Abstract: A mechanism of predicting a change in process values with respect to a control target and using a prediction result is provided. A management apparatus includes a prediction model unit, with respect to which an input-output relationship between multivariate control values at a time T with respect to a control target and multivariate process values at a time T+?T with respect to the control target has been learned; and an optimization model unit configured to seek multivariate control values of the time T that minimize respective differences between the multivariate process values at the time T+?T output from the prediction model unit and corresponding target values, and control the control target using the multivariate control values of the time T that have been sought.

Abstract: A management system for managing a substrate manufacturing process includes agent units configured to monitor a state of a substrate processing device that performs the substrate manufacturing process and detect a predetermined event, and transmission paths configured to, when a predetermined event is detected in any one of the agent units, transmit and receive information between the agent units based on the detected event, wherein the one agent unit derives an instruction to the substrate processing device based on the information transmitted and received via the transmission paths so that an index value of the substrate manufacturing process is optimized.

Abstract: A data collection system includes: a first substrate processing apparatus having a first processing space, a second substrate processing apparatus having a second processing space, and a data collection apparatus connected to the first substrate processing apparatus and the second substrate processing apparatus. The data collection apparatus is configured to compare observed data observed when substrates having the same or similar shapes are processed under the same processing conditions in the first processing space and the second processing space, respectively, and calculate a correction amount for correcting the observed data observed when being processed in the second processing space, and correct the observed data observed when being processed in the second processing space based on the correction amount, and collect corrected observed data, when searching for a processing condition by processing substrates while changing the processing condition in the second processing space.

Abstract: A support information display method is provided with an acquiring process for acquiring a first image by photographing, via a camera provided in a head mount display, a predetermined part of a substrate processing apparatus as a maintenance object, an estimating process for estimating the support information related to the predetermined part in the first image from information stored in a database, an image creating process for creating a second image by converting the support information estimated in the estimating process into an image, and a displaying process for displaying the second image on the head mount display in order for the operator to visually recognize the support information.

Abstract: A clean-room monitoring device for monitoring the interior of a clean-room having a floor in which a removable cover such as a grating or a non-porous cover is disposed, includes: a monitoring camera which captures an image of the removable cover; a monitor which detects the existence of an opening exposed when the removable cover is removed, based on an image signal obtained from the monitoring camera, detects the presence of a workman approaching the opening if it is detected that the opening exists, and outputs a warning signal if the workman is detected; and a warning generator which receives the warning signal from monitor and issues a warning.

Abstract: A fabrication equipment monitoring device which monitors, by a server and a portable terminal capable of communicating with the server, specifies the fabrication equipment toward which image capture element is faced, extracts the fabrication equipment information of the specified fabrication equipment from the storage unit based on the location information acquired by the location information acquisition unit, a direction information detected by the direction detection unit, an angle of view of the image capture element and the layout information when the image capture element is faced toward the fabrication equipment and displays at least a portion of the extracted fabrication equipment information on the display unit.

Abstract: A clean-room monitoring device for monitoring the interior of a clean-room having a floor in which a removable cover such as a grating or a non-porous cover is disposed, includes: a monitoring camera which captures an image of the removable cover; a monitor which detects the existence of an opening exposed when the removable cover is removed, based on an image signal obtained from the monitoring camera, detects the presence of a workman approaching the opening if it is detected that the opening exists, and outputs a warning signal if the workman is detected; and a warning generator which receives the warning signal from monitor and issues a warning.

Abstract: A support information display method is provided with an acquiring process for acquiring a first image by photographing, via a camera provided in a head mount display, a predetermined part of a substrate processing apparatus as a maintenance object, an estimating process for estimating the support information related to the predetermined part in the first image from information stored in a database, an image creating process for creating a second image by converting the support information estimated in the estimating process into an image, and a displaying process for displaying the second image on the head mount display in order for the operator to visually recognize the support information.