Abstract: The work load spent on designing a trench-type, Levenson-type phase shift mask is lightened and the working time for the designing process is shortened. A pattern 11, having a plurality of apertures, is designed by means of a designing tool 10. In a database 30 are prepared optimal functions that indicate optimal combinations of undercut amounts Uc and bias correction amount ? according to each set of dimension conditions. An optimal function extraction tool 20 extracts optimal functions Fp and Fs that are matched with dimension conditions Mp and Ms on pattern 11, and determining tool 40 determines optimal values of the undercut amount Uc and the bias correction amount ? based on the extracted optimal function. A three-dimensional structure determining tool 50 determines a three-dimensional structural body 13, having a depth d and the undercut amount Uc, for an aperture by which the phase of transmitted light is shifted by 180 degrees.

Abstract: A planar pattern (11), having a plurality of apertures of the same size (Wx×Wy), is determined by a two-dimensional layout determination tool (10), and a three-dimensional structure, having a depth d and an undercut amount Uc for making the phase of the transmitted light be shifted by 180 degrees with every even-numbered aperture, is determined by a three-dimensional structure determination tool (20). Simulation of transmitted light is executed for a structural body having the planar pattern (11) and the three-dimensional structure (21) by a three-dimensional simulator (30) to determine the light intensity deviation D of transmitted light for an odd-numbered aperture without a trench and an even-numbered aperture with a trench. At a two-dimensional simulator (40), simulations using a two-dimensional model prepared based on this deviation D are performed to determine a correction amount ? for making the deviation D zero and obtain a new planar pattern (12).

Abstract: A planar pattern (11), having a plurality of apertures of the same size (Wx×Wy), is determined by a two-dimensional layout determination tool (10), and a three-dimensional structure, having a depth d and an undercut amount Uc for making the phase of the transmitted light be shifted by 180 degrees with every even-numbered aperture, is determined by a three-dimensional structure determination tool (20). Simulation of transmitted light is executed for a structural body having the planar pattern (11) and the three-dimensional structure (21) by a three-dimensional simulator (30) to determine the light intensity deviation D of transmitted light for an odd-numbered aperture without a trench and an even-numbered aperture with a trench. At a two-dimensional simulator (40), simulations using a two-dimensional model prepared based on this deviation D are performed to determine a correction amount ? for making the deviation D zero and obtain a new planar pattern (12).

Abstract: The work load spent on designing a trench-type, Levenson-type phase shift mask is lightened and the working time for the designing process is shortened. A pattern 11, having a plurality of apertures, is designed by means of a designing tool 10. In a database 30 are prepared optimal functions that indicate optimal combinations of undercut amounts Uc and bias correction amounts ? according to each set of dimension conditions. An optimal function extraction tool 20 extracts optimal functions Fp and Fs that are matched with dimension conditions Mp and Ms on pattern 11, and determining tool 40 determines optimal values of the undercut amount Uc and the bias correction amount ? based on the extracted optimal function. A three-dimensional structure determining tool 50 determines a three-dimensional structural body 13, having a depth d and the undercut amount Uc, for an aperture by which the phase of transmitted light is shifted by 180 degrees.

Abstract: The work load spent on designing a trench-type, Levenson-type phase shift mask is lightened and the working time for the designing process is shortened. A pattern 11, having a plurality of apertures, is designed by means of a designing tool 10. In a database 30 are prepared optimal functions that indicate optimal combinations of undercut amounts Uc and bias correction amount ? according to each set of dimension conditions. An optimal function extraction tool 20 extracts optimal functions Fp and Fs that are matched with dimension conditions Mp and Ms on pattern 11, and determining tool 40 determines optimal values of the undercut amount Uc and the bias correction amount ? based on the extracted optimal function. A three-dimensional structure determining tool 50 determines a three-dimensional structural body 13, having a depth d and the undercut amount Uc, for an aperture by which the phase of transmitted light is shifted by 180 degrees.

Abstract: The work load spent on designing a trench-type, Levenson-type phase shift mask is lightened and the working time for the designing process is shortened. A pattern 11, having a plurality of apertures, is designed by means of a designing tool 10. In a database 30 are prepared optimal functions that indicate optimal combinations of undercut amounts Uc and bias correction amounts &dgr; according to each set of dimension conditions. An optimal function extraction tool 20 extracts optimal functions Fp and Fs that are matched with dimension conditions Mp and Ms on pattern 11, and determining tool 40 determines optimal values of the undercut amount Uc and the bias correction amount &dgr; based on the extracted optimal function. A three-dimensional structure determining tool 50 determines a three-dimensional structural body 13, having a depth d and the undercut amount Uc, for an aperture by which the phase of transmitted light is shifted by 180 degrees.