Patents by Inventor Keeho E. Kim

Keeho E. Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Scheme for improving the simulation accuracy of integrated circuit patterns by simulation of the mask
    Patent number: 6834262
    Abstract: A mask simulation process is introduced into a conventional OPC procedure, prior to simulation of a photoresist pattern. Reticle simulation may be achieved using very short wavelengths of light as compared to the mask feature size. Alternatively, reticle simulation may be made through adjustments in a computer aided design process.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: December 21, 2004
    Assignee: Cypress Semiconductor Corporation
    Inventors: Artur E. Balasinski, Dianna L. Coburn, Keeho E. Kim, Dongsung Hong