Abstract: A method for manufacturing a component made of a hard brittle material includes: a step of preparing a base material made of a hard brittle material; and a step of embossing the base material. A protrusion protruding in a first direction and a bottom surface surrounding the protrusion are formed on the base material by the embossing. The bottom surface extends in a plane defined by a second direction intersecting the first direction and a third direction intersecting the first direction and the second direction. The bottom surface and a side surface of the protrusion continuous with the bottom surface satisfy a relationship of z=Ax2?Bx in a cross section defined by the first direction and the second direction when the first direction is represented by z and the second direction is represented by x. A is 0.005 to 0.200 and B is 0.050 to 0.955.

Abstract: A blasting apparatus includes: a storage container including a storage chamber; a volumetric feeder; and a nozzle configured to project, together with compressed air, an abrasive supplied from the volumetric feeder, wherein: the volumetric feeder includes: a casing configured to define a space on an inside, and including an introduction port causing the space and the storage chamber to communicate with each other and a supply port opened toward a lower side in a position separated from the introduction port in a horizontal direction; and a screw including a rotational shaft housed in the casing and extending along the horizontal direction, the screw configured to carry the abrasive in the space toward the supply port from the introduction port by rotating about the rotational shaft; wherein the screw is housed in the casing in such a way as not to overlap the supply port in a vertical direction.

Abstract: A polishing method includes: a step of preparing a polishing device including a processing member and a suction mechanism configured to generate suction force; a step of setting a workpiece in the processing member; and a step of accelerating abrasive grains fed toward the workpiece to a predetermined speed with an air flow generated by operation of the suction mechanism, and polishing the workpiece by causing the abrasive grains to contact with or collide with the workpiece.

Abstract: A touch panel-equipped display device includes at least: a display control unit to supply a scan signal and a data signal to a display control element; and a touch position detection control unit to supply a drive signal to a drive electrode, and to detect a position detection signal from a detection electrode to detect a touch position. The display control unit supplies the data signal sequentially to a plurality of display control elements connected respectively to a plurality of pixel electrodes constituting one display pixel. The touch position detection control unit starts supplying the drive signal, in a period that is within a scan write period during which the scan signal is supplied to the display control element and is other than a period during which the data signal is supplied to the display control element corresponding to a color highest in luminosity of a plurality of colors.

Abstract: The display device of the present invention includes: a display panel having an outer shape that is curved as a whole and is partially provided with multiple linear outer edge portions; and a circuit member including a main part and multiple branches coupled with the main part. Each of the linear outer edge portions is provided with a terminal on the front surface side of the display panel. The main part is provided with a driver. Each of the branches is provided with a conductive line that electrically couples the driver and the terminal. Each of ends of the branches is attached to the corresponding linear outer edge portion and is bent along the corresponding linear outer edge portion from the front surface side toward the back surface of the display panel. The main part is disposed on the back surface side of the display panel.

Abstract: A touch panel-equipped display device includes at least: a display control unit to supply a scan signal and a data signal to a display control element; and a touch position detection control unit to supply a drive signal to a drive electrode, and to detect a position detection signal from a detection electrode to detect a touch position. The display control unit supplies the data signal sequentially to a plurality of display control elements connected respectively to a plurality of pixel electrodes constituting one display pixel. The touch position detection control unit starts supplying the drive signal, in a period that is within a scan write period during which the scan signal is supplied to the display control element and is other than a period during which the data signal is supplied to the display control element corresponding to a color highest in luminosity of a plurality of colors.

Abstract: A polishing device includes a processing vessel into which workpieces are charged, a fluidizing unit that fluidizes the workpieces in the processing vessel, an abrasive-feeding unit that feeds an abrasive into the workpieces, and a suction unit that generates an air flow in a direction in which the abrasive passes through the processing vessel, and recovers the abrasive by suction. The abrasive fed from the abrasive-feeding unit is allowed to pass between the workpieces charged into the processing vessel by the air flow generated from the suction unit while coming into contact with the workpieces. Accordingly, the workpieces are polished.

Abstract: A polishing method includes: a step of preparing a polishing device including a processing member and a suction mechanism configured to generate suction force; a step of setting a workpiece in the processing member; and a step of accelerating abrasive grains fed toward the workpiece to a predetermined speed with an air flow generated by operation of the suction mechanism, and polishing the workpiece by causing the abrasive grains to contact with or collide with the workpiece.

Abstract: A centrifugal barrel includes a disc-like turret configured to turn about a revolution shaft, a plurality of barrel tanks each installed in the turret via a rotation shaft and configured to turn about the rotation shaft, a rotating mechanism configured to turn the turret and the barrel tanks, and a tilting mechanism configured to tilt the revolution shaft of the turret with respect to a horizontal plane and to tilt each rotation shaft with respect to the horizontal plane. By tilting each rotation shaft with respect to the horizontal plane, it is possible to prevent the workpieces from being damaged.

Abstract: A polishing device includes a processing vessel into which workpieces are charged, a fluidizing unit that fluidizes the workpieces in the processing vessel, an abrasive-feeding unit that feeds an abrasive into the workpieces, and a suction unit that generates an air flow in a direction in which the abrasive passes through the processing vessel, and recovers the abrasive by suction. The abrasive fed from the abrasive-feeding unit is allowed to pass between the workpieces charged into the processing vessel by the air flow generated from the suction unit while coming into contact with the workpieces. Accordingly, the workpieces are polished.

Abstract: The present invention provides an apparatus for removing the unnecessary thin-film layer on the periphery of the substrate of the plate-like member having a square shape, on the surface of which substrate is formed a thin-film layer. The apparatus comprises a chamber to treat the peripheral part where the peripheral part of the plate-like member is inserted and where the unnecessary thin-film layer on the peripheral part of the plate-like member is removed; and a means to move the plate-like member. The chamber to treat the peripheral part comprises a cover to prevent the scattering of the sprayed particles and the dust for treating the peripheral part, the cover having one of its end-sides that forms a ceiling being closed and having the other end-side that is opposed to the ceiling being open and a suctioning cover for treating the peripheral part, having an opening that has the same shape as the opening of the cover to prevent the scattering of the dust.

Abstract: A centrifugal barrel includes a disc-like turret configured to turn about a revolution shaft, a plurality of barrel tanks each installed in the turret via a rotation shaft and configured to turn about the rotation shaft, a rotating mechanism configured to turn the turret and the barrel tanks, and a tilting mechanism configured to tilt the revolution shaft of the turret with respect to a horizontal plane and to tilt each rotation shaft with respect to the horizontal plane. By tilting each rotation shaft with respect to the horizontal plane, it is possible to prevent the workpieces from being damaged.

Abstract: A warp correction apparatus includes an injection mechanism including a nozzle that performs injection treatment, an adsorption table that holds the semiconductor element substrate by adsorption at a principal surface side or a film surface side, a moving mechanism that moves the adsorption table so that the semiconductor element substrate relatively moves with respect to an injection area of an injection particle by the nozzle, an injection treatment chamber that houses the semiconductor element substrate held on the adsorption table and in the interior of which injection treatment is performed, a measurement mechanism that measures a warp of the semiconductor element substrate, and a control device that, based on a difference between a target warp amount and a warp amount measured by the measurement mechanism, performs at least either one of a setting processing of an injection treatment condition of the injection mechanism and an accept/reject determination of the semiconductor element substrate for which

Abstract: A warp correction apparatus includes an injection mechanism including a nozzle that performs injection treatment, an adsorption table that holds the semiconductor element substrate by adsorption at a principal surface side or a film surface side, a moving mechanism that moves the adsorption table so that the semiconductor element substrate relatively moves with respect to an injection area of an injection particle by the nozzle, an injection treatment chamber that houses the semiconductor element substrate held on the adsorption table and in the interior of which injection treatment is performed, a measurement mechanism that measures a warp of the semiconductor element substrate, and a control device that, based on a difference between a target warp amount and a warp amount measured by the measurement mechanism, performs at least either one of a setting processing of an injection treatment condition of the injection mechanism and an accept/reject determination of the semiconductor element substrate for which

Abstract: A warp correction apparatus includes an injection mechanism including a nozzle that performs injection treatment, an adsorption table that holds the substrate by adsorption at a principal surface side or a film surface side, a moving mechanism that moves the adsorption table so that the substrate relatively moves with respect to an injection area of an injection particle by the nozzle, an injection treatment chamber that houses the substrate held on the adsorption table and in the interior of which injection treatment is performed, a measurement mechanism that measures a warp of the substrate, and a control device that, based on a difference between a target warp amount and a warp amount measured by the measurement mechanism, performs at least either one of a setting processing of an injection treatment condition of the injection mechanism and an accept/reject determination of the substrate for which injection treatment has been performed.

Abstract: A nozzle, a nozzle unit having a plurality of nozzles, and a blasting machine equipped with the nozzle unit, which can achieve a micro-machining with a high precision and a high productivity for the blasting process. A portion for escape 13c is formed at the distal end of the ejecting portion 13 of the nozzle 11, so if the distance between the surface of the work and the nozzle 11 is shortened to suppress the broadening of the flow of the abrasives, the reflected abrasives do not remain within the space between the surface of the work and the distal end of the ejecting portion 13. Thus, a blasting process with a high precision can be achieved. Further, since two nozzles 11m and 11n can be arranged so as to correspond to the width of the surface of the work to be processed by a rotational device 16, it is possible to blast a wider area of the surface of the work while the nozzle unit 10 or the blasting machine 20 sweep one time. Thus, the high productivity of the blasting process can be achieved.

Abstract: A warp correction apparatus includes an injection mechanism including a nozzle that performs injection treatment, an adsorption table that holds the substrate by adsorption at a principal surface side or a film surface side, a moving mechanism that moves the adsorption table so that the substrate relatively moves with respect to an injection area of an injection particle by the nozzle, an injection treatment chamber that houses the substrate held on the adsorption table and in the interior of which injection treatment is performed, a measurement mechanism that measures a warp of the substrate, and a control device that, based on a difference between a target warp amount and a warp amount measured by the measurement mechanism, performs at least either one of a setting processing of an injection treatment condition of the injection mechanism and an accept/reject determination of the substrate for which injection treatment has been performed.

Abstract: This invention provides a conveying apparatus and a blasting machine equipped with the conveying apparatus that can prevent workpieces from being damaged by the used abrasives attached to the conveying rollers. For the conveying apparatus, a peripheral part 33a disposed at the peripheral surface of a rolling member 33 of a rolling roller 31 is made of a softer elastic material than the material of the panel P, wherein when used abrasives get stuck between the peripheral part 33a of the rolling member 33 and the panel P, since the peripheral part 33a acts as a cushioning material that can reduce the force caused by the used abrasives and loaded on the panel P, even if the panel P is made of a fragile material, such as glass, the panel P can be conveyed without flaws being caused by the used abrasives.

Abstract: The present invention provides an apparatus for removing the unnecessary thin-film layer on the periphery of the substrate of the plate-like member having a square shape, on the surface of which substrate is formed a thin-film layer. The apparatus comprises a chamber to treat the peripheral part where the peripheral part of the plate-like member is inserted and where the unnecessary thin-film layer on the peripheral part of the plate-like member is removed; and a means to move the plate-like member. The chamber to treat the peripheral part comprises a cover to prevent the scattering of the sprayed particles and the dust for treating the peripheral part, the cover having one of its end-sides that forms a ceiling being closed and having the other end-side that is opposed to the ceiling being open and a suctioning cover for treating the peripheral part, having an opening that has the same shape as the opening of the cover to prevent the scattering of the dust.

Abstract: A noise cancellation unit includes: a duct connected to an outlet of an electronic apparatus and configured to pass an exhaust flow discharged from the outlet therethrough; a first microphone provided to the duct; a speaker provided to the duct downstream of the first microphone; a second microphone provided to the duct downstream of the speaker; a first windscreen wall configured to prevent the exhaust flow from colliding with the first microphone; a second windscreen wall configured to prevent the exhaust flow from colliding with the second microphone; and a signal processing circuit configured to generate, based on outputs of the first microphone and the second microphone, a sound signal for removing a noise included in the exhaust flow and supply the sound signal to the speaker.