Patents by Inventor Keiji Hirano

Keiji Hirano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180237312
    Abstract: An object of the disclosure is to provide a method of efficiently producing a highly-pure vanadium electrolytic solution from a combustion residue that is discharged from facilities such as refineries and power plants and contains uncombusted carbon. The method of producing a vanadium electrolytic solution for redox flow cell (RFB) includes a vanadium eluate generation step of obtaining a vanadium eluate in which vanadium is dissolved. The vanadium is contained in a combustion residue obtained after combustion of a fossil fuel. The method further includes a precipitation step of mixing a sulfide precipitant into the vanadium eluate to precipitate a solid substance of precipitate in a reduction state and a wet oxidation step including a process of adding dilute sulfuric acid to the solid substance separated from the solution to generate a vanadium sulfate solution.
    Type: Application
    Filed: October 20, 2016
    Publication date: August 23, 2018
    Applicant: LE SYSTEM CO., LTD.
    Inventors: Kanji SATO, Akira SAKUMA, Takeo KOBORI, Hideki FURUKAWA, Keiji HIRANO, Tatsuaki NAKANISHI
  • Patent number: 9634339
    Abstract: A redox flow battery includes: a positive electrolyte storage tank; a negative electrolyte storage tank; a cell stack; a positive electrolyte outward path that sends positive electrolyte to positive electrode chambers in the cell stack; a positive electrolyte return path that sends positive electrolyte to the positive electrolyte storage tank; a negative electrolyte outward path that sends negative electrolyte to negative electrode chambers of the cells; a negative electrolyte return path that sends negative electrolyte to the negative electrolyte storage tank; an entrance open circuit voltage measuring portion that measures an upstream open circuit voltage between the positive electrolyte inside the positive electrolyte outward path and the negative electrolyte inside the negative electrolyte outward path; and an exit open circuit voltage measuring portion that measures a downstream open circuit voltage between the positive electrolyte inside the positive electrolyte return path and the negative electrolyte
    Type: Grant
    Filed: March 31, 2014
    Date of Patent: April 25, 2017
    Assignee: LE SYSTEM CO., LTD.
    Inventors: Junichi Fukushima, Kanji Sato, Keiji Hirano
  • Publication number: 20160049673
    Abstract: A redox flow battery includes: a positive electrolyte storage tank; a negative electrolyte storage tank; a cell stack; a positive electrolyte outward path that sends positive electrolyte to positive electrode chambers in the cell stack; a positive electrolyte return path that sends positive electrolyte to the positive electrolyte storage tank; a negative electrolyte outward path that sends negative electrolyte to negative electrode chambers of the cells; a negative electrolyte return path that sends negative electrolyte to the negative electrolyte storage tank; an entrance open circuit voltage measuring portion that measures an upstream open circuit voltage between the positive electrolyte inside the positive electrolyte outward path and the negative electrolyte inside the negative electrolyte outward path; and an exit open circuit voltage measuring portion that measures a downstream open circuit voltage between the positive electrolyte inside the positive electrolyte return path and the negative electrolyte
    Type: Application
    Filed: March 31, 2014
    Publication date: February 18, 2016
    Applicant: LE SYSTEM CO., LTD.
    Inventors: Junichi FUKUSHIMA, Kanji SATO, Keiji HIRANO
  • Publication number: 20090286075
    Abstract: The thermally conductive resin material of the present invention has an excellent thermal conductive property without impairing the intrinsic practical properties such as the forming processability, lightness in weight and mechanical strength possessed by resins and has an anisotropic thermal conductive property capable of controlling the directionality and the transfer amount of the thermal conduction. The thermally conductive resin material of the present invention is a thermally conductive resin material including a base material of a thermoplastic resin (A) and a fibrous filler (C), wherein an organic compound (B) incompatible with the resin component is present as dispersed particles in the resin component, and two or more elements of the fibrous filler (C) are in contact with the surface of each of the dispersed particles or are located in each of the dispersed particles.
    Type: Application
    Filed: April 6, 2007
    Publication date: November 19, 2009
    Applicant: NEC CORPORATION
    Inventors: Akinobu Nakamura, Masatoshi Iji, Tsunenori Yanagisawa, Keiji Hirano
  • Patent number: 6992050
    Abstract: A stripping composition comprising (a) an anticorrosive agent, (b) a stripping agent and (c) a solvent, wherein the anticorrosive agent (a) is a heterocyclic compound having a nitrogen atom-containing six-membered ring.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: January 31, 2006
    Assignee: NEC Corporation
    Inventors: Tatsuya Koita, Keiji Hirano, Hidemitsu Aoki, Hiroaki Tomimori
  • Patent number: 6949465
    Abstract: According to this invention, residues generated after selectively removing a low-dielectric-constant film such as SiOC can be effectively removed without damage on an insulating film or metal film. Specifically, residues 126 and 128 generated after forming an interconnect trench in an SiOC film 116 are removed using a fluoride-free weak alkaline amine stripper. After the removing step, the wafer is rinsed with isopropyl alcohol and then dried without drying with pure water.
    Type: Grant
    Filed: July 9, 2003
    Date of Patent: September 27, 2005
    Assignee: NEC Electronics Corporation
    Inventors: Hidemitsu Aoki, Kenichi Tokioka, Yoshiko Kasama, Tatsuya Koito, Keiji Hirano
  • Patent number: 6869921
    Abstract: A stripping composition comprising at least one of alcohols having an ether-bond in the molecule thereof as component (a), and an anticorrosive as component (b). Furfuryl alcohol or tetrahydrofurfuryl alcohol is preferable as component (a).
    Type: Grant
    Filed: August 1, 2002
    Date of Patent: March 22, 2005
    Assignees: NEC Electronics Corporation, Sumitomo Chemical Company, Limited
    Inventors: Tatsuya Koito, Keiji Hirano, Masayuki Takashima, Kenichi Tokioka, Hidemitsu Aoki
  • Publication number: 20040029051
    Abstract: A stripping composition comprising (a) an anticorrosive agent, (b) a stripping agent and (c) a solvent, wherein the anticorrosive agent (a) is a heterocyclic compound having a nitrogen atom-containing six-membered ring.
    Type: Application
    Filed: December 26, 2002
    Publication date: February 12, 2004
    Inventors: Tatsuya Koita, Keiji Hirano, Hidemitsu Aoki, Hiroaki Tomimori
  • Publication number: 20040009658
    Abstract: According to this invention, residues generated after selectively removing a low-dielectric-constant film such as SiOC can be effectively removed without damage on an insulating film or metal film. Specifically, residues 126 and 128 generated after forming an interconnect trench in an SiOC film 116 are removed using a fluoride-free weak alkaline amine stripper. After the removing step, the wafer is rinsed with isopropyl alcohol and then dried without drying with pure water.
    Type: Application
    Filed: July 9, 2003
    Publication date: January 15, 2004
    Applicant: NEC Electronics Corporation
    Inventors: Hidemitsu Aoki, Kenichi Tokioka, Yosiko Kasama, Tatsuya Koito, Keiji Hirano
  • Patent number: 6652759
    Abstract: The present invention provides a method of treating waste water including nitrogen-containing organic compounds to convert these compounds into harmless gases without performing a post-treatment. The method comprises spraying waste water in a heated space to gasify the waste water into waste gas, and oxidizing the waste gas by contacting it with a catalyst to convert the nitrogen-containing organic compounds into harmless gases. An apparatus for treating waste water using the method is also disclosed.
    Type: Grant
    Filed: April 12, 2001
    Date of Patent: November 25, 2003
    Assignees: NEC Corporation, Nippon Shokubai Co., Ltd.
    Inventors: Tsutomu Taira, Keiji Hirano, Junji Okamura, Mitsuaki Ikeda, Kunio Sano
  • Publication number: 20030130147
    Abstract: A stripping composition comprising at least one of alcohols having an ether-bond in the molecule thereof as component (a), and an anticorrosive as component (b). Furfuryl alcohol or tetrahydrofurfuryl alcohol is preferable as component (a).
    Type: Application
    Filed: August 1, 2002
    Publication date: July 10, 2003
    Applicant: NEC CORPORATION, SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuya Koito, Keiji Hirano, Masayuki Takashima, Kenichi Tokioka, Hidemitsu Aoki
  • Publication number: 20030094610
    Abstract: A hydrogen dissolving device 2 is connected to a high-purity water processing device 1. Hydrogen is dissolved into the high-purity water in the hydrogen dissolving device 2 to produce hydrogen-dissolved water. The hydrogen-dissolved water is conveyed via a transport line 7 to a wash apparatus 5 or to an immersion apparatus 6. The hydrogen-dissolved water exiting from the transport line 7 inhibits oxidation of semiconductor devices during wash or immersion process.
    Type: Application
    Filed: October 25, 2002
    Publication date: May 22, 2003
    Inventors: Hidemitsu Aoki, Hiroaki Tomimori, Kenichi Yamamoto, Keiji Hirano, Tsutomu Taira, Yukinari Yamashita, Takashi Futatsuki
  • Publication number: 20010040135
    Abstract: The present invention provides a method of treating waste water including nitrogen-containing organic compounds to convert harmless gases without post-treatment. The method comprises steps of spraying the waste water in a heated space to gasify the waste water to waste gas, and oxidizing the waste gas by contacting with a catalyst to convert the nitrogen-containing organic compound into harmless gases.
    Type: Application
    Filed: April 12, 2001
    Publication date: November 15, 2001
    Inventors: Tsutomu Taira, Keiji Hirano, Junji Okamura, Mitsuaki Ikeda, Kunio Sano
  • Patent number: 5858267
    Abstract: According to the present invention, there is provided a method for nonbiologically treating an chlorinated organic compound contained in an environment polluted with the chlorinated organic compound, which comprises the step of introducing silicon into the environment to dechlorinate the chlorinated organic compound.
    Type: Grant
    Filed: October 10, 1997
    Date of Patent: January 12, 1999
    Assignee: NEC Corporation
    Inventors: Keiji Hirano, Noriyuki Nakayama
  • Patent number: 5759402
    Abstract: Method for the remediation of polluted soils by using microorganisms under anaerobic conditions wherein the degradation action of pollutants such as tetrachloroethylene, nitrate or nitrite by microorganisms under anaerobic conditions is induced or promoted by the addition of silicon to said polluted soils, without any risk of secondary pollution.
    Type: Grant
    Filed: January 24, 1997
    Date of Patent: June 2, 1998
    Assignee: NEC Corporation
    Inventors: Keiji Hirano, Noriyuki Nakayama, Shinya Nakamoto