Patents by Inventor Kazuyuki Takegawa

Kazuyuki Takegawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing micro lenses including underlayer film and lens film etching steps
    Patent number: 7459327
    Abstract: A solid-state imager is disclosed wherein isolation regions (4) are covered with power supply lines (8), a light-transmitting lens film (24) whose surface forms continuous convex portions above the isolation regions (4) convex towards channel regions (5) is provided, and a light-transmitting material having a refractive index lower than that of the lens film (24) is provided over the lens film (24).
    Type: Grant
    Filed: April 16, 2004
    Date of Patent: December 2, 2008
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Seiji Kai, Ryouji Matsui, Tetsuya Yamada, Tsutomu Imai, Kazuyuki Takegawa
  • Solid-state imager and method for manufacturing same
    Publication number: 20060151773
    Abstract: A solid-state imager is disclosed wherein isolation regions (4) are covered with power supply lines (8), a light-transmitting lens film (24) whose surface forms continuous convex portions above the isolation regions (4) convex towards channel regions (5) is provided, and a light-transmitting material having a refractive index lower than that of the lens film (24) is provided over the lens film (24).
    Type: Application
    Filed: April 16, 2004
    Publication date: July 13, 2006
    Inventors: Seiji Kai, Ryouji Matsui, Tetsuya Yamada, Tsutomu Imai, Kazuyuki Takegawa
  • Manufacturing method of micro-lens, manufacturing method of solid-state image pickup device and solid-state image pickup device
    Patent number: 6995915
    Abstract: The present invention intends to provide a manufacturing method of a heat resistant micro-lens. The manufacturing method includes forming on a substrate an inorganic film having the optical transparency; forming, at positions that are on the inorganic film and correspond to lens formation positions, a resist films; etching a portion where the resist films are not formed of the inorganic film; removing the resist films that remain; and irradiating inert gas ions to the inorganic film from which the resist films are removed and that is patterned according to the etching.
    Type: Grant
    Filed: November 4, 2004
    Date of Patent: February 7, 2006
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Kazuyuki Takegawa, Ryoji Matsui, Tetsuya Yamada, Tsutomu Imai, Seiji Kai, Yuko Tanaka
  • Manufacturing method of micro-lens, manufacturing method of solid-state image pickup device and solid-state image pickup device
    Publication number: 20050099695
    Abstract: The present invention intends to provide a manufacturing method of a heat resistant micro-lens. The manufacturing method includes forming on a substrate an inorganic film having the optical transparency; forming, at positions that are on the inorganic film and correspond to lens formation positions, a resist films; etching a portion where the resist films are not formed of the inorganic film; removing the resist films that remain; and irradiating inert gas ions to the inorganic film from which the resist films are removed and that is patterned according to the etching.
    Type: Application
    Filed: November 4, 2004
    Publication date: May 12, 2005
    Applicant: SANYO ELECTRIC CO., LTD.
    Inventors: Kazuyuki Takegawa, Ryoji Matsui, Tetsuya Yamada, Tsutomu Imai, Seiji Kai, Yuko Tanaka