Patents by Inventor Keiichi Yahata

Keiichi Yahata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing apparatus
    Patent number: 10593571
    Abstract: Provided is a substrate processing apparatus including a liquid processing unit that performs a liquid processing on a substrate; a drying processing unit that performs a drying processing on the substrate in a wet state; a first conveyance unit that conveys the substrate to the liquid processing unit; a second conveyance unit that conveys the substrate in the wet state from the liquid processing unit to the drying processing unit; and a third conveyance unit that conveys the substrate before the liquid processing in the liquid processing unit and to convey the substrate after the drying processing from the drying processing unit. The first and second conveyance units and the drying processing unit are disposed on a side that faces the third conveyance unit, and the liquid processing unit is disposed on a side that faces the first and second conveyance units and is opposite to the third conveyance unit.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: March 17, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Hiroaki Inadomi, Tooru Nakamura, Kouji Kimoto, Yasuo Kiyohara, Satoshi Okamura, Satoshi Biwa, Nobuya Yamamoto, Katsuhiro Ookawa, Keiichi Yahata, Tetsuro Nakahara
  • SUBSTRATE PROCESSING APPARATUS
    Publication number: 20170287742
    Abstract: Provided is a substrate processing apparatus including a liquid processing unit that performs a liquid processing on a substrate; a drying processing unit that performs a drying processing on the substrate in a wet state; a first conveyance unit that conveys the substrate to the liquid processing unit; a second conveyance unit that conveys the substrate in the wet state from the liquid processing unit to the drying processing unit; and a third conveyance unit that conveys the substrate before the liquid processing in the liquid processing unit and to convey the substrate after the drying processing from the drying processing unit. The first and second conveyance units and the drying processing unit are disposed on a side that faces the third conveyance unit, and the liquid processing unit is disposed on a side that faces the first and second conveyance units and is opposite to the third conveyance unit.
    Type: Application
    Filed: March 23, 2017
    Publication date: October 5, 2017
    Inventors: Hiroaki Inadomi, Tooru Nakamura, Kouji Kimoto, Yasuo Kiyohara, Satoshi Okamura, Satoshi Biwa, Nobuya Yamamoto, Katsuhiro Ookawa, Keiichi Yahata, Tetsuro Nakahara