Patents by Inventor Kees Van Weert
Kees Van Weert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11003096Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: GrantFiled: December 18, 2019Date of Patent: May 11, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Publication number: 20200124990Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: ApplicationFiled: December 18, 2019Publication date: April 23, 2020Applicant: ASLM Netherlands B.V.Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Kees VAN WEERT
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Patent number: 10514618Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: GrantFiled: July 3, 2018Date of Patent: December 24, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Publication number: 20180314169Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: ApplicationFiled: July 3, 2018Publication date: November 1, 2018Applicant: ASML Netherlands B. V.Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Patent number: 10025204Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: GrantFiled: February 9, 2017Date of Patent: July 17, 2018Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Publication number: 20170153556Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: ApplicationFiled: February 9, 2017Publication date: June 1, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus VAN DE KERKHOF, Mark Kroon, Kees VAN WEERT
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Patent number: 9568841Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: GrantFiled: March 24, 2016Date of Patent: February 14, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Publication number: 20160209761Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: ApplicationFiled: March 24, 2016Publication date: July 21, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Kees VAN WEERT
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Patent number: 9316919Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: GrantFiled: December 29, 2014Date of Patent: April 19, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Publication number: 20150116683Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: ApplicationFiled: December 29, 2014Publication date: April 30, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Kees VAN WEERT
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Patent number: 8947637Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: GrantFiled: September 6, 2011Date of Patent: February 3, 2015Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Publication number: 20110317143Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: ApplicationFiled: September 6, 2011Publication date: December 29, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Patent number: 8035798Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: GrantFiled: July 7, 2006Date of Patent: October 11, 2011Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Patent number: 7907255Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: GrantFiled: August 24, 2004Date of Patent: March 15, 2011Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
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Publication number: 20050078287Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: ApplicationFiled: August 24, 2004Publication date: April 14, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Sengers, Marcus Van De Kerkhof, Mark Kroon, Kees Van Weert
