Patents by Inventor Keiichi Ono

Keiichi Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030045226
    Abstract: Information from fan filter units and differential pressure gauges provided in a ceiling of a clean room is used to control directions and volumes of air flows blown from respective fan filter units. In order to improve a wind velocity distribution in the clean room, pressure in a ceiling chamber is made uniform and control of the FFU revolution speeds of fan filter units is made easy. In order to control directions of air flows in the clean room, damper adjusting mechanisms are provided under a grating floor of the clean room. Such arrangement enables optimizing an operating condition of the clean room and achieving energy saving.
    Type: Application
    Filed: December 20, 2001
    Publication date: March 6, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Makoto Yokoyama, Keiichi Ono, Fumiyuki Tamura
  • Publication number: 20030040269
    Abstract: Information from fan filter units and differential pressure gauges provided in a ceiling of a clean room is used to control directions and volumes of air flows blown from respective fan filter units. In order to improve a wind velocity distribution in the clean room, pressure in a ceiling chamber is made uniform and control of the FFU revolution speeds of fan filter units is made easy. In order to control directions of air flows in the clean room, damper adjusting mechanisms are provided under a grating floor of the clean room. Such arrangement enables optimizing an operating condition of the clean room and achieving energy saving.
    Type: Application
    Filed: October 8, 2002
    Publication date: February 27, 2003
    Applicant: Hitachi, Ltd
    Inventors: Makoto Yokoyama, Keiichi Ono, Fumiyuki Tamura
  • Patent number: 6080623
    Abstract: One electrode of a capacitive element is formed by a doped semiconductor film and a non-doped semiconductor film which covers at least part of the doped semiconductor film, and a capacitive dielectric film is formed to cover these semiconductor films. In forming this capacitive dielectric film, enhanced oxidation due to impurities is suppressed, so hardly any native oxide is formed on the surface of one electrode, and a reliable capacitive element having a large capacitance can be manufactured.
    Type: Grant
    Filed: October 17, 1996
    Date of Patent: June 27, 2000
    Assignee: Sony Corporation
    Inventor: Keiichi Ono
  • Patent number: 5858827
    Abstract: A method of manufacturing MOS semiconductor device, is disclosed, in which considerations are given to the influence of threshold value on ion implantation, and the dose of impurity to be ion implanted for forming high impurity concentration regions as source and drain regions is set to a value, at which the threshold value is substantially constant with impurity dose changes (the impurity dose being set to 10.sup.15 per cm.sup.2 or below for n-type impurity region). Thus, it is made possible to adequately set and control the threshold value, thus solving particularly the problem of reverse short channel effect and permitting formation of MOS parts with different threshold values.
    Type: Grant
    Filed: May 27, 1997
    Date of Patent: January 12, 1999
    Assignee: Sony Corporation
    Inventor: Keiichi Ono
  • Patent number: 5774157
    Abstract: The dimensions of a magnetized pattern formed on a recording medium are varied, thereby causing the amount of toner attracted to the recording medium to vary, and thereby adjusting the printing density. This type of variation of the dimensions of the magnetized pattern is preferably achieved by varying the pulse width, that is, the duty cycle, of the recording clock which is supplied to a latent image recording circuit. This printing density adjustment method enables stable adjustment of the printing density.
    Type: Grant
    Filed: May 26, 1995
    Date of Patent: June 30, 1998
    Assignee: Iwatsu Electric Co., Ltd.
    Inventors: Kunio Kinoshita, Takashi Iwata, Keiichi Ono
  • Patent number: 5759991
    Abstract: The invention provides human- or rat-derived neurotrophic peptides and derivatives thereof, precursor peptides thereof, genes encoding the same, transformants containing recombinant expression vectors bearing the genes, and compositions comprising as an effective ingredient these neurotrophic peptides or derivatives thereof. The neurotrophic peptide or its derivatives of the present invention have a neurotrophic activity and are useful for the treatment of neuro-degenerative disorders and dementia.
    Type: Grant
    Filed: February 27, 1995
    Date of Patent: June 2, 1998
    Assignees: Sumitomo Pharmaceutical Company, Limited., Kosei Ojika, Masahiko Yamamoto
    Inventors: Naoki Tohdoh, Shin-ichiro Tojo, Shin-ichi Kojima, Yasuyuki Ueki, Toshio Nishihara, Nobuyuki Fukushima, Tsunemasa Irie, Keiichi Ono, Hideo Agui, Kosei Ojika
  • Patent number: 5459093
    Abstract: Method of forming a dummy pattern without inducing crosstalk between conductive interconnects which would normally be caused by increase in capacitance between the interconnects. Also, absolute steps of devices are made uniform. Furthermore, the flatness of devices is improved. In a device having a multilayer aluminum metallization structure, let Chip be data about a region on which a dummy pattern should be defined. Let I.sub.Mi be data about a region occupied by an aluminum interconnect pattern on the ith layer. Let I.sub.Di be data about a dummy pattern on the ith layer, or data sought for. Let (Chip-I.sub.Mi).sub.D be data about the dummy pattern region obtained by decrement of data. The data (Chip-I.sub.Mi).sub.D about the dummy pattern region is ANDed with data I.sub.M(i+1) about the conduction pattern on the (i+1)th layer or with data I.sub.D(i+1) about the dummy pattern. Thus, data I.sub.Di about the dummy pattern is created. The dummy pattern on the ith layer is created, based on the created data I.
    Type: Grant
    Filed: March 17, 1994
    Date of Patent: October 17, 1995
    Assignee: Sony Corporation
    Inventors: Hideaki Kuroda, Keiichi Ono
  • Patent number: 5342940
    Abstract: High purity polyethylene glycol derivatives of formula (I) are useful as protein modifiers of interferons, t-PA, EGF, various hormones, etc. The thus modified protein has minimized antigenicity, prolonged plasma half life, or improved transfer to tissue. A novel process for preparing high purity polyethylene glycol derivatives is also disclosed.
    Type: Grant
    Filed: September 13, 1993
    Date of Patent: August 30, 1994
    Assignees: Sumitomo Pharmaceuticals Company, Limited, Seikagaku Corporation
    Inventors: Keiichi Ono, Yoshiyuki Kai, Hiroo Maeda
  • Patent number: 5214131
    Abstract: A polyethylene glycol derivative of the formula ##STR1## wherein R represents a lower alkyl and n represents an optional positive integer which renders the average molecular weight of the polyethylene glycol moiety about 1,000 to 12,000, a peptide modified by said polyethylene glycol derivative and a method for production thereof. The polyethylene glycol derivative (I) is capable of modifying the guanidino groups in peptides. The peptides modified by the polyethylene glycol derivative (I) are extremely stable, are considerably delayed in biological clearance (i.e. the durability is extended) and exhibit their physiological activities effectively over the long period.
    Type: Grant
    Filed: November 26, 1991
    Date of Patent: May 25, 1993
    Assignee: Sumitomo Pharmaceuticals Company, Limited
    Inventors: Akihiko Sano, Hiroo Maeda, Yoshiyuki Kai, Keiichi Ono
  • Patent number: 5183660
    Abstract: Polyethylene glycol derivatives of the formula ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and each represents a lower alkyl, m and n are the same or different and each represents a positive integer and p is 0 or a positive integer, peptides modified by the polyethylene glycol derivatives, methods for producing them and use of the modified peptides. The peptides modified by the polyethylene glycol derivatives (I) of the invention, as compared with the corresponding non-modified peptides, show decreased antigenicity, are considerably delayed in biological clearance, and exhibit their physiological activities effectively over a long period, rendering them very effective as pharmaceuticals as well as drugs for animals.
    Type: Grant
    Filed: August 15, 1991
    Date of Patent: February 2, 1993
    Assignee: Sumitomo Pharmaceuticals Company, Limited
    Inventors: Yoshiharu Ikeda, Yoshiyuki Kai, Keiichi Ono
  • Patent number: 5093531
    Abstract: A polyethylene glycol derivative of the formula ##STR1## wherein R represents a lower alkyl and n represents an optional positive integer which renders the average molecular weight of the polyethylene glycol moiety about 1,000 to 12,000, a peptide modified by said polyethylene glycol derivative and a method for production thereof.The polyethylene glycol derivative (I) is capable of modifying the guanidino groups in peptides. The peptides modified by the polyethylene glycol derivative (I) are extremely stable, are considerably delayed in biological clearance (i.e. the durability is extended) and exhibit their physiological activities effectively over the long period.
    Type: Grant
    Filed: May 5, 1989
    Date of Patent: March 3, 1992
    Assignee: Sumitomo Pharmaceuticals Company, Limited
    Inventors: Akihiko Sano, Hiroo Maeda, Yoshiyuki Kai, Keiichi Ono
  • Patent number: 5051444
    Abstract: The present invention relates to pyrrolidine derivatives of the formula ##STR1## wherein R.sup.1 and R.sup.2 are defined as herein. The compounds are useful as anti-amnestic agent.
    Type: Grant
    Filed: September 18, 1989
    Date of Patent: September 24, 1991
    Assignee: Sumitomo Pharmaceuticals Company, Limited
    Inventors: Katsumi Tamoto, Renzo Ohuchi, Keiichi Ono
  • Patent number: 4880827
    Abstract: Pyrrolidine derivatives having inhibitory action for proline-specific endopeptidase which are useful for anti-amnestic agent. The disclosed pyrrolidine derivatives as well as their acid addition salts can be administered orally or parenterally in the form of conventional pharmaceutical preparations. For instance, they can be administered orally in the form of conventional solid pharmaceutical preparations such as tablets, capsules, syrups and suspensions. Alternatively, they can be administered parenterally by injection in the form of conventional liquid pharmaceutical preparations such as solutions, emulsions, suspensions, etc. Also, they may be directly applied to rectum in the form of suppository. Further, the preparations may contain physiologically acceptable carriers, excipients, activators, binding agents, stabilizers, etc. In the case of injections, physiologically acceptable buffers, solubilizing agents or isotonic agents may be incorporated therein. Methods of production are also disclosed.
    Type: Grant
    Filed: March 13, 1987
    Date of Patent: November 14, 1989
    Assignee: Sumitomo Pharmaceuticals Company, Ltd.
    Inventors: Katsumi Tamoto, Renzo Ohuchi, Keiichi Ono
  • Patent number: 4849434
    Abstract: A novel 2-pyridylthiazolidin-4-one derivative represented by the general formula ##STR1## wherein Ar denotes an aryl group unsubstituted or substituted with a halogen atom or with a lower alkoxy group; X denotes a straight-chain or branched-chain lower alkylene group or a single bond; R denotes a hydrogen atom, lower alkyl, lower alkenyl, lower alkynyl, cycloalkyl, acyloxy, di(lower alkyl) amino, hydroxyl or aryl group, or denotes an aryl group substituted with a lower alkoxy group; and Py denotes a pyridyl group, and the acid addition salt thereof, which have an excellent platelet activating factor antagonsm.
    Type: Grant
    Filed: July 17, 1987
    Date of Patent: July 18, 1989
    Assignees: Sumitomo Pharmaceuticals Company, Limited, Sumitomo Chemical Company, Limited
    Inventors: Masao Enomoto, Masami Muraoka, Keiichi Ono, Atsuyuki Kojima, Toshio Atsumi, Yoshihiro Komuro, Yuzuru Sanemitsu, Masato Mizutani
  • Patent number: 4774319
    Abstract: A process for the manufacture of a polypeptide (I) having the formula: ##STR1## which comprises steps of: (a) coupling, successively and in the order of the sequence of the polypeptide (I), the four protected fragments A, B, C and D or five protected fragments A, B, C, E and F,said fragment A by the formula, Leu-Gin-Asp-Ile-Met-Ser-Arg-NH.sub.2said fragment B by the formula, Gln-Leu-Ser-Ala-Arg-Lys-Leusaid fragment C by the formula, Arg-Lys-Val-Leu-Glysaid fragment D by the formula, Tyr-Ala-Asp-Ala-Ile-Phe-Thr-Asn-Ser-Tyrsaid fragment E by the formula, Ile-Phe-Thr-Asn-Ser-Tyrand said fragment F by the formula, Tyr-Ala-Asp-Ala being represented, respectively, and(b) eliminating, at the end of sequence, all the protecting groups to provide the polypeptide (I) which is active on the stimulation of the release of the growth hormone and thus is very useful as medicine for treatment of growth hormone deficiency disease and the like.
    Type: Grant
    Filed: November 9, 1987
    Date of Patent: September 27, 1988
    Assignee: Sumitomo Pharmaceuticals Company, Limited
    Inventors: Keiichi Ono, Yoshiyuki Kai, Yoshiaki Takebayashi, Akihiko Sano, Kazushi Suwa
  • Patent number: 4680307
    Abstract: A compound of the formula: ##STR1## wherein X.sup.1 is a free or an esterified carboxyl group, or a group of the formula: ##STR2## (R.sup.a and R.sup.b are each independently a hydrogen atom, a C.sub.1 -C.sub.4 alkyl group, a C.sub.3 -C.sub.7 cycloalkyl group, a benzyl group, a phenyl group, a phenyl group substituted with a halogen atom or a C.sub.1 -C.sub.4 alkyl group, or, when taken together with the adjacent nitrogen atom to which they are attached, they represent a 5 to 7 membered saturated heterocyclic group, Y.sup.1 is a group of the formula: ##STR3## (R.sup.6 is a hydrogen atom or C.sub.1 -C.sub.4 alkyl group), ##STR4## (R.sup.6 is as defined above), ##STR5## R.sup.1 is a hydrogen atom, a hydroxyl group or a protected hydroxyl group, R.sup.2 is a hydrogen atom or R.sup.1 and R.sup.2, when taken together, mean a shingle linkage to from a double bond between the carbon atoms which they are linked, R.sup.3 is a hydroxyl group or a protected hydroxyl group, R.sup.4 is a hydrogen atom or a C.sub.1 -C.sub.
    Type: Grant
    Filed: January 26, 1984
    Date of Patent: July 14, 1987
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Masami Muraoka, Toshio Nakamura, Akihiko Sugie, Keiichi Ono, Michihiro Yamamoto
  • Patent number: 4620036
    Abstract: Diphenylalkanoether and diphenylalkanone oximeether derivatives of the formula: ##STR1## wherein R.sup.1 and R.sup.2 are each independently an aryl group optionally substituted with 1 to 3 substituents selected from the group consisting of halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, nitro, cyano, di(C.sub.1 -C.sub.4)alkylamino, amino, benzyloxy, hydroxyl, C.sub.1 -C.sub.4 alkylthio, C.sub.1 -C.sub.4 alkylsulfinyl, C.sub.1 -C.sub.4 alkylsulfonyl, C.sub.1 -C.sub.4 alkanoylamino, C.sub.1 -C.sub.4 alkylamino and N-(C.sub.1 -C.sub.4 )alkyl-N-(C.sub.1 -C.sub.4)alkanoylamino, Z.sup.1 is a group of the formula: ##STR2## (wherein R.sup.3 and R.sup.4 are each independently a hydrogen atom, a C.sub.1 -C.sub.4 alkyl group or an ar(C.sub.1 -C.sub.
    Type: Grant
    Filed: March 22, 1984
    Date of Patent: October 28, 1986
    Inventors: Keiichi Ono, Hajime Kawakami, Junki Katsube
  • Patent number: 4537989
    Abstract: A compound of the formula ##STR1## wherein X.sup.1 is a free or an esterified carboxyl group, or a group of the formula: ##STR2## (R.sup.a and R.sup.b are each independently a hydrogen atom, a C.sub.1 -C.sub.4 alkyl group, a C.sub.3 -C.sub.7 cycloalkyl group, a benzyl group, a phenyl group, a phenyl group substituted with a halogen atom or a C.sub.1 -C.sub.4 alkyl group, or, when taken together with the adjacent nitrogen atom to which they are attached, they represent a 5 to 7 membered saturated heterocyclic group), Y is a group of the formula: ##STR3## (R.sup.6 is a hydrogen atom or a C.sub.1 -C.sub.4 alkyl group) or ##STR4## (R.sup.6 is as defined above), R.sup.1 is a hydrogen atom, a hydroxyl group or a protected hydroxyl group, R.sup.2 is a hydrogen atom or R.sup.1 and R.sup.2, when taken together, mean a single linkage to form a double bond between the carbon atoms which they are linked, R.sup.3 is a hydroxyl group or a protected hydroxyl group, R.sup.4 is a hydrogen atom or a C.sub.1 -C.sub.
    Type: Grant
    Filed: April 15, 1983
    Date of Patent: August 27, 1985
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Keiichi Ono, Akihiko Sugie, Masami Muraoka, Michihiro Yamamoto
  • Patent number: 4493846
    Abstract: A compound of the formula ##STR1## wherein X.sup.1 is a free or esterified carboxyl group, a hydroxymethyl group, a cyano group, a group of the formula: ##STR2## (R.sup.a and R.sup.b are each independently a hydrogen atom, a C.sub.1 -C.sub.4 alkyl group, a C.sub.3 -C.sub.7 cycloalkyl group, a benzyl group, a phenyl group, a phenyl group substituted with a halogen atom or a C.sub.1 -C.sub.4 alkyl group, or, when taken together with the adjacent nitrogen atom to which they are attached, they represent a 5 to 7-membered saturated heterocyclic group) or a group of the formula: ##STR3## (R.sup.a and R.sup.b are each as defined above), Y is an ethylene group or a vinylene group, R.sup.1 is a hydrogen atom, a hydroxyl group or a protected hydroxyl group, R.sup.2 is a hydrogen atom or R.sub.1 and R.sub.2, when taken together, means a single linkage to form a double bond between the carbon atoms which they are linked, R.sup.3 is a hydroxyl group or a protected hydroxyl group, R.sup.4 is a hydrogen atom or a C.sub.
    Type: Grant
    Filed: March 13, 1981
    Date of Patent: January 15, 1985
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Keiichi Ono, Akihiko Sugie, Hajime Kawakami, Shunsuke Sami, Atsuyuki Kojima, Junki Katsube
  • Patent number: 4482573
    Abstract: Diphenylalkanoether and diphenylalkanone oximeether derivatives of the formula: ##STR1## wherein R.sup.1 and R.sup.2 are each independently an aryl group optionally substituted with 1 to 3 substituents selected from the group consisting of halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, nitro, cyano, di(C.sub.1 -C.sub.4) alkylamino, amino, benzyloxy, hydroxyl, C.sub.1 -C.sub.4 alkylthio, C.sub.1 -C.sub.4 alkylsulfinyl, C.sub.1 -C.sub.4 alkylsulfonyl, C.sub.1 -C.sub.4 alkanoylamino, C.sub.1 -C.sub.4 alkylamino and N-(C.sub.1 -C.sub.4)alkyl-N-(C.sub.1 -C.sub.4)alkanoylamino, Z.sup.1 is a group of the formula: ##STR2## (wherein R.sup.3 and R.sup.4 are each independently a hydrogen atom, a C.sub.1 -C.sub.4 alkyl group or an ar(C.sub.1 -C.sub.
    Type: Grant
    Filed: November 10, 1983
    Date of Patent: November 13, 1984
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Keiichi Ono, Hajime Kawakami, Junki Katsube