Abstract: Provided is a modified diene based polymer in which a diene based polymer is graft modified with a polyether having a mercapto group attached via diurethane bonding. Formation of diurethane bonding is performed by allowing sequential reactions of two species of hydroxyl group-containing compounds with an diisocyanate compound. By adding the modified diene based polymer to a silica-containing rubber composition for automobile pneumatic tires, the dispersibility of silica compounded in the rubber composition can be improved, and a property inherent in silica which simultaneously allows a reduction of rolling resistance and a stability on wet road surfaces can be sufficiently effected.

Abstract: Provided is a terminal borinic acid group-modified polymer having a borinic acid group at least at a molecular terminus thereof, comprising a polymer of at least one of a styrene monomer and a diene monomer. The above terminal borinic acid group-modified polymer may be manufactured by performing a polymerization reaction of at least one of a styrene monomer and a diene monomer in the presence of an anionic polymerization initiator, and then adding a cyclic boronic anhydride to quench the polymerization reaction. When the resulting terminal borinic acid group-modified polymer is added to a silica-containing rubber composition for automobile pneumatic tires as a component thereof, the dispersibility of silica compounded therein can be improved, fully achieving a performance of a good balance between reduced rolling resistance inherent in silica and stability on a wet road.

Abstract: Provided is a modified diene based polymer in which a diene based polymer is graft modified with a polyether having a mercapto group attached via diurethane bonding. Formation of diurethane bonding is performed by allowing sequential reactions of two species of hydroxyl group-containing compounds with an diisocyanate compound. By adding the modified diene based polymer to a silica-containing rubber composition for automobile pneumatic tires, the dispersibility of silica compounded in the rubber composition can be improved, and a property inherent in silica which simultaneously allows a reduction of rolling resistance and a stability on wet road surfaces can be sufficiently effected.

Abstract: Polymerizable combinations, comprising at least one first component selected from the group of benzoxazine monomers and at least one second component selected from the group of aromatic esters are described. Further on the use of aromatic esters as additives to benzoxazine monomers as well as methods of coating a device by heating the above mentioned combination, and a device, coated by that way is explained.

Abstract: Polymerizable combinations, comprising at least one first component selected from the group of benzoxazine monomers and at least one second component selected from the group of aromatic esters are described. Furtheron the use of aromatic esters as additives to benzoxazine monomers as well as methods of coating a device by heating the above mentioned combination, and a device, coated by that way is explained.

Abstract: The present invention relates to 1,3-oxathiolane-2-thione compounds of the general formula (I): wherein R1 and R2 are the same or different, each of which denotes a straight-chain or branched alkoxy residue with 1 to 6 carbon atoms or an aryloxy or aralkyloxy residue, R3 is different or the same as R1 or R2 or an aliphatic residue, an amino residue, a halogen residue, an aromatic or heteroaromatic residue, or an araliphatic or heteroaraliphatic residue, R4 is a bridging group selected from the groups consisting of aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic and heteroaromatic groups and R5 is hydrogen, an aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic, heteroaromatic, cycloaliphatic or heterocycloaliphatic group or R4 and R5 form a cycloaliphatic, cycloheteroaliphatic, aromatic or heteroaromatic residue, which is optionally substituted with an aliphatic, heteroaliphatic residue serving as a bridging group to the silicon atom and X and Y are different and sele

Abstract: The present invention relates to the use of one or more 6-membered lactones condensed to an aromatic or heteroaromatic moiety as shrinkage-suppressing agents in amine-curing epoxy compositions, such compositions and the use of such compositions in adhesives, sealants and coatings.

Abstract: To provide a positive resist composition having high sensitivity, small defocus latitude depended on line pitch and less surface roughening at the etching, which can be suitably used for micro-photofabrication using far ultraviolet ray, particularly, ArF excimer laser ray. A positive resist composition comprising (A) a resin containing specific two kinds of repeating units, which has an aliphatic cyclic hydrocarbon group on the side chain and increases the dissolution rate in an alkali developer under the action of an acid, and (B) a specific compound capable of generating an acid upon irradiation with actinic rays or radiation, or a positive resist composition comprising (A) two kinds of resins as the resin having an aliphatic cyclic hydrocarbon group on the side chain and capable of increasing the dissolution rate in an alkali developer under the action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.

Abstract: A radiation-sensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation, and (B) a resin containing a repeating unit having a specific group, which increases the solubility in an alkali developing solution by the action of an acid.

Abstract: The present invention relates to 1,3-oxathiolane-2-thione compounds of the general formula (I): wherein R1 and R2 are the same or different, each of which denotes a straight-chain or branched alkoxy residue with 1 to 6 carbon atoms or an aryloxy or aralkyloxy residue, R3 is different or the same as R1 or R2 or an aliphatic residue, an amino residue, a halogen residue, an aromatic or heteroaromatic residue, or an araliphatic or heteroaraliphatic residue, R4 is a bridging group selected from the groups consisting of aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic and heteroaromatic groups and R5 is hydrogen, an aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic, heteroaromatic, cycloaliphatic or heterocycloaliphatic group or R4 and R5 form a cycloaliphatic, cycloheteroaliphatic, aromatic or heteroaromatic residue, which is optionally substituted with an aliphatic, heteroaliphatic residue serving as a bridging group to the silicon atom and X and Y are different and sel

Abstract: The present invention provides is a thin film analyzing method which can be applied to various fields, and which makes it possible to detect and analyze in a simple manner, with high precision, a distribution of a specific component in a thin film formed on a support. The method for analyzing a constituent of a thin film comprises a cutting step of cutting the thin film obliquely, and an analyzing step of analyzing a specific component in the cut section of the thin film. In this cutting step, the thin film is preferably cut with a microtome to which a cutting edge made of glass is fitted knife made of glass. The analysis of the distribution of the specific component in the cut section is suitably analyzed by TOF-SIMS or ?-ESCA. The method is particularly useful for analyzing an image recording layer of a planographic printing plate precursor which comprises a water-insoluble and alkali-soluble resin, an infrared ray absorber, and a colorant.

Abstract: A positive photoresist composition comprises: an acid-decomposable resin containing a specified repeating unit; an acid-generator; and a specified dissolution-inhibiting compound.

Abstract: The intermediate layer material composition for a multilayer resist process in the present invention, which is soluble in an organic solvent, excellent in storage stability, and has no problem with regard to a footing shape, a pattern separation and a line edge roughness in patterning an upper resist, and a pattern formation process using the intermediate layer material composition, in which the intermediate layer material composition for a multilayer resist process, comprises a polymer (component A) containing a repeating unit having on a side chain thereof a specific structure containing a silicon atom-oxygen atom bond, and the pattern formation process using the same.

Abstract: A negative resist composition comprises: (A) an alkali-soluble resin; (B) a compound capable of generating an acid upon irradiation with a radiation; (C) a crosslinking agent capable of crosslinking by the action of an acid; and (D) a solvent mixture containing: at least one solvent selected from the group A below; and at least one selected from the group consisting of the group B below and the group C below: group A: a propylene glycol monoalkyl ether carboxylate; group B: a propylene glycol monoalkyl ether, an alkyl lactate, an acetic ester, a chain ketone and an alkyl alkoxypropionate; group C: a ?-butyrolactone, an ethylene carbonate and a propylene carbonate.

Abstract: An intermediate layer composition for a three-layer resist process comprising (A) an octakis(silsesquioxane) skeleton-containing polymer obtained by hydrosilylation polymerization of a compound represented by formula (I) defined in the specification with bis(substituted ethynyl) compound in the presence of a platinum-containing catalyst.

Abstract: The present invention provides is a thin film analyzing method which can be applied to various fields, and which makes it possible to detect and analyze in a simple manner, with high precision, a distribution of a specific component in a thin film formed on a support. The method for analyzing a constituent of a thin film comprises a cutting step of cutting the thin film obliquely, and an analyzing step of analyzing a specific component in the cut section of the thin film. In this cutting step, the thin film is preferably cut with a microtome to which a cutting edge made of glass is fitted knife made of glass. The analysis of the distribution of the specific component in the cut section is suitably analyzed by TOF-SIMS or &mgr;-ESCA. The method is particularly useful for analyzing an image recording layer of a planographic printing plate precursor which comprises a water-insoluble and alkali-soluble resin, an infrared ray absorber, and a colorant.

Abstract: A positive resist composition comprising: (A) a polymer having a silicon atom in a side chain thereof, which is insoluble or sparingly soluble in an aqueous alkali solution and becomes soluble in an aqueous alkali solution by an action of an acid; and (B) an acid generator capable of generating an acid on exposure to active light rays or a radiation, which is represented by the formula (I) defined in the present specification.

Abstract: The intermediate layer material composition for a multilayer resist process in the present invention, which is soluble in an organic solvent, excellent in storage stability, and has no problem with regard to a footing shape, a pattern separation and a line edge roughness in patterning an upper resist, and a pattern formation process using the intermediate layer material composition, in which the intermediate layer material composition for a multilayer resist process, comprises a polymer (component A) containing a repeating unit having on a side chain thereof a specific structure containing a silicon atom-oxygen atom bond, and the pattern formation process using the same.

Abstract: A radiation-sensitive composition comprising:

Abstract: A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray, which is excellent in sensitivity and resolution and has a rectangular profile, comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, and a crosslinking agent which initiates crosslinking by the acid: