Patents by Inventor Kazuyuki Zaitsu

Kazuyuki Zaitsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Susceptor and surface processing method
    Publication number: 20050034675
    Abstract: A susceptor provided as a base of a liquid crystal substrate in a vacuum chamber of a thin film deposition apparatus is provided. The susceptor includes a susceptor main body and a stepped portion provided on the susceptor main body to support the substrate from the bottom. The stepped portion is formed of a size smaller than the substrate. By the provision of the stepped portion, conduction between a film formed at an end plane of the substrate and a film formed at the portion around the substrate can be avoided.
    Type: Application
    Filed: September 21, 2004
    Publication date: February 17, 2005
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Tetsuya Nakabayashi, Hitoshi Ujimasa, Kazuyuki Zaitsu, Masafumi Kokura
  • Susceptor and surface processing method
    Patent number: 6808645
    Abstract: A susceptor provided as a base of a liquid crystal substrate in a vacuum chamber of a thin film deposition apparatus is provided. The susceptor includes a susceptor main body and a stepped portion provided on the susceptor main body to support the substrate from the bottom. The stepped portion is formed of a size smaller than the substrate. By the provision of the stepped portion, conduction between a film formed at an end plane of the substrate and a film formed at the portion around the substrate can be avoided.
    Type: Grant
    Filed: March 21, 2001
    Date of Patent: October 26, 2004
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Tetsuya Nakabayashi, Hitoshi Ujimasa, Kazuyuki Zaitsu, Masafumi Kokura
  • Susceptor and surface processing method
    Publication number: 20020033381
    Abstract: A susceptor provided as a base of a liquid crystal substrate in a vacuum chamber of a thin film deposition apparatus is provided. The susceptor includes a susceptor main body and a stepped portion provided on the susceptor main body to support the substrate from the bottom. The stepped portion is formed of a size smaller than the substrate. By the provision of the stepped portion, conduction between a film formed at an end plane of the substrate and a film formed at the portion around the substrate can be avoided.
    Type: Application
    Filed: March 21, 2001
    Publication date: March 21, 2002
    Inventors: Tetsuya Nakabayashi, Hitoshi Ujimasa, Kazuyuki Zaitsu, Masafumi Kokura