Abstract: A temperature adjustment mold for adjusting a temperature of a preform that is injection-molded, has a bottomed shape, and is made of resin includes one or more adjusting portions that face a part of an outer peripheral surface of a body portion of the preform and locally heat a predetermined portion in a circumferential direction of the preform. The adjusting portion is disposed such that a gap is formed in the circumferential direction, and an attachment position is adjustable in the circumferential direction.

Abstract: A novel ionic liquid is provided. A highly safe secondary battery with high charge and discharge capacity is provided. The ionic liquid includes a cation represented by General Formula (G1) and an anion represented by Structural Formula (200). In the formula, X1 to X3 each independently represent any one of fluorine, chlorine, bromine, and iodine. One of X1 to X3 may be hydrogen. In addition, n and m each independently represent 0 to 5. Furthermore, a secondary battery including the above-described ionic liquid is provided.

Abstract: A novel method for forming a positive electrode active material is provided. The method for forming a positive electrode active material includes causing a reaction between a cobalt aqueous solution and an alkaline aqueous solution to form a cobalt compound; mixing the cobalt compound and a lithium compound and performing a first heat treatment to form a first composite oxide; mixing the first composite oxide and a compound containing a first additive element and performing a second heat treatment to form a second composite oxide; and mixing the second composite oxide and a compound containing a second additive element and performing a third heat treatment. The first heat treatment is performed at a temperature higher than or equal to 700° C. and lower than or equal to 1100° C. The second heat treatment is performed at a temperature higher than or equal to 700° C. and lower than or equal to 1000° C.

Abstract: The present invention provides a plating film that exhibits good adhesion to glass substrates. The present invention is a plating film comprising an oxide layer, an electroless plating film, and an electrolytic copper plating film in this order.

Abstract: The present invention provides a plating film that exhibits good adhesion to glass substrates. The present invention is a plating film comprising an oxide layer, an electroless plating film, and an electrolytic copper plating film in this order.

Abstract: Method for forming a metal film includes forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, removing fluorine in the oxide layer, supporting a catalyst on the oxide layer by bringing the oxide layer into contact with a catalyst solution, and depositing a metal film on the oxide layer by bringing the oxide layer into contact with an electroless plating liquid.

Abstract: A method for forming a metal film includes forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, removing fluorine in the oxide layer, supporting a catalyst on the oxide layer by bringing the oxide layer into contact with a catalyst solution, and depositing a metal film on the oxide layer by bringing the oxide layer into contact with an electroless plating liquid.

Abstract: A method for forming a metal film includes forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, removing fluorine in the oxide layer, supporting a catalyst on the oxide layer by bringing the oxide layer into contact with a catalyst solution, and depositing a metal film on the oxide layer by bringing the oxide layer into contact with an electroless plating liquid.

Abstract: A positive electrode active material in which a discharge capacity decrease due to charge and discharge cycles is suppressed and a secondary battery including the positive electrode active material are provided. A positive electrode active material in which a change in a crystal structure, e.g., a shift in CoO2 layers is small between a discharged state and a high-voltage charged state is provided. For example, a positive electrode active material that has a layered rock-salt crystal structure belonging to the space group R-3m in a discharged state and a crystal structure belonging to the space group P2/m in a charged state where x in LixCoO2 is greater than 0.1 and less than or equal to 0.24 is provided. When the positive electrode active material is analyzed by powder X-ray diffraction, a diffraction pattern has at least diffraction peaks at 2? of 19.47±0.10° and 2? of 45.62±0.05°.

Abstract: The present invention relates to a secondary battery and an electronic device. The secondary battery includes a positive electrode active material which exhibits a broad peak at around 4.55 V in a dQ/dVvsV curve obtained when the charge depth is increased. The secondary battery includes a positive electrode active material which, even when the charge voltage is greater than or equal to 4.6 V and less than or equal to 4.8 V and the charge depth is greater than or equal to 0.8 and less than 0.9, does not have the H1-3 type structure and can maintain a crystal structure where a shift in CoO2 layers is inhibited. The broad peak at around 4.55 V in the dQ/dVvsV curve indicates that a change in the energy necessary for extraction of lithium at around the voltage is small and a change in the crystal structure is small. Accordingly, the positive electrode active material hardly suffers a shift in CoO2 layers and a volume change and is relatively stable even when the charge depth is large.

Abstract: An occurrence of a dimple during glass polishing is suppressed by scraping a fine scratch that will become the dimple to be grown in a pre-polishing, followed by main polishing. However, at a mark of the dimple in which the growth thereof is suppressed in the pre-polishing, fine roughening of a surface is generated. Further, a polishing liquid containing hydrofluoric acid, an alkali metal, water, and a surfactant that is a sulfonic acid-type or sulfate-type surfactant can suppress excess crystal growth of a deposit formed in a fine scratch in pre-polishing and suppress roughening of a surface after polishing.

Abstract: When an alkali-free glass is polished with a polishing liquid containing hydrofluoric acid as a main component, a sludge is generated on a glass surface and in a storage unit and a pipe of a polishing device. As a result, there arise problems such as deterioration of quality and stopping of the device. A washing liquid that dissolves a sludge containing aluminum and fluorine produced in a glass polishing device is characterized by containing Al3+ ions, and a sludge formed by bonding a divalent element such as Mg, Ca, Sr, and Ba with Al and F can be dissolved with this washing liquid. The problems are solved by washing the inside of the polishing device with this washing liquid.

Abstract: An engagement-member attaching device that is configured, when a connection member is discharged from a rear portion of a body of the device after an engagement member is removed from an engagement-member train, to reduce a burden imposed on an operator and reliably feed the engagement-member train. In a feed mechanism 70, a feeding member 72 is backwardly pivoted based on an operation force of an operation lever 12 against a biasing force of a feeding spring 74 from its feeding position to its preparation position, and then, with the operation force being released, the feeding member 72 is forwardly pivoted by the biasing force of the feeding spring 74 from its preparation position to its feeding position. A booster 100 is provided between a piston member 22 and the feeding member 72, so that a forward force applied to the piston member 22 is boosted and then transmitted to the feeding member 72.

Abstract: The present invention relates to an analyzing device (1) used with an analytical tool (2) mounted to the device, where the analytical tool provides a reaction field including sample liquid and includes a first and a second electrodes (20A, 20B) for applying voltage to the reaction field. The analyzing device (1) includes a connector (10) coming into contact with the first and the second electrodes (20A, 20B), an analysis circuit (13) for performing sample analysis based on sample liquid information obtained from the analytical tool (2) through the connector (10), and a disturbing-noise countermeasure unit (11) which absorbs disturbing noise and which is provided closer to the connector (10) than to the analysis circuit (13).