Patents by Inventor Kazuyo Ono

Kazuyo Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming pattern and treating agent for use therein
    Patent number: 7018785
    Abstract: A method of forming resist patterns comprises the steps of (a) applying and forming a chemically amplified photoresist film, (b) applying a treating agent with a pH value of 1.3 to 4.5 onto said chemically amplified photoresist film, (c) baking said chemically amplified photoresist film after at least one of the steps of applying and forming said chemically amplified photoresist film and applying said treating agent, (d) selectively exposing said chemically amplified photoresist film, (e) post exposure-baking said chemically amplified photoresist film, and (f) developing said chemically amplified photoresist film, wherein the contact angle of a non-exposed portion of said chemically amplified photoresist film to a developing solution after wash with water to remove the treating agent on the photoresist and spin-drying before development is made lower by 10° to 110° than that in the case where said treating agent is not applied.
    Type: Grant
    Filed: October 24, 2001
    Date of Patent: March 28, 2006
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Kazuyo Ono, Yusuke Takano, Hatsuyuki Tanaka, Satoru Funato