Abstract: A pattern lithography system for lithographing a pattern with reference to a pattern data by deflecting an electron beam includes a controller, an extracting unit, a dividing unit, and an expansion unit. The controller analyzes the pattern data and determines stripes of the pattern to be successively lithographed. The extracting unit extracts parts of the pattern data corresponding to stripes of the pattern in response to commands from the controller and sends the data to the dividing unit. The dividing unit divides the part of the pattern data into a plurality of sub-patterns. The sub-patterns are sized smaller than a minimum deflection range of the electron beam. The expanding unit expands the sub-patterns in accordance with a command from the controller to produce stripe data for driving a lithographing unit to lithograph the stripe. Stripes may have at least one sub-pattern in common such that multiple lithography is performed.

Abstract: In a system for working a blade material for a mold, the product size, material, etc. concerning individual blade materials to be worked is registered in a computer in advance, and a method of setting up the blade material to be worked is instructed to the operator by the computer. An NC working program is compiled automatically so that the operations of the machine are sequenced in such a manner that the working of all the blade materials on one pallet is completed most speedily after data on dimensions concerning the difference between the design values of the basic material obtained during the setup and measured values is input to the computer. The automatically compiled NC working program is collectively downloaded to an NC machine tool via a communication line.