Abstract: A sanitizing system for a vehicle includes an ultraviolet light source mounted on the vehicle and configured to irradiate an irradiation target with an ultraviolet ray so as to sanitize the irradiation target and a control unit configured to control the ultraviolet light source to be turned on and off. The sanitizing system may further include an illumination light source configured to illuminate the irradiation target of the ultraviolet light source. The control unit may turn on the illumination light source when the ultraviolet light source is turned on. The control unit may be configured to carry out a first detection that an occupant outside the vehicle approaches the vehicle and turn on the ultraviolet light source in response to the first detection.

Abstract: A sanitizing system for a vehicle includes an ultraviolet light source mounted on the vehicle and configured to irradiate an irradiation target with an ultraviolet ray so as to sanitize the irradiation target and a control unit configured to control the ultraviolet light source to be turned on and off. The sanitizing system may further include an illumination light source configured to illuminate the irradiation target of the ultraviolet light source. The control unit may turn on the illumination light source when the ultraviolet light source is turned on. The control unit may be configured to carry out a first detection that an occupant outside the vehicle approaches the vehicle and turn on the ultraviolet light source in response to the first detection.

Abstract: Provided is a polyether polyamide composition including 100 parts by mass of a polyether polyamide in which a diamine constituent unit thereof is derived from a specified polyether diamine compound and a xylylenediamine, and a dicarboxylic acid constituent unit thereof is derived from an ?,?-linear aliphatic dicarboxylic acid having from 4 to 20 carbon atoms, having blended therein from 0.01 to 15 parts by mass of at least one molecular chain extender selected from a carbodiimide compound and a compound containing two or more epoxy groups in a molecule thereof.

Abstract: Provided is a polyether polyamide fiber including a polyether polyamide in which a diamine constituent unit thereof is derived from a specified polyether diamine compound and a xylylenediamine, and a dicarboxylic acid constituent unit thereof is derived from an ?,?-linear aliphatic dicarboxylic acid having from 4 to 20 carbon atoms.

Abstract: Provided is a polyether polyamide composition including 100 parts by mass of a polyether polyamide resin in which a diamine constituent unit thereof is derived from a specified polyether diamine compound and a xylylenediamine, and a dicarboxylic acid constituent unit thereof is derived from an ?,?-linear aliphatic dicarboxylic acid having from 4 to 20 carbon atoms, having blended therein from 15 to 200 parts by mass of a filler.

Abstract: Provided is a moisture absorbing and releasing material including a polyether polyamide in which a diamine constituent unit thereof is derived from a specified polyether diamine compound (A-1) and a xylylenediamine (A-2), and a dicarboxylic acid constituent unit thereof is derived from an ?,?-linear aliphatic dicarboxylic acid having from 4 to 20 carbon atoms, wherein in the case where when held at 23° C. and 80% RH, its coefficient of saturated moisture absorption is defined as 100%, a normalized coefficient of moisture absorption after holding in an environment at 23° C. and 80% RH until a coefficient of moisture absorption reaches a saturated state and then further holding in an environment at 23° C. and 50% RH for 60 minutes is from 1 to 50%.

Abstract: Provided is a polyether polyamide composition including a polyether polyamide in which a diamine constituent unit thereof is derived from a specified polyether diamine compound and a xylylenediamine, and a dicarboxylic acid constituent unit thereof is derived from an ?,?-linear aliphatic dicarboxylic acid having from 4 to 20 carbon atoms and a stabilizer.

Abstract: Provided is a polyether polyamide composition including 100 parts by mass of a polyether polyamide in which a diamine constituent unit thereof is derived from a specified polyether diamine compound and a xylylenediamine, and a dicarboxylic acid constituent unit thereof is derived from an ?,?-linear aliphatic dicarboxylic acid having from 4 to 20 carbon atoms, having blended therein from 0.01 to 15 parts by mass of at least one molecular chain extender selected from a carbodiimide compound and a compound containing two or more epoxy groups in a molecule thereof.

Abstract: A composition for the etching treatment of a resin molded article. The composition is composed of an aqueous solution containing 20 to 1,200 g/l of an inorganic acid, 0.01 to 10 g/l of a manganese salt, and 1 to 200 g/l of at least one component selected from the group consisting of halogen oxoacids, halogen oxoacid salts, persulfate salts, and bismuthate salts. The etching composition of the invention is an etching solution capable of forming a plating film having a good adhesion to various resin molded articles made of ABS resins or the like, and can be used in place of chromic acid mixtures. The composition is highly safe so that the liquid waste is easily disposed of.

Abstract: The present invention provides a pretreatment process for electroless plating of a resin molded article, comprising etching the resin molded article using a manganate salt-containing etching solution, and then bringing the resin molded article into contact with an aqueous solution containing a reducing compound and an inorganic acid; and a plating process of a resin molded article comprising the pretreatment process. Further, the present invention provides various treatment agents for use in the plating process. According to the present invention, a plating layer with sufficient adhesion can be formed when an etching treatment is performed using a manganate salt-containing etching solution in an electroless plating treatment of a resin molded article.

Abstract: The present invention provides a composition for the etching treatment of a resin molded article. The composition is composed of an aqueous solution containing 20 to 1,200 g/l of an inorganic acid, 0.01 to 10 g/l of a manganese salt, and 1 to 200 g/l of at least one component selected from the group consisting of halogen oxoacids, halogen oxoacid salts, persulfate salts, and bismuthate salts. The etching composition of the invention is a novel etching solution capable of forming a plating film having a good adhesion to various resin molded articles made of ABS resins or the like, and can be used in place of chromic acid mixtures. The composition is highly safe so that the liquid waste is easily disposed of.

Abstract: A browser, with a web page screen-reading function, displays a web page easy to read in synchronism with text screen-reading is possible. The browser determines whether lateral scroll during normal page displaying is occurred reduces, if occurred, the width of displayed component of the display page below the width of the display area and displays the component to be displayed within reduced area to reconstruct the layout of page. The browser, thus, conducts the reconstructed page displayed and vertical scroll so that the character string corresponding to the screen-read part aurally outputted can be displayed.

Abstract: A hydrophilic collector for alkaline secondary batteries is formed of a nonwoven fabric plated with nickel in which the nonwoven fabric is hydrophilized by sulfonation, a gaseous fluorine treatment, or vinyl monomer grafting. A method for making the collector includes a hydrophilizing step of a nonwoven fabric comprising at least one of a polyolefin fiber and a polyamide fiber, and a plating step of applying nickel plating to the hydrophilic nonwoven fabric. Preferably, the nickel plating is electroless plating, and the nonwoven fabric has a plurality of micropores extending from one surface to the other surface thereof. An electroplating film may be deposited on the electroless plated film, if necessary. This collector facilitates assembling a battery which exhibits improved high-rate discharge characteristics due to improved adhesiveness of the plated nickel film to the nonwoven fabric.

Abstract: A phosphor pattern for a field emission display panel (FED) is provided. The phosphor pattern is formed by a process which comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) selectively irradiating active light to (A) the photosensitive resin composition layer containing a phosphor; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been selectively irradiated by development to form a pattern; and (IV) calcining the pattern to remove unnecessary portion to form the phosphor pattern. Also provided are this process for forming the phosphor pattern, a photosensitive element for a FED and a FED display panel.

Abstract: A hydrophilic collector for alkaline secondary batteries is formed of a nonwoven fabric plated with nickel in which the nonwoven fabric is hydrophilized by sulfonation, a gaseous fluorine treatment, or vinyl monomer grafting. A method for making the collector includes a hydrophilizing step of a nonwoven fabric comprising at least one of a polyolefin fiber and a polyamide fiber, and a plating step of applying nickel plating to the hydrophilic nonwoven fabric. Preferably, the nickel plating is electroless plating, and the nonwoven fabric has a plurality of micropores extending from one surface to the other surface thereof. An electroplating film may be deposited on the electroless plated film, if necessary. This collector facilitates assembling a battery which exhibits improved high-rate discharge characteristics due to improved adhesiveness of the plated nickel film to the nonwoven fabric.

Abstract: A hydrophilic collector for alkaline secondary batteries is formed of a nonwoven fabric plated with nickel in which the nonwoven fabric is hydrophilized by sulfonation, a gaseous fluorine treatment, or vinyl monomer grafting. A method for making the collector includes a hydrophilizing step of a nonwoven fabric comprising at least one of a polyolefin fiber and a polyamide fiber, and a plating step of applying nickel plating to the hydrophilic nonwoven fabric. Preferably, the nickel plating is electroless plating, and the nonwoven fabric has a plurality of micropores extending from one surface to the other surface thereof. An electroplating film may be deposited on the electroless plated film, if necessary. This collector facilitates assembling a battery which exhibits improved high-rate discharge characteristics due to improved adhesiveness of the plated nickel film to the nonwoven fabric.

Abstract: A phosphor pattern for a field emission display panel (FED) is provided. The phosphor pattern is formed by a process which comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) selectively irradiating active light to (A) the photosensitive resin composition layer containing a phosphor; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been selectively irradiated by development to form a pattern; and (IV) calcining the pattern to remove unnecessary portion to form the phosphor pattern. Also provided are this process for forming the phosphor pattern, a photosensitive element for a FED and a FED display panel.

Abstract: A phosphor pattern for a field emission display panel (FED) is provided. The phosphor pattern is formed by a process whichh comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) selectively irradiating active light to (A) the photosensitive resin composition layer containing a phosphor, for forming a pattern; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been selectively irradiated by development, to form the pattern; and (IV) calcining the pattern to remove an unnecessary portion, to form the phosphor pattern. Also provided ar this process for forming the phosphor pattern, a photosensitive element for a FED and a field emission display panel.

Abstract: Disclosed are a phosphor pattern which comprises a calcination product of a phosphor pattern precursor containing

Abstract: Disclosed are a phosphor pattern which comprises a calcination product of a phosphor pattern precursor containing (A) an organic material containing at least one selected from the group consisting of an alkali metal and an alkaline earth metal; and (B) a phosphor wherein an amount of the alkali metal or the alkaline earth metal is 2% by weight or less based on the amount of (B) the phosphor, a process for preparing the same, an organic alkali developing solution for forming the same, an emulsion developing solution for forming the same and a back plate for plasma display using the same.