Patents by Inventor Kee Hyun Kim

Kee Hyun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10945694
    Abstract: The present invention relates to a breast cancer diagnosis device. More particularly, the present invention relates to a breast cancer diagnosis device for early detection of the presence or absence of breast cancer lesions inside the breast of a diagnosis subject. The breast cancer diagnosis device includes: an X-ray diagnosis unit generating an X-ray image of a diagnosis subject; an optical diagnosis unit generating an optical transmission image of the diagnosis subject; and a transfer unit which is coupled to the X-ray diagnosis unit and the optical diagnosis unit to transfer all or part of the X-ray diagnosis unit and the optical diagnosis unit, and sequentially transfer all or part of the X-ray diagnosis unit or the optical diagnosis unit toward the diagnosis subject.
    Type: Grant
    Filed: November 27, 2015
    Date of Patent: March 16, 2021
    Assignees: KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE, ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE, THE ASAN FOUNDATION
    Inventors: Young Wook Choi, Soo Yeol Lee, Hak Hee Kim, Du Chang Heo, Young Min Bae, Kee Hyun Kim
  • Patent number: 10203927
    Abstract: A display apparatus and a display method are provided. The display apparatus includes a display configured to display a multi-window screen image comprising windows. The display apparatus further includes an audio output interface, and a controller configured to detect a movement of focus from a window to another window among the windows, analyze a stream of content that is reproduced in the focused other window, in response to the controller detecting the movement of focus, and control the audio output interface to output audio data based on the analysis.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: February 12, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seung-hwan Lee, Kee-hyun Kim, Yang sun Ryu
  • Publication number: 20180220986
    Abstract: The present invention relates to a breast cancer diagnosis device. More particularly, the present invention relates to a breast cancer diagnosis device for early detection of the presence or absence of breast cancer lesions inside the breast of a diagnosis subject. The breast cancer diagnosis device includes: an X-ray diagnosis unit generating an X-ray image of a diagnosis subject; an optical diagnosis unit generating an optical transmission image of the diagnosis subject; and a transfer unit which is coupled to the X-ray diagnosis unit and the optical diagnosis unit to transfer all or part of the X-ray diagnosis unit and the optical diagnosis unit, and sequentially transfer all or part of the X-ray diagnosis unit or the optical diagnosis unit toward the diagnosis subject.
    Type: Application
    Filed: November 27, 2015
    Publication date: August 9, 2018
    Applicants: KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE, ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE, THE ASAN FOUNDATION
    Inventors: Young Wook CHOI, Soo Yeol LEE, Hak Hee KIM, Du Chang HEO, Young Min BAE, Kee Hyun KIM
  • Publication number: 20160147496
    Abstract: A display apparatus and a display method are provided. The display apparatus includes a display configured to display a multi-window screen image comprising windows. The display apparatus further includes an audio output interface, and a controller configured to detect a movement of focus from a window to another window among the windows, analyze a stream of content that is reproduced in the focused other window, in response to the controller detecting the movement of focus, and control the audio output interface to output audio data based on the analysis.
    Type: Application
    Filed: November 16, 2015
    Publication date: May 26, 2016
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seung-hwan LEE, Kee-hyun KIM, Yang sun RYU
  • Patent number: 8223329
    Abstract: An endpoint detection device, a plasma reactor with the endpoint detection device, and an endpoint detection method are provided. The endpoint detection device includes an OES data operation unit, a data selector, a product generator, an SVM, and an endpoint determiner. The OES data operation unit processes reference OES data by normalization and PCA. The data selector selects part of the linear reference loading vectors and selects part of the selected linear reference loading vectors. The product generator outputs at least one reference product value. The SVM performs regression and outputs a prediction product value. The endpoint determiner detects a process wafer etch or deposition endpoint and outputs a detection signal.
    Type: Grant
    Filed: October 24, 2011
    Date of Patent: July 17, 2012
    Assignee: DMS Co. Ltd
    Inventors: Kun Joo Park, Kwang Hoon Han, Kee Hyun Kim, Weon Mook Lee, Kyounghoon Han, Heeyeop Chae
  • Publication number: 20120041584
    Abstract: An endpoint detection device, a plasma reactor with the endpoint detection device, and an endpoint detection method are provided. The endpoint detection device includes an OES data operation unit, a data selector, a product generator, an SVM, and an endpoint determiner. The OES data operation unit processes reference OES data by normalization and PCA. The data selector selects part of the linear reference loading vectors and selects part of the selected linear reference loading vectors. The product generator outputs at least one reference product value. The SVM performs regression and outputs a prediction product value. The endpoint determiner detects a process wafer etch or deposition endpoint and outputs a detection signal.
    Type: Application
    Filed: October 24, 2011
    Publication date: February 16, 2012
    Applicant: DMS CO. LTD.
    Inventors: Kun Joo PARK, Kwang Hoon HAN, Kee Hyun KIM, Weon Mook LEE, Kyounghoon HAN, Heeyeop CHAE
  • Patent number: 8049872
    Abstract: An endpoint detection device, a plasma reactor with the endpoint detection device, and an endpoint detection method are provided. The endpoint detection device includes an OES data operation unit, a data selector, a product generator, an SVM, and an endpoint determiner. The OES data operation unit processes reference OES data by normalization and PCA. The data selector selects part of the linear reference loading vectors and selects part of the selected linear reference loading vectors. The product generator outputs at least one reference product value. The SVM performs regression and outputs a prediction product value. The endpoint determiner detects a process wafer etch or deposition endpoint and outputs a detection signal.
    Type: Grant
    Filed: February 25, 2008
    Date of Patent: November 1, 2011
    Assignee: DMS Co., Ltd.
    Inventors: Kun Joo Park, Kwang Hoon Han, Kee Hyun Kim, Weon Mook Lee, Kyounghoon Han, Heeyeop Chae
  • Publication number: 20090029489
    Abstract: An endpoint detection device, a plasma reactor with the endpoint detection device, and an endpoint detection method are provided. The endpoint detection device includes an OES data operation unit, a data selector, a product generator, an SVM, and an endpoint determiner. The OES data operation unit processes reference OES data by normalization and PCA. The data selector selects part of the linear reference loading vectors and selects part of the selected linear reference loading vectors. The product generator outputs at least one reference product value. The SVM performs regression and outputs a prediction product value. The endpoint determiner detects a process wafer etch or deposition endpoint and outputs a detection signal.
    Type: Application
    Filed: February 25, 2008
    Publication date: January 29, 2009
    Applicant: DMS. CO. LTD.
    Inventors: Kun Joo Park, Kwang Hoon Han, Kee Hyun Kim, Weon Mook Lee, Kyounghoon Han, Heeyeop Chae
  • Publication number: 20080271762
    Abstract: An etching gas control system is provided. The system includes a gas injector, a gas supply pipe, a Flow Ratio Controller (FRC), and a gas supply unit. The gas injector is installed in a chamber and supplies gas inside the chamber. The gas injector includes a top injector installed at a top of the chamber and a side injector installed at a side of the chamber. The gas supply pipe connects and supplies gas to the gas injector. The FRC connects to the gas supply pipe and controls supply of gas. The gas supply unit supplies gas to the FRC.
    Type: Application
    Filed: April 2, 2008
    Publication date: November 6, 2008
    Applicant: DMS CO., LTD.
    Inventors: Kun Joo PARK, Hwan Kook CHAE, Byoungil LEE, Kee Hyun KIM, Weon Mook LEE