Abstract: An object of the present invention is to provide a transfer film and a photosensitive composition, with which a film having excellent low moisture permeability and excellent scratch resistance can be formed. The transfer film of the present invention is a transfer film including a temporary support and a photosensitive layer, in which the photosensitive layer contains a polymer A and a compound ?, the polymer A has a repeating unit (a) having a carboxy group linked to a main chain by a linking group having 1 or more carbon atoms, and the compound ? has a structure b0 which reduces an amount of the carboxy group included in the polymer A by exposure.

Abstract: Provided are a composition containing a binder polymer, a polymerizable compound, a polymer (X), and a solvent, in which the polymer (X) includes predetermined constitutional units, a transfer film, a manufacturing method of a laminate, a cured film, and a device.

Abstract: The present invention relates to: a photosensitive transfer material including a temporary support and a photosensitive layer containing a binder polymer, a polymerizable compound, a photopolymerization initiator, and a compound A, in which a number of hydrophilic groups in the compound A being decreased by an action of light or heat, and the photosensitive layer is transferred to a surface of a metal-containing layer; a method of producing the photosensitive transfer material; a film; a touch panel; a method of suppressing deterioration; a laminate; and a method of producing the film.

Abstract: Provided are (1) a composition including an alkali-soluble resin, a polymerizable compound, a photopolymerization initiator, a surfactant, and a solvent, in which a surface tension measured by a Wilhelmy method at 25° C. is 26.5 mN/m or less; (2) a composition including a surfactant and a solvent, in which a surface tension T1 measured by a Wilhelmy method at 25° C. and a surface tension T2 measured by a Wilhelmy method at 25° C. immediately before a timing that a volume reaches 60% of an initial volume in an environment of a temperature of 25° C. and a relative humidity of 60% satisfy a relationship of T1>T2; and (3) applications thereof.

Abstract: The present invention provides a photosensitive material with which a film having a low relative permittivity can be formed. In addition, the present invention provides a pattern forming method, a manufacturing method of a circuit wiring, a manufacturing method of a touch panel, and a transfer film, which are related to the photosensitive material. The photosensitive material of the present invention satisfies at least one requirement of the following requirement (V01) or the following requirement (W01). (V01) the photosensitive material includes a polymer A having a carboxy group and a compound ? which has a structure b0 in which an amount of the carboxy group included in the polymer A is reduced by exposure. (W01) the photosensitive material includes a polymer Ab0 which is the polymer A and further has the structure b0 in which the amount of the carboxy group included in the polymer A is reduced by exposure.

Abstract: A photosensitive material includes: a compound A having a carboxy group, in which the compound A includes a polymer including a repeating unit derived from (meth)acrylic acid, and a content of the carboxy group in a photosensitive layer which is formed from the photosensitive material is reduced by irradiation with an actinic ray or a radiation.