Abstract: An information processing apparatus includes a processor having hardware. The processor is configured to create distribution information including a privilege according to an area contribution degree in a visit area at a first distance or more from a residential area of a user based on an activity history of the user and displays the distribution information on a user terminal of the user.

Abstract: An information processing apparatus includes a controller. The controller decides whether or not specifications of a proposed vehicle to be proposed to a customer are determined such that the specifications are for an electrified vehicle based on traveling data of a vehicle driven by the customer and outputs the decided specifications.

Abstract: A vehicle includes a vehicle cabin, a filter configured to allow air blown toward the vehicle cabin to pass through the filter while adsorbing at least a portion of a substance contained in the air, a sensor configured to detect the state of the air passing through the filter, and a control device configured to output information relating to maintenance of the filter based on the result of detection performed by the sensor.

Abstract: An information processing apparatus includes a controller communicable with a vehicle. The controller decides a repair point at which the vehicle is repaired based on navigation information of the vehicle in a case where the controller determines that the vehicle needs to be repaired based on the state of the vehicle and notifies the vehicle of the repair point.

Abstract: An information processing device includes a control unit configured to determine whether to include a regenerative brake in specifications of a proposed vehicle based on regenerative brake operation data acquired while a first vehicle including the regenerative brake is traveling in a predetermined area. The proposed vehicle is a vehicle proposed as a vehicle for a customer to drive in the predetermined area.

Abstract: A substrate processing apparatus includes first and second polishing units for polishing a peripheral portion of a substrate, a primary cleaning unit for cleaning the substrate, a secondary cleaning and drying unit for drying the substrate cleaned in the primary cleaning unit, and a measurement unit for measuring the peripheral portion of the substrate. The measurement unit includes a mechanism for measurement required for polishing in the first and second polishing units, such as a diameter measurement mechanism, a cross-sectional shape measurement mechanism, or a surface condition measurement mechanism.

Abstract: A substrate processing apparatus includes first and second polishing units for polishing a peripheral portion of a substrate, a primary cleaning unit for cleaning the substrate, a secondary cleaning and drying unit for drying the substrate cleaned in the primary cleaning unit, and a measurement unit for measuring the peripheral portion of the substrate. The measurement unit includes a mechanism for measurement required for polishing in the first and second polishing units, such as a diameter measurement mechanism, a cross-sectional shape measurement mechanism, or a surface condition measurement mechanism.

Abstract: An image forming apparatus includes: a body frame accommodating an image forming unit; and a support frame supporting an image reading unit and disposed to confront the body frame in a confronting direction, the support frame having a first end portion and a second end portion opposite to each other in a first direction perpendicular to the confronting direction. The support frame includes: first and second engaging portions provided at the first and second end portions respectively; and a pair of grip portions. The body frame has a first edge portion and a second edge portion opposite to each other in the first direction, the body frame including: a first engaged portion provided at the first edge portion and engageable with the first engaging portion; and a second engaged portion provided at the second edge portion and engageable with the second engaging portion.

Abstract: An image forming apparatus includes: a body frame accommodating an image forming unit; and a support frame supporting an image reading unit and disposed to confront the body frame in a confronting direction, the support frame having a first end portion and a second end portion opposite to each other in a first direction perpendicular to the confronting direction. The support frame includes: first and second engaging portions provided at the first and second end portions respectively; and a pair of grip portions. The body frame has a first edge portion and a second edge portion opposite to each other in the first direction, the body frame including: a first engaged portion provided at the first edge portion and engageable with the first engaging portion; and a second engaged portion provided at the second edge portion and engageable with the second engaging portion.

Abstract: A method for producing an improved dried egg white includes preparing a dried egg white by drying a liquid egg white so that the dried egg white after drying has a pH of 9 or more, and dissipating carbon dioxide contained in the dried egg white, wherein, by dissipating carbon dioxide contained in the dried egg white, the pH of the dried egg white is increased to 0.01 to 1 to obtain a pH of 9.5 or more and carbon dioxide concentration in a sealed 250 ml vial is decreased to 1% or less, when 25 g of the improved dried egg white is stored in the vial at 75° C. for 24 hours.

Abstract: A method for producing an improved dried egg white includes preparing a dried egg white by drying a liquid egg white so that the dried egg white after drying has a pH of 9 or more, and dissipating carbon dioxide contained in the dried egg white, wherein, by dissipating carbon dioxide contained in the dried egg white, the pH of the dried egg white is increased to 0.01 to 1 to obtain a pH of 9.5 or more and carbon dioxide concentration in a sealed 250 ml vial is decreased to 1% or less, when 25 g of the improved dried egg white is stored in the vial at 75° C. for 24 hours.

Abstract: A device for polishing the peripheral edge part of a semiconductor wafer includes a wafer stage for holding the wafer, a wafer stage unit including devices for rotating the wafer stage, causing the wafer stage to undergo a rotary reciprocating motion within the same plane as the surface of the wafer stage, and moving the wafer stage parallel to the surface, a notch polishing part for polishing the notch on the wafer and a bevel polishing part for polishing the beveled part of the wafer. Pure water is supplied to the wafer to prevent it from becoming dry as it is transported from the notch polishing part to the bevel polishing part.

Abstract: A device for polishing the peripheral edge part of a semiconductor wafer includes a wafer stage for holding the wafer, a wafer stage unit including devices for rotating the wafer stage, causing the wafer stage to undergo a rotary reciprocating motion within the same plane as the surface of the wafer stage, and moving the wafer stage parallel to the surface, a notch polishing part for polishing the notch on the wafer and a bevel polishing part for polishing the beveled part of the wafer. Pure water is supplied to the wafer to prevent it from becoming dry as it is transported from the notch polishing part to the bevel polishing part.

Abstract: A substrate processing apparatus (1) has a first polishing unit (400A) and a second polishing unit (400B) for polishing a peripheral portion of a substrate. Each of the two polishing units (400A, 400B) includes a bevel polishing device (450A, 450B) for polishing a peripheral portion of a substrate and a notch polishing device (480A, 480B) for polishing a notch of a substrate. The substrate processing apparatus (1) has a maintenance space (7) formed between the two polishing units (400A, 400B). The bevel polishing devices (450A, 450B) in the two polishing units (400A, 400B) face the maintenance space (7) so as to be accessible from the maintenance space (7).

Abstract: An improved dried egg white has a pH of 9.5 or more and a carbon dioxide concentration is 1% or less in a sealed 250 ml vial, when 25 g of the product is stored in the vial at 75° C. for 24 hours.

Abstract: A substrate processing apparatus (1) includes first and second polishing units (70A, 70B) for polishing a peripheral portion of a substrate (W), a primary cleaning unit (100) for cleaning the substrate (W), a secondary cleaning and drying unit (110) for drying the substrate (W) cleaned in the primary cleaning unit (100), and a measurement unit (30) for measuring the peripheral portion of the substrate (W). The measurement unit (30) includes a mechanism for measurement required for polishing in the first and second polishing units (70A and 70B), such as a diameter measurement mechanism, a cross-sectional shape measurement mechanism, or a surface condition measurement mechanism.

Abstract: A silicon substance is etched by using alkaline etchant containing additive (Cu, Pb, Mg). The content of the additive is controlled intentionally to provide desired etching quality during an etching operation.

Abstract: In a fine processing method for forming a silicon substrate, first, an oxynitride layer is formed on the silicon substrate. Thereafter, a silicon nitride layer is formed on the oxynitride layer and patterned into a predetermined shape to cause it to function as an etching mask. The silicon substrate is etched through the etching mask. In this case, because of the oxynitride layer formed between the silicon substrate and the silicon nitride layer, an interface between the silicon substrate and the silicon nitride layer is not easily eroded in the etching process. As a result, processing accuracy of the substrate is improved.

Abstract: A method of surface-roughening a copper foil by subjecting at least one side of the copper foil to electro-plating using an alternating current, wherein a sulfuric acid bath or a sulfuric acid-copper sulfate bath is used as an electrolyte.

Abstract: A yarn processing method for a tail end of a yarn of a package. A tail end of a package is dropped at its end from a yarn layer of the package to cross the end of the package, after which it is returned onto the yarn layer so that the tail end is easily searched out in a later step.