Patents by Inventor Keiichiro Sano

Keiichiro Sano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11516044
    Abstract: To realize a low power consumption and a small area of a network communication system and a semiconductor device for mounting the same. In the processing method of the network router or network communication frame, the received frame is input to the hash generator, to obtain an address based on the resulting hash value, the position of the address in the rule table, stores the rule corresponding to the received frame.
    Type: Grant
    Filed: October 2, 2020
    Date of Patent: November 29, 2022
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventor: Keiichiro Sano
  • Patent number: 11115235
    Abstract: A semiconductor device capable of improving the efficiencies of communication systems is provided. The semiconductor device comprises: an open period in which reception of data or transmission is allowed; a clock generation circuit defining a close period in which transmission of data and reception are not allowed; and a TSN controller connected to the clock generation circuit and performing transmission of data or reception, wherein the TSN controller performs semiconductor device or reception at another time than open period.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: September 7, 2021
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Keiichiro Sano, Jean Noel Mouthe
  • Publication number: 20210111922
    Abstract: To realize a low power consumption and a small area of a network communication system and a semiconductor device for mounting the same. In the processing method of the network router or network communication frame, the received frame is input to the hash generator, to obtain an address based on the resulting hash value, the position of the address in the rule table, stores the rule corresponding to the received frame.
    Type: Application
    Filed: October 2, 2020
    Publication date: April 15, 2021
    Inventor: Keiichiro SANO
  • Publication number: 20200213148
    Abstract: A semiconductor device capable of improving the efficiencies of communication systems is provided. The semiconductor device comprises: an open period in which reception of data or transmission is allowed; a clock generation circuit defining a close period in which transmission of data and reception are not allowed; and a TSN controller connected to the clock generation circuit and performing transmission of data or reception, wherein the TSN controller performs semiconductor device or reception at another time than open period.
    Type: Application
    Filed: December 17, 2019
    Publication date: July 2, 2020
    Inventors: Keiichiro SANO, Jean Noel MOUTHE
  • Publication number: 20170315778
    Abstract: When the conversion arithmetic of the numerical type of floating-point data and integer data is performed by software, the load of the CPU becomes heavy. A semiconductor device includes a memory, a bus coupled to the memory, a bus master coupled to the bus, and a conversion arithmetic circuit coupled to the bus. The conversion arithmetic circuit includes a floating-point data adder-subtracter, an integer data adder-subtracter, and a shift operator. The semiconductor device converts the floating-point data to the integer data or converts the integer data to the floating-point data, without employing a multiplier and a divider of the floating-point data.
    Type: Application
    Filed: March 28, 2017
    Publication date: November 2, 2017
    Applicant: Renesas Electronics Corporation
    Inventor: Keiichiro SANO
  • Patent number: 6372304
    Abstract: A high quality transparent SiC thin film can be deposited on the surface of a plastic material at low temperature utilizing Electron Cyclotron Resonance (ECR) Plasma CVD techniques, thereby enhancing surfacial hardness without spoiling designability. A magnetic field is applied to a plasma generating chamber by means of a surrounding magnetic coil. Microwaves are then introduced into the plasma generating chamber. Further, an upstream gas is introduced into the plasma generating chamber. ECR plasma is thus generated. A downstream gas is then supplied to the chamber from an inlet. Furthermore, the ECR plasma is passed through a mesh placed between the inlet and a polymer base material or between the plasma generating chamber and the inlet. Accordingly, a SiC film is deposited on a surface of a polymer base material.
    Type: Grant
    Filed: July 7, 1997
    Date of Patent: April 16, 2002
    Assignee: Suzuki Motor Corporation
    Inventors: Keiichiro Sano, Masaya Nomura, Hiroaki Tamamaki, Yoshinori Hatanaka
  • Patent number: 5962083
    Abstract: A method of depositing a thin film on a polymer substrate by plasma CVD comprises applying a magnetic field to a plasma generating chamber by activating a magnetic coil placed in the circumference of the plasma generating chamber, the plasma generating chamber having an inlet; introducing a microwave into the plasma generating chamber; introducing an upstream gas into the plasma generating chamber wherein an ECR plasma is generated; vaporizing a feed gas wherein a supply gas is generated and carries the ECR plasma; passing said ECR plasma through a mesh provided between the inlet and a polymer substrate located downstream of the inlet; and depositing a film on the surface of the polymer substrate.
    Type: Grant
    Filed: June 13, 1996
    Date of Patent: October 5, 1999
    Assignee: Suzuki Motor Corporation
    Inventors: Yoshinori Hatanaka, Yoichiro Nakanishi, Sunil Wickramanayaka, Keiichiro Sano, Masaya Nomura, Shigekazu Hayashi
  • Patent number: 5830577
    Abstract: The lubricant layer according to the present invention is used in a thin film magnetic recording medium in which a solid surface sliding at a high speed is required to retain its lubricating performance and abrasion resistance for a long period of time, comprising a host-guest complex composed of a lubricant molecule as a guest molecule and a multidentate ligand as a host compound to form the complex with the guest molecule.
    Type: Grant
    Filed: June 27, 1996
    Date of Patent: November 3, 1998
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hideki Murayama, Keiichiro Sano, Kazuhiko Sawada, Fumiaki Yokoyama, Haruhiko Ikeuchi, Yutaka Teranishi
  • Patent number: 5536577
    Abstract: The lubricant layer according to the present invention is used in a thin film magnetic recording medium in which a solid surface sliding at a high speed is required to retain its lubricating performance and abrasion resistance for a long period of time, comprising a host-guest complex composed of a lubricant molecule as a guest molecule and a multidentate ligand as a host compound to form the complex with the guest molecule.
    Type: Grant
    Filed: September 28, 1994
    Date of Patent: July 16, 1996
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hideki Murayama, Keiichiro Sano, Kazuhiko Sawada, Fumiaki Yokoyama, Haruhiko Ikeuchi, Yutaka Teranishi