Abstract: When washing the inside of a reactor vessel which is used repeatedly, a rough suction is performed before suctioning with a washing tip; however, unwanted washing liquid may remain that may affect analysis results. The present invention provides an automatic analysis device for analyzing a sample using light, in which the automatic analysis device is characterized in that: a washing mechanism comprises a washing liquid supply nozzle that supplies washing liquid to a reactor vessel after analysis, a washing liquid suction nozzle that suctions the supplied washing liquid, a washing tip provided to the bottom end of the washing liquid suction nozzle, and a rough suction nozzle that suctions, in advance, a liquid within the reactor vessel before suctioning with the washing tip; and after the rough suction, liquid is caused to remain so that the bottom surface of the reactor vessel is not exposed.

Abstract: When washing the inside of a reactor vessel which is used repeatedly, a rough suction is performed before suctioning with a washing tip; however, unwanted washing liquid may remain that may affect analysis results. The present invention provides an automatic analysis device for analyzing a sample using light, in which the automatic analysis device is characterized in that: a washing mechanism comprises a washing liquid supply nozzle that supplies washing liquid to a reactor vessel after analysis, a washing liquid suction nozzle that suctions the supplied washing liquid, a washing tip provided to the bottom end of the washing liquid suction nozzle, and a rough suction nozzle that suctions, in advance, a liquid within the reactor vessel before suctioning with the washing tip; and after the rough suction, liquid is caused to remain so that the bottom surface of the reactor vessel is not exposed.

Abstract: Provided are a device and a cleaning mechanism for a reaction container in the device that are characterized by being provided with: a reaction disk for holding a reaction container; a sample dispensing mechanism for dispensing a sample to the reaction container; a reagent dispensing mechanism for dispensing a reagent to the reaction container; an optical system comprising a light source for applying light to a mixture of the sample and the reagent dispensed to the reaction container, and a detector for detecting the light applied from the light source; and a cleaning mechanism for cleaning the reaction container, wherein the cleaning mechanism is provided with a cleaning liquid supply nozzle for supplying a cleaning liquid to the reaction container after an analysis, a cleaning liquid suction nozzle for suctioning the supplied cleaning liquid, and a cleaning tip provided on the lower end of the cleaning liquid suction nozzle, and the side surface of the cleaning tip is formed such that the width of the clean

Abstract: Provided are a device and a cleaning mechanism for a reaction container in the device that are characterized by being provided with: a reaction disk for holding a reaction container; a sample dispensing mechanism for dispensing a sample to the reaction container; a reagent dispensing mechanism for dispensing a reagent to the reaction container; an optical system comprising a light source for applying light to a mixture of the sample and the reagent dispensed to the reaction container, and a detector for detecting the light applied from the light source; and a cleaning mechanism for cleaning the reaction container, wherein the cleaning mechanism is provided with a cleaning liquid supply nozzle for supplying a cleaning liquid to the reaction container after an analysis, a cleaning liquid suction nozzle for suctioning the supplied cleaning liquid, and a cleaning tip provided on the lower end of the cleaning liquid suction nozzle, and the side surface of the cleaning tip is formed such that the width of the clean

Abstract: A gas-liquid contacting plate of the present invention in which a treatment liquid flows from an upper side to a lower side direction of a substrate and a part of gas being in contact with the treatment liquid is absorbed into the treatment liquid, includes a downward protruding saw teeth-shaped portion in which a lower end side of the substrate has pitches at predetermined gaps. Further, a pore group for liquid dispersion having a predetermined gap is provided in a plurality of lines, in the substrate. An arrangement thereof is a zigzag arrangement.

Abstract: A gas-liquid contacting plate of the present invention in which a treatment liquid flows from an upper side to a lower side direction of a substrate and a part of gas being in contact with the treatment liquid is absorbed into the treatment liquid, includes a downward protruding saw teeth-shaped portion in which a lower end side of the substrate has pitches at predetermined gaps. Further, a pore group for liquid dispersion having a predetermined gap is provided in a plurality of lines, in the substrate. An arrangement thereof is a zigzag arrangement.