Patents by Inventor Kefeng REN

Kefeng REN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12534549
    Abstract: A polyelectrolyte hydrogel coating with strong substrate binding performance and a method of manufacturing the same are provided. The method includes: 1) activating a substrate by applying oxygen plasma; and 2) dissolving a polycationic polymer, a polymeric monomer, a silane coupling agent and an initiator to obtain a precursor solution, vacuumizing the precursor solution to remove air bubbles, applying the vacuumized precursor solution to a surface of the substrate activated by the oxygen plasma, and performing an in-situ polymerization and curing process under nitrogen or rare gas atmosphere. The polymeric monomer includes at least one of: acrylamide, acrylic acid, hydroxyethyl methacrylamide, 2-acrylamido-2-methyl-1-propanesulfonic acid, polyethylene glycol (diol) diacrylate, 2-methacryloxyethylphosphocholine, 3-[[2-(Methacryloyloxy)ethyl]dimethylammonio]propane-1-sulfonate, and 3-[[2-(methacryloyloxy)ethyl]dimethylammonium] propionate.
    Type: Grant
    Filed: October 11, 2022
    Date of Patent: January 27, 2026
    Assignee: ZHEJIANG UNIVERSITY
    Inventors: Jian Ji, Kefeng Ren, Jing Wang, Xingwang Wang
  • Publication number: 20230033929
    Abstract: A polyelectrolyte hydrogel coating with strong substrate binding performance and a method of manufacturing the same are provided. The method includes: 1) activating a substrate by applying oxygen plasma; and 2) dissolving a polycationic polymer, a polymeric monomer, a silane coupling agent and an initiator to obtain a precursor solution, vacuumizing the precursor solution to remove air bubbles, applying the vacuumized precursor solution to a surface of the substrate activated by the oxygen plasma, and performing an in-situ polymerization and curing process under nitrogen or rare gas atmosphere. The polymeric monomer includes at least one of: acrylamide, acrylic acid, hydroxyethyl methacrylamide, 2-acrylamido-2-methyl-1-propanesulfonic acid, polyethylene glycol (diol) diacrylate, 2-methacryloxyethylphosphocholine, 3-[[2-(Methacryloyloxy)ethyl]dimethylammonio]propane-1-sulfonate, and 3-[[2-(methacryloyloxy)ethyl]dimethylammonium] propionate.
    Type: Application
    Filed: October 11, 2022
    Publication date: February 2, 2023
    Inventors: Jian JI, Kefeng REN, Jing WANG, Xingwang WANG