Abstract: [Problem] The main purpose of the present invention is to provide a casing for a fluid controller capable of enabling maintenance inside the casing even in a state where the lower part of the casing is fixed to a main body of a fluid controller, and improving maintainability. [Solution] A casing 1 for covering devices 104,106,108 on a main body 101 of a fluid controller 100, the casing 1 is configured so as to be dividable into a plurality of parts, and the plurality of parts comprising a first part 2 provided with a fixing portion 2i for fixing to the main body 101, a second part 4 attached to the first part 2, and a third part 5 attachably and detachably provided at an upper partition higher than a predetermined height position of the casing 1.

Abstract: A gas supply system 100 comprises: a first vaporization supply device 10A including a first vaporization section 12A having a heater, a first valve 14A, and a first supply pressure sensor 16A for measuring a gas pressure between the first vaporization section and the first valve; a second vaporization supply device 10B including a second vaporization section 12B having a heater, a second valve 14B, and a second supply pressure sensor 16B for measuring a gas pressure between the second vaporization section and the second valve; and a control circuit 20. The system is configured to flow a gas from the first vaporization section 10A and a gas from the second vaporization section 10B sequentially into a common flow path, by shifting timings of an opening period of the first valve 14A and an opening period of the second valve 14B.

Abstract: A vaporization supply device includes a vaporizer for heating and vaporizing a liquid raw material L, a flow rate controller for controlling a flow rate of the gas supplied from the vaporizer to a gas supply destination, and a controller for heating the inside of the vaporizer to obtain a necessary gas flow rate, and performing a feedback control so that a pressure becomes equal to or higher than a predetermined value. The controller is configured so as to stop the feedback control at the time point when the flow rate control by the flow rate controller starts, then heat the liquid raw material by an amount of heat provided to the vaporizer more than the heat that has already been provided immediately before the feedback control ends, and change to the feedback control after a predetermined time has elapsed from the time point when the flow rate control by the flow rate controller starts.

Abstract: A diaphragm valve includes a body 3 having a flow path 2 formed therein, a sheet 4 formed in the flow path 2, a metal diaphragm 5 for opening and closing the flow path 2 by abutting on or separating from the sheet 4, a pair of clamping parts 6 and 7 for claiming peripheral edge portions of both side surfaces of the metal diaphragm 5 respectively to fix the metal diaphragm 5 to the body 3, and an actuator 8 for abutting the metal diaphragm 5 on the sheet 4 or separating the metal diaphragm from the sheet 4, wherein a fluorine resin coating is formed on a sheet side surface 5a of the metal diaphragm 5 in a region excluding a clamping region D-C between the sheet side surface 5a and the clamping part 7, and at least in a contact region B-A with the sheet 4 in a region C surrounded by the clamping region D-C.

Abstract: The flow controller according to the present invention includes: a control valve; a first flow passage provided on the downstream side of the control valve; a second flow passage; and an expansion chamber provided between the first flow passage and the second flow passage. The second flow passage is provided in a position that is not on the extension of the first flow passage.

Abstract: The flow controller according to the present invention includes: a control valve; a first flow passage provided on the downstream side of the control valve; a second flow passage; and an expansion chamber provided between the first flow passage and the second flow passage. The second flow passage is provided in a position that is not on the extension of the first flow passage.

Abstract: In a gas supply device supplying many different gases to a gas use portion through many flow rate controllers, a flow rate controller calibration unit includes a build-up tank with inner volume, an inlet side on-off valve and an outlet side on-off valve V2 of the tank, and a gas pressure detector and a gas temperature detector for gas inside the tank, joined in a branched form to a gas supply line, with the valve V2 connected to vacuum. The calibration unit is used to calibrate a flow rate controller based on performing a first measurement of gas temperature and pressure inside the tank, and then building-up gas into the tank, and then performing a second measurement of gas temperature and pressure, and from respective measured values, calculating gas flow rate Q and by comparing a set gas flow rate and calculated gas flow rate Q, performing flow rate calibration.

Abstract: A gas branched flow supplying apparatus for semiconductor manufacturing equipment. An arithmetic and control unit 7 works to successively open the respective branched pipe passage opening/closing valves 10a, 10n for a predetermined time and then close the valves, and the gas branched flow supplying apparatus performs flow control of the process gas distributed through the orifice 6 by the pressure type flow control unit 1a, and branches and supplies the process gas by opening and closing the branched pipe passage opening/closing valves 10a, 10n.

Abstract: In a gas supply device supplying many different gases to a gas use portion through many flow rate controllers, a flow rate controller calibration unit includes a build-up tank with inner volume, an inlet side on-off valve and an outlet side on-off valve V2 of the tank, and a gas pressure detector and a gas temperature detector for gas inside the tank, joined in a branched form to a gas supply line, with the valve V2 connected to vacuum. The calibration unit is used to calibrate a flow rate controller based on performing a first measurement of gas temperature and pressure inside the tank, and then building-up gas into the tank, and then performing a second measurement of gas temperature and pressure, and from respective measured values, calculating gas flow rate Q and by comparing a set gas flow rate and calculated gas flow rate Q, performing flow rate calibration.