shutter member, the surface being on the target electrode side; and second separating walls provided between the first shutter member and the target electrodes, wherein the first separating walls are provided so as to sandwich each of the plurality of openings of the first shutter member.Type: ApplicationFiled: October 15, 2013Publication date: February 6, 2014Applicant: CANON ANELVA CORPORATIONInventors: Yuji Kajihara, Yasushi Yasumatsu, Kazuya Konaga
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Patent number: 8303785Abstract: A plasma processing apparatus includes a chamber, substrate stage, electrode, conductive members, and deposition shield. The chamber is maintained at a predetermined potential. The substrate stage serves to hold a substrate within the chamber. The electrode serves to generate a plasma inside the chamber by applying AC power to the chamber. The conductive members connect the substrate stage and the side wall of the chamber by surrounding the plasma space between the substrate stage and the electrode in plasma formation, and at least some of them are separated by being moved by a driving mechanism so as to form an opening for loading a substrate onto the substrate stage while no plasma is being formed. The deposition shield covers the surfaces of the conductive members on the side of the plasma space.Type: GrantFiled: December 28, 2010Date of Patent: November 6, 2012Assignee: Canon Anelva CorporationInventors: Yoh Tanaka, Kazuya Konaga, Eisaku Watanabe, Eitaro Morimoto
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Publication number: 20110089023Abstract: A plasma processing apparatus includes a chamber, substrate stage, electrode, conductive members, and deposition shield. The chamber is maintained at a predetermined potential. The substrate stage serves to hold a substrate within the chamber. The electrode serves to generate a plasma inside the chamber by applying AC power to the chamber. The conductive members connect the substrate stage and the side wall of the chamber by surrounding the plasma space between the substrate stage and the electrode in plasma formation, and at least some of them are separated by being moved by a driving mechanism so as to form an opening for loading a substrate onto the substrate stage while no plasma is being formed. The deposition shield covers the surfaces of the conductive members on the side of the plasma space.Type: ApplicationFiled: December 28, 2010Publication date: April 21, 2011Applicant: CANON ANELVA CORPORATIONInventors: YOH TANAKA, KAZUYA KONAGA, EISAKU WATANABE, EITARO MORIMOTO