Patents by Inventor Kei UCHIBAYASHI

Kei UCHIBAYASHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11495820
    Abstract: A cell includes a support substrate that is of a flat plate shape that includes a first principal surface and a second principal surface on an opposite side of the first principal surface and a columnar shape that includes a longitudinal direction and includes a gas flow path in an inside thereof, and a plurality of element parts that are arranged away from one another on the first principal surface and the second principal surface where at least a fuel electrode, a solid electrolyte film, and an air electrode are laminated thereon. The cell includes a first portion that is located on a side of the first principal surface with respect to the gas flow path and a second portion that is located on a side of the second principal surface with respect to the gas flow path. Structures of the first portion and the second portion are asymmetric.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: November 8, 2022
    Assignee: KYOCERA Corporation
    Inventors: Takahiro Shinchi, Kei Uchibayashi
  • Publication number: 20210296678
    Abstract: A cell includes a support substrate that is of a flat plate shape that includes a first principal surface and a second principal surface on an opposite side of the first principal surface and a columnar shape that includes a longitudinal direction and includes a gas flow path in an inside thereof, and a plurality of element parts that are arranged away from one another on the first principal surface and the second principal surface where at least a fuel electrode, a solid electrolyte film, and an air electrode are laminated thereon. The cell includes a first portion that is located on a side of the first principal surface with respect to the gas flow path and a second portion that is located on a side of the second principal surface with respect to the gas flow path. Structures of the first portion and the second portion are asymmetric.
    Type: Application
    Filed: July 26, 2019
    Publication date: September 23, 2021
    Inventors: Takahiro SHINCHI, Kei UCHIBAYASHI