Patents by Inventor Kazuyuki Ejima

Kazuyuki Ejima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12235536
    Abstract: A liquid crystal display apparatus effectively suppresses a temperature increase in a liquid crystal panel, and includes: a liquid crystal panel; a panel housing configured to accommodate the liquid crystal panel; a first transparent member disposed on a front face side of the liquid crystal panel; and a frame member configured to hold the first transparent member and to be attachable to the panel housing, the frame member defining an interval between the liquid crystal panel and the first transparent member, and forming, between the liquid crystal panel and the first transparent member, a void that allows a coolant to flow along a front face of the liquid crystal panel.
    Type: Grant
    Filed: August 3, 2021
    Date of Patent: February 25, 2025
    Assignee: SONY GROUP CORPORATION
    Inventors: Shinji Iwahashi, Teppei Toyoizumi, Kazuyuki Ejima
  • Publication number: 20230314860
    Abstract: A liquid crystal display apparatus effectively suppresses a temperature increase in a liquid crystal panel, and includes: a liquid crystal panel; a panel housing configured to accommodate the liquid crystal panel; a first transparent member disposed on a front face side of the liquid crystal panel; and a frame member configured to hold the first transparent member and to be attachable to the panel housing, the frame member defining an interval between the liquid crystal panel and the first transparent member, and forming, between the liquid crystal panel and the first transparent member, a void that allows a coolant to flow along a front face of the liquid crystal panel.
    Type: Application
    Filed: August 3, 2021
    Publication date: October 5, 2023
    Inventors: SHINJI IWAHASHI, TEPPEI TOYOIZUMI, KAZUYUKI EJIMA
  • Patent number: 11330183
    Abstract: A shake correction device including a driven body, a first actuator that is extendable and contractible in a first direction, a second actuator that is extendable and contractible in a second direction, a support that supports the driven body via the first actuator and the second actuator, a first connection mechanism unit that connects at least either between the first actuator and the driven body or between the first actuator and the support, and a second connection mechanism unit that connects at least either between the second actuator and the driven body or between the second actuator and the support. The first connection mechanism unit and the second connection mechanism unit have at least one degree of rotational freedom.
    Type: Grant
    Filed: July 1, 2019
    Date of Patent: May 10, 2022
    Assignee: Sony Corporation
    Inventors: Akihiro Nakata, Satoshi Nakamaru, Yoshio Goto, Tomoya Takei, Kazuyuki Ejima
  • Publication number: 20210235018
    Abstract: A shake correction device including a driven body, a first actuator that is extendable and contractible in a first direction, a second actuator that is extendable and contractible in a second direction, a support that supports the driven body via the first actuator and the second actuator, a first connection mechanism unit that connects at least either between the first actuator and the driven body or between the first actuator and the support, and a second connection mechanism unit that connects at least either between the second actuator and the driven body or between the second actuator and the support. The first connection mechanism unit and the second connection mechanism unit have at least one degree of rotational freedom.
    Type: Application
    Filed: July 1, 2019
    Publication date: July 29, 2021
    Inventors: Akihiro NAKATA, Satoshi NAKAMARU, Yoshio GOTO, Tomoya TAKEI, Kazuyuki EJIMA
  • Publication number: 20130019947
    Abstract: A photoelectric conversion element module includes a first base material, a second base material, a photoelectric conversion element having a light incident side and sealing portion and arranged between the first and second base materials, an anchoring layer adapted to anchor one of main sides of a light incident side and a side opposite to the light incident side, and one of a main side of the first and second base material opposed to one of the main sides, and a covering section adapted to cover the sealing portion. The Young's modulus of the covering section is 0 MPa or more and 20 MPa or less.
    Type: Application
    Filed: July 10, 2012
    Publication date: January 24, 2013
    Applicant: Sony Corporation
    Inventors: Kazuyuki Ejima, Akira Ono, Keigo Sugimoto
  • Patent number: 6737805
    Abstract: A plasma display device comprises a first panel provided with discharge sustaining electrodes and a dielectric layer on the inside thereof, and a second panel laminated on the first panel so as to form discharge spaces on the inside, wherein the dielectric layer comprises a silicon oxide layer having a density of not less than 6.1×1022 atoms/cm3. Preferably, the density of the silicon oxide layer is not less than 6.4×1022 atoms/cm3. Where a sputtering method is used as a method of forming the silicon oxide layer, the concentration of oxygen gas in an atmosphere gas introduced into the sputtering apparatus is controlled to be 5 to 30 vol % during film formation.
    Type: Grant
    Filed: June 13, 2002
    Date of Patent: May 18, 2004
    Assignee: Sony Corporation
    Inventors: Satoshi Nakada, Kazuyuki Ejima, Hiroshi Mori
  • Publication number: 20030030375
    Abstract: A plasma display device comprises a first panel provided with discharge sustaining electrodes and a dielectric layer on the inside thereof, and a second panel laminated on the first panel so as to form discharge spaces on the inside, wherein the dielectric layer comprises a silicon oxide layer having a density of not less than 6.1×1022 atoms/cm3. Preferably, the density of the silicon oxide layer is not less than 6.4×1022 atoms/cm3. Where a sputtering method is used as a method of forming the silicon oxide layer, the concentration of oxygen gas in an atmosphere gas introduced into the sputtering apparatus is controlled to be 5 to 30 vol % during film formation.
    Type: Application
    Filed: June 13, 2002
    Publication date: February 13, 2003
    Inventors: Satoshi Nakada, Kazuyuki Ejima, Hiroshi Mori