Abstract: PCR primers for detecting Bifidobacterium infantis comprising: a pair of a first oligonucleotide having a sequence of 20 or more continuous nucleotides selected from a nucleotide sequence of SEQ ID NO: 1 and a second oligonucleotide having a nucleotide sequence of SEQ ID NO: 2 or a nucleotide sequence of SEQ ID NO: 2 in which 0 to 7 nucleotides has been deleted from its 5?-terminal side is used to perform PCR using a chromosomal DNA or 16S rRNA of test bacteria as a template, and whether an amplicon of Bifidobacterium infantis is present or not is determined.

Abstract: PCR primers for detecting Bifidobacterium infantis comprising: a pair of a first oligonucleotide having a sequence of 20 or more continuous nucleotides selected from a nucleotide sequence of SEQ ID NO: 1 and a second oligonucleotide having a nucleotide sequence of SEQ ID NO: 2 or a nucleotide sequence of SEQ ID NO: 2 in which 0 to 7 nucleotides has been deleted from its 5?-terminal side is used to perform PCR using a chromosomal DNA or 16S rRNA of test bacteria as a template, and whether an amplicon of Bifidobacterium infantis is present or not is determined.

Abstract: In order to perform scrub cleaning of a substrate, two different scrub heads 31 and 32 are employed. The scrub head 31 is superior to the scrub head 32 in terms of a capability of removing contamination. The scrub head 32 has a low level of adhesion to the contamination as compared with the scrub head 31. The scrub heads 31 and 32 are moved such that the scrub head 32 follows the scrub head 31. Consequently, it is possible to clean the substrate without re-applying contamination, which has been once removed from a surface of the substrate, to the surface of the substrate again.

Abstract: In order to perform scrub cleaning of a substrate, two different scrub heads 31 and 32 are employed. The scrub head 31 is superior to the scrub head 32 in terms of a capability of removing contamination. The scrub head 32 has a low level of adhesion to the contamination as compared with the scrub head 31. The scrub heads 31 and 32 are moved such that the scrub head 32 follows the scrub head 31. Consequently, it is possible to clean the substrate without re-applying contamination, which has been once removed from a surface of the substrate, to the surface of the substrate again.

Abstract: A processing apparatus is provided for cleaning a wafer W. In the apparatus, a carbonated solution in the form of mist is ejected onto the wafer W through a nozzle 41, so that the film of carbonated solution, i.e., a conductive liquid film is formed on the wafer W. Next, a pure water highly pressurized by a jet pump 47 is ejected on the wafer W for cleaning it. The film of carbonated solution prevents devices built on the wafer W from being broken electrostatically. A liquid passage 52 from a supply source 51 of the carbonated solution up to the nozzle 41 is made of material which does not dissolve its metallic components into the carbonated solution in spite of the contact of the liquid passage 52 with the carbonated solution.

Abstract: A drive unit 42 for driving a brush 8 is provided on a tip of a rotatable arm 26. The drive unit 42 includes a motor 61 for driving the processing member 24 having a brush 58 for rotation and an adjustment mechanism 45 for adjusting a force to urge the processing member 24 against a wafer W. With no intermediary of a flexible transmitting means, such as a belt, the processing member 24 is securely joined to the motor 61 through a shaft 55 and driven by the motor 61 directly. The adjustment mechanism 45 is constituted by an electromagnetic actuator which includes a stationary element 46 and a movable element 48 capable of elevating along the stationary element 46. The motor 61 is coupled to the armature 48. The adjustment mechanism 45 controls the position of the processing member 24 with respect to the upward and downward direction as well as the force to urge the processing member 24 against a wafer W.