Patents by Inventor Kazuyuki Asakura
Kazuyuki Asakura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7621247Abstract: A decompression apparatus includes a plunger and a decompression shaft. The plunger is provided in a plunger hole formed in a cam shaft which is configured to move an engine valve of an internal combustion engine. The plunger is movable in the plunger hole between a decompression position in which the plunger opens the engine valve and a decompression cancel position in which the plunger does not open the engine valve. The plunger hole has a first opening which partially locates on a cam surface of a valve cam which is provided on the cam shaft. A first end portion of the plunger protrudes from the first opening to open the engine valve in the decompression position. The decompression shaft is provided in the cam shaft and configured to move the plunger between the decompression position and the decompression cancel position.Type: GrantFiled: July 9, 2007Date of Patent: November 24, 2009Assignee: Honda Motor Co., Ltd.Inventors: Toshikazu Iwama, Kazuyuki Asakura, Hideyuki Tawara, Akira Tokito
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Publication number: 20080011257Abstract: A decompression apparatus includes a plunger and a decompression shaft. The plunger is provided in a plunger hole formed in a cam shaft which is configured to move an engine valve of an internal combustion engine. The plunger is movable in the plunger hole between a decompression position in which the plunger opens the engine valve and a decompression cancel position in which the plunger does not open the engine valve. The plunger hole has a first opening which partially locates on a cam surface of a valve cam which is provided on the cam shaft. A first end portion of the plunger protrudes from the first opening to open the engine valve in the decompression position. The decompression shaft is provided in the cam shaft and configured to move the plunger between the decompression position and the decompression cancel position.Type: ApplicationFiled: July 9, 2007Publication date: January 17, 2008Applicant: HONDA MOTOR CO., LTD.Inventors: Toshikazu IWAMA, Kazuyuki Asakura, Hideyuki Tawara, Akira Tokito
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Patent number: 6004478Abstract: A silacyclohexane compound of the formulas (I) ##STR1## wherein R represents an organic residue, ##STR2## represents an unsubstituted or substituted silicon-containing cyclohexylene group or a 1,4-cyclohexylene group, ##STR3## represents an unsubstituted or substituted phenylene, an unsubstituted or substituted silicon-containing cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, or a 1,4-cyclohexylene group provided that at least one of these residues represents a silicon-containing cyclohexylene group, j, k and l are, respectively, 0 or 1, L.sub.1 and L.sub.2, respectively, represent H or F, m and n are, respectively, 0, 1 or 2 provided that m+n=2, 3 or 4, and X represents H, F or Cl. A liquid crystal composition comprising the silacyclohexane compound of the above formula is also described, along with a liquid crystal device comprising the composition.Type: GrantFiled: March 15, 1996Date of Patent: December 21, 1999Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takaaki Shimizu, Tsutomu Ogihara, Tatsushi Kaneko, Kazuyuki Asakura, Takeshi Kinsho, Mutsuo Nakashima
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Patent number: 5783717Abstract: A method for purifying an organometal compound by removing oxygen atom-containing compounds included in the organometal compound as impurities is herein disclosed. The method comprises the steps of mixing an organometal compound represented by the following formula: ##STR1## with a crude product including an oxygen atom-containing compound represented by the following formula: R.sub.3-n M.sup.1 (OR).sub.n or R.sub.2-m M.sup.2 (OR).sub.m and an alkylaluminum chloride represented by the formula: X.sub.6-q Al.sub.2 R and then distilling the resulting mixture. In the foregoing formulas, R's may be the same or different and each represents an alkyl group having 1 to 3 carbon atoms; M.sup.1 represents a trivalent metal element; M.sup.2 represents a divalent metal element; n is an integer of 1, 2 or 3; m is an integer of 1 or 2; q is an integer ranging from 1 to 5; and X represents a chlorine atom.Type: GrantFiled: August 21, 1995Date of Patent: July 21, 1998Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiromi Ohsaki, Toshinobu Ishihara, Kazuyuki Asakura, Isao Kaneko, Kouhei Satou
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Patent number: 5762826Abstract: A liquid crystal composition comprising one or more types compounds represented by general formula II: ##STR1## and one or more types of compounds selected from the group consisting of: ##STR2## wherein R, rings A and B, X, Y1, Y2, Y3, Y4 and m are defined herein.Type: GrantFiled: December 21, 1995Date of Patent: June 9, 1998Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takaaki Shimizu, Tatsushi Kaneko, Tsutomu Ogihara, Takeshi Kinsho, Kazuyuki Asakura, Mutsuo Nakashima
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Patent number: 5725797Abstract: For the purpose of improving the characteristics of a liquid crystal substance, there is provided a silacyclohexane compound represented by the general formula (I): ##STR1## wherein R represents a specific straight-chain alkyl group, mono or difluoro alkyl group, branched-chain alkyl group, alkoxyalkyl group, and alkenyl group; at least one of rings A and B represent a trans-1-sila-1,4-cyclohexylene group or a trans-4-sila-1,4-cyclohexylene group both having a substituent group H, F, Cl, CH.sub.3 or Ar (Ar stands for a phenyl or tolyl group) on silicon at the 1 or 4 position, and the other group, if any, represents a trans-1,4-cyclohexylene group or ##STR2## Z represents CN, F, Cl, CF.sub.3, CClF.sub.2, CHClF, OCF.sub.3, OCClF.sub.2, OCHF.sub.2, OCHClF, R, or OR; L.sub.1 represents H, F or Cl; L.sub.2 and L.sub.3 stand independently for H or F; i represents an integer of 0 to 2; m is 1 or 2; n is 0 or 1; and if m is 2, the two rings may be the same or different.Type: GrantFiled: October 31, 1996Date of Patent: March 10, 1998Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Kazuyuki Asakura, Takanobu Takeda, Takaaki Shimizu, Tsutomu Ogihara, Tatsushi Kaneko
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Patent number: 5679746Abstract: A silacyclohexane compound represented by the following general formula (I): ##STR1## wherein R denotes a mono- or di-fluoroalkyl group with 1-10 carbons: ##STR2## denotes a trans-1-silacyclohexylene or a trans-4-silacyclohexylene group whose silicon at position 1 or position 4 has a substitutional group of H, F, Cl or CH.sub.3 ;X denotes a CN, F, Cl, CF.sub.3, CF.sub.2 Cl, CHFCl, OCF.sub.3, OCHF.sub.2, OCF.sub.2 Cl, OCHFCl, (O).sub.3 CY.sub.1 .dbd.CX.sub.1 X.sub.2 (X.sub.1 and Y.sub.1 denote H, F or Cl, and X.sub.2 denotes F or Cl) (O).sub.3 C.sub.p H.sub.q F.sub.r (p denotes 2, 3 or 4, and q and r are integers which satisfy the equation q+r=2p+1, and s denotes 0 or 1), the aforementioned R, or an alkyl or alkoxy group with 1-5 carbons;Y denotes H or F; andZ denotes H or F;and process of manufacturing same.Type: GrantFiled: December 21, 1995Date of Patent: October 21, 1997Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takaaki Shimizu, Tsutomu Ogihara, Kazuyuki Asakura, Takeshi Kinsho, Tatsushi Kaneko, Mutsuo Nakashima
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Patent number: 5665271Abstract: Silacyclohexane compounds of the following formula (I) or (II) along with intermediate compounds therefor are described ##STR1## wherein R is an organic residue, one of ##STR2## represents a trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group having a substituent of H, F, Cl or CH.sub.3, and the other represents a trans-1,4-cyclohexylene group, or such a trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group as defined above, n is 0 or 1, L.sub.1 represents H or F, L.sub.2 represents H, F or Cl, and Z represents CN, F, Cl or an organic residue, and ##STR3## The processes for preparing the compounds (I) and (II) are also described along with liquid crystal compositions comprising the compounds and the liquid crystal devices comprising the compositions.Type: GrantFiled: February 12, 1996Date of Patent: September 9, 1997Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tsutomu Ogihara, Takaaki Shimizu, Takeshi Kinsho, Tatsushi Kaneko, Kazuyuki Asakura, Mutsuo Nakashima
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Patent number: 5641431Abstract: A silacyclohexanone compound represented by the following general formula (I). ##STR1## wherein Ar denotes a phenyl group or a tolyl group. R denotes a tolyl group, a linear-chain alkyl group with a carbon number of 2-10, a mono- or di-fluoroalkyl group with a carbon number of 1-10, a branched-chain alkyl group with a carbon number of 3-8 or an alkoxyalkyl group with a carbon number of 2-7. Also, a method of manufacturing silacyclohexane-type liquid crystal compounds represented by the general formula (II) ##STR2## and the general formula (III) ##STR3## which are derived from this compound.Type: GrantFiled: March 23, 1995Date of Patent: June 24, 1997Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takeshi Kinsho, Takaaki Shimizu, Tsutomu Ogihara, Ryuichi Saito, Kazuyuki Asakura, Mutsuo Nakashima
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Patent number: 5641430Abstract: A silacyclohexane compound of the following formula (I) or (II) ##STR1## wherein R is an organic residue, ##STR2## represents an unsubstituted or substituted trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, L.sub.1 and L.sub.2 independently represent H, F, Cl or CH.sub.3 ; and X represents an organic residue, CN, F or Cl, or ##STR3## wherein R, L.sub.1, L.sub.2 and X are, respectively, as defined above, and at least one of ##STR4## represents an unsubstituted or substituted trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, and the other may be a trans-1,4-cyclohexylene group. The preparation of these compounds is described along with a composition comprising the compound (I) and/or (II) and a display device comprising the composition.Type: GrantFiled: December 1, 1995Date of Patent: June 24, 1997Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Mutsuo Nakashima, Takaaki Shimizu, Tsutomu Ogihara, Takeshi Kinsho, Tatsushi Kaneko, Kazuyuki Asakura, Hideshi Kurihara
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Patent number: 5461166Abstract: Disclosed are a conductive thienyl derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a silicon compound comprising 3-thienyl groups (thiophene derivative) used for forming the conductive monomolecular film and a method of manufacturing the same. A monomolecular ultrathin film comprising 3-thienyl groups and silicon groups is formed in the invention. The silicon compound used for forming the film is provided by reacting .omega.-(3-thienyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted compound, thus chemically bonding the monomolecular film to the substrate surface. Furthermore, a thienyl derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.Type: GrantFiled: February 3, 1995Date of Patent: October 24, 1995Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Norihisa Mino, Kazufumi Ogawa, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Kazuyuki Asakura
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Patent number: 5354918Abstract: The method for preparing a monoalkylphosphine of high purity comprises reacting phosphine and an alkene in the presence of an anhydrous alkanesulfonic acid as a catalyst in a solvent having a boiling point higher than that of the monoalkylphosphine produced. The resulting monoalkylphosphine is brought into contact with an alkali solution to remove the catalyst, which is a sulfur atom-containing compound, remaining in the solution. The reaction solution from which the remaining catalyst is removed is then brought into contact with alkali metal hydrides or alkaline earth metal hydrides to eliminate any moisture remaining in the reaction solution. The alkali metal hydride is preferably sodium hydride or lithium aluminum hydride, while the alkaline earth metal hydride is preferably calcium hydride.Type: GrantFiled: July 15, 1993Date of Patent: October 11, 1994Assignees: Shin-Etsu Chemical Co., Ltd., Nippon Chemical Industrial Co., Ltd.Inventors: Hiromi Ohsaki, Kazuyuki Asakura, Masashi Sugiya, Yutaka Demura, Tomio Yanai