Patents by Inventor Kees Van Hasselt

Kees Van Hasselt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask provided with an ESD-precluding envelope
    Patent number: 6309781
    Abstract: A photomask (1) comprises a transmissive base plate (2), a first side of which is provided with a layer of a metallic mask material (4). In this layer, a mask pattern (6) is formed which is enclosed in an outer region (5) of mask material. The photomask is encapsulated in a protection layer (9) of transmissive and conductive material, which, on the first side of the base plate, is formed at such a distance from said first side that said protection layer remains free of the mask pattern. The photomask is thus protected against electrostatic discharges which could damage the mask pattern, and the projection of the mask pattern is not adversely affected.
    Type: Grant
    Filed: December 14, 1999
    Date of Patent: October 30, 2001
    Assignee: U.S. Philips Corporation
    Inventors: Jan W. Gemmink, Kees Van Hasselt