Patents by Inventor Kedar Joshi

Kedar Joshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER
    Publication number: 20230343608
    Abstract: Exemplary semiconductor processing chambers may include a gasbox including a first plate having a first surface and a second surface opposite to the first surface. The first plate of the gasbox may define a central aperture that extends from the first surface to the second surface. The first plate may define an annular recess in the second surface. The first plate may define a plurality of apertures extending from the first surface to the annular recess in the second surface. The gasbox may include a second plate characterized by an annular shape. The second plate may be coupled with the first plate at the annular recess to define a first plenum within the first plate.
    Type: Application
    Filed: July 3, 2023
    Publication date: October 26, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Rahul Rajeev, Yunzhe Yang, Abhijit A. Kangude, Kedar Joshi
  • Gasbox for semiconductor processing chamber
    Patent number: 11694908
    Abstract: Exemplary semiconductor processing chambers may include a gasbox including a first plate having a first surface and a second surface opposite to the first surface. The first plate of the gasbox may define a central aperture that extends from the first surface to the second surface. The first plate may define an annular recess in the second surface. The first plate may define a plurality of apertures extending from the first surface to the annular recess in the second surface. The gasbox may include a second plate characterized by an annular shape. The second plate may be coupled with the first plate at the annular recess to define a first plenum within the first plate.
    Type: Grant
    Filed: October 22, 2020
    Date of Patent: July 4, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Rahul Rajeev, Yunzhe Yang, Abhijit A. Kangude, Kedar Joshi
  • GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER
    Publication number: 20220130687
    Abstract: Exemplary semiconductor processing chambers may include a gasbox including a first plate having a first surface and a second surface opposite to the first surface. The first plate of the gasbox may define a central aperture that extends from the first surface to the second surface. The first plate may define an annular recess in the second surface. The first plate may define a plurality of apertures extending from the first surface to the annular recess in the second surface. The gasbox may include a second plate characterized by an annular shape. The second plate may be coupled with the first plate at the annular recess to define a first plenum within the first plate.
    Type: Application
    Filed: October 22, 2020
    Publication date: April 28, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Rahul Rajeev, Yunzhe Yang, Abhijit A. Kangude, Kedar Joshi