Abstract: A method of manufacturing a semiconductor device is disclosed. In the method, a metallic layer is formed over a substrate, the metallic layer is surface-treated with an alkaline solution, and a bottom anti-reflective coating (BARC) layer is formed on the surface-treated metallic layer.

Abstract: A method of manufacturing a semiconductor device is disclosed. In the method, a metallic layer is formed over a substrate, the metallic layer is surface-treated with an alkaline solution, and a bottom anti-reflective coating (BARC) layer is formed on the surface-treated metallic layer.

Abstract: Embodiments of the present disclosure disclose a method of forming a new integrated circuit design on a semiconductor wafer using a photolithography tool. The method includes selecting a previously processed wafer having a past integrated circuit design different than the new integrated circuit design, selecting a plurality of critical dimension (CD) data points extracted from the previously processed wafer after the previously processed wafer was etched, and creating a field layout and associated baseline exposure dose map for the new integrated circuit design. The method also includes refining each field in the baseline exposure dose map based on a difference between an average CD for the previously processed wafer and an average CD for each field in the field layout and controlling the exposure of the photolithography tool according to the refined baseline exposure dose map to form the new integrated circuit design on the semiconductor wafer.

Abstract: A method including providing a present wafer to be processed by a photolithography tool, selecting a processed wafer having a past chip design from a plurality of processed wafers, the processed wafer being previously processed by the photolithography tool, selecting a plurality of critical dimension (CD) data points extracted from a plurality of fields on the processed wafer, modeling the plurality of CD data points with a function relating CD to position on the processed wafer, creating a field layout on the present wafer for a new chip design, creating an initial exposure dose map for the new chip design using the function and the field layout, and controlling the exposure of the photolithography tool according to the initial exposure dose map to form the new chip design on the present wafer.

Abstract: A method including providing a present wafer to be processed by a photolithography tool, selecting a processed wafer having a past chip design from a plurality of processed wafers, the processed wafer being previously processed by the photolithography tool, selecting a plurality of critical dimension (CD) data points extracted from a plurality of fields on the processed wafer, modeling the plurality of CD data points with a function relating CD to position on the processed wafer, creating a field layout on the present wafer for a new chip design, creating an initial exposure dose map for the new chip design using the function and the field layout, and controlling the exposure of the photolithography tool according to the initial exposure dose map to form the new chip design on the present wafer.

Abstract: The present disclosure provides a method for measuring lens contamination in a lithography apparatus. The method includes imaging an asymmetric pattern utilizing a lens system and measuring an alignment offset of the asymmetric pattern associated with the lens system. A contamination of the lens system is determined by comparing the alignment offset to a reference value.

Abstract: The present disclosure provides a method for measuring lens contamination in a lithography apparatus. The method includes imaging an asymmetric pattern utilizing a lens system and measuring an alignment offset of the asymmetric pattern associated with the lens system. A contamination of the lens system is determined by comparing the alignment offset to a reference value.