Patents by Inventor Kazuyoshi Nawata

Kazuyoshi Nawata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5215863
    Abstract: Disclosed herein is a resin composition or a solder resist resin composition comprising an epoxy resin (A) and/or an epoxy acrylate (B) obtained by reacting one chemical equivalent of epoxy groups in an epoxy resin with 0.1 to 1.0 chemical equivalent of acrylic acid, a styrene-maleic anhydride copolymer (C), an unsaturated group-containing compound (D) other than (B), and a photopolymerization initiator (E).
    Type: Grant
    Filed: October 11, 1991
    Date of Patent: June 1, 1993
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Kazuyoshi Nawata, Tetsuo Ohkubo, Minoru Yokoshima
  • Patent number: 5049628
    Abstract: The present invention relates to an unsaturated group-containing polycarboxylic acid resin produced by reacting an epoxidized compound of a condensate of a phenolic compound and an aromatic aldehyde having a phenolic hydroxyl group with (meth)acrylic acid, and further reacting the reaction product with polybasic carboxylic acid or an anhydride thereof; a composition comprising the resin and a cured product of the resin or the composition.The composition according to the present invention is developable with an aqueous alkaline solution and suitable for a solder resist composition which is excellent in heat resistance, solvent resistance, adhesion, electric insulation property and storage stability.
    Type: Grant
    Filed: September 27, 1989
    Date of Patent: September 17, 1991
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Kazuyoshi Nawata, Tetsuo Ohkubo, Minoru Yokoshima
  • Patent number: 4636534
    Abstract: Disclosed herein is a photopolymerizable composition comprising poly-N-vinylpyrrolidone (A); a compound (B) represented by the formula (I): ##STR1## wherein each of R.sup.1, R.sup.2 and R.sup.3 represents a hydrogen atom or a methyl group; an acid amide (C) represented by the formula (II): ##STR2## wherein R.sup.4 represents a hydrogen atom or a methyl group and a monomeric compound (D) having an acryloyl group or a methacryloyl group in the molecule thereof as well as optionally a photopolymerization-initiator (E).
    Type: Grant
    Filed: October 29, 1985
    Date of Patent: January 13, 1987
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Kazuyoshi Nawata, Masahito Katayama, Minoru Yokoshima
  • Patent number: 4540809
    Abstract: Disclosed herein are ethylenically unsaturated compounds represented by the formula: ##STR1## wherein R represents a hydrogen atom or a methyl group, on the average m and n respectively represent a value of 1 to 5, on the average p represents a value of 1 to 6, on the average q and r represent respectively a value of 0 to 3, on the average s represents a value of 0 to 5, p+q+r+s is 6: q+r is a value of 0 to 3, p+s is a value of 3 to 6 and the average value of mp+nq is 1 to 30, and a method for producing the same.
    Type: Grant
    Filed: June 24, 1983
    Date of Patent: September 10, 1985
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Minoru Yokoshima, Kazuyoshi Nawata, Tetsuo Ohkubo, Hideaki Hattori
  • Patent number: 4536588
    Abstract: Acetal glycol diacrylates of the formula: ##STR1## wherein R.sub.1 represents H or CH.sub.3 and R.sub.2 represents CH.sub.3, C.sub.2 H.sub.5 or C.sub.3 H.sub.7,and a process for producing them are provided.
    Type: Grant
    Filed: June 13, 1983
    Date of Patent: August 20, 1985
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Minoru Yokoshima, Kazuyoshi Nawata, Tetsuo Ohkubo, Hideaki Hattori
  • Patent number: 4452996
    Abstract: Di(meth)acrylate esters of the formula: ##STR1## wherein m and n each represents O or an integer of 1 to 3, the average sum of m+n being 1 to 6 and R represents hydrogen or a methyl group, and process for producing the same.The esters are copolymerizable with other unsaturated compounds to form radiation hardenable films with a reduced irritating effect.
    Type: Grant
    Filed: January 27, 1983
    Date of Patent: June 5, 1984
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Minoru Yokoshima, Kazuyoshi Nawata, Tetsuo Hironaka, Hideaki Takahashi