Patents by Inventor Keiji Hirano
Keiji Hirano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180237312Abstract: An object of the disclosure is to provide a method of efficiently producing a highly-pure vanadium electrolytic solution from a combustion residue that is discharged from facilities such as refineries and power plants and contains uncombusted carbon. The method of producing a vanadium electrolytic solution for redox flow cell (RFB) includes a vanadium eluate generation step of obtaining a vanadium eluate in which vanadium is dissolved. The vanadium is contained in a combustion residue obtained after combustion of a fossil fuel. The method further includes a precipitation step of mixing a sulfide precipitant into the vanadium eluate to precipitate a solid substance of precipitate in a reduction state and a wet oxidation step including a process of adding dilute sulfuric acid to the solid substance separated from the solution to generate a vanadium sulfate solution.Type: ApplicationFiled: October 20, 2016Publication date: August 23, 2018Applicant: LE SYSTEM CO., LTD.Inventors: Kanji SATO, Akira SAKUMA, Takeo KOBORI, Hideki FURUKAWA, Keiji HIRANO, Tatsuaki NAKANISHI
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Patent number: 9634339Abstract: A redox flow battery includes: a positive electrolyte storage tank; a negative electrolyte storage tank; a cell stack; a positive electrolyte outward path that sends positive electrolyte to positive electrode chambers in the cell stack; a positive electrolyte return path that sends positive electrolyte to the positive electrolyte storage tank; a negative electrolyte outward path that sends negative electrolyte to negative electrode chambers of the cells; a negative electrolyte return path that sends negative electrolyte to the negative electrolyte storage tank; an entrance open circuit voltage measuring portion that measures an upstream open circuit voltage between the positive electrolyte inside the positive electrolyte outward path and the negative electrolyte inside the negative electrolyte outward path; and an exit open circuit voltage measuring portion that measures a downstream open circuit voltage between the positive electrolyte inside the positive electrolyte return path and the negative electrolyteType: GrantFiled: March 31, 2014Date of Patent: April 25, 2017Assignee: LE SYSTEM CO., LTD.Inventors: Junichi Fukushima, Kanji Sato, Keiji Hirano
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Publication number: 20160049673Abstract: A redox flow battery includes: a positive electrolyte storage tank; a negative electrolyte storage tank; a cell stack; a positive electrolyte outward path that sends positive electrolyte to positive electrode chambers in the cell stack; a positive electrolyte return path that sends positive electrolyte to the positive electrolyte storage tank; a negative electrolyte outward path that sends negative electrolyte to negative electrode chambers of the cells; a negative electrolyte return path that sends negative electrolyte to the negative electrolyte storage tank; an entrance open circuit voltage measuring portion that measures an upstream open circuit voltage between the positive electrolyte inside the positive electrolyte outward path and the negative electrolyte inside the negative electrolyte outward path; and an exit open circuit voltage measuring portion that measures a downstream open circuit voltage between the positive electrolyte inside the positive electrolyte return path and the negative electrolyteType: ApplicationFiled: March 31, 2014Publication date: February 18, 2016Applicant: LE SYSTEM CO., LTD.Inventors: Junichi FUKUSHIMA, Kanji SATO, Keiji HIRANO
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Publication number: 20090286075Abstract: The thermally conductive resin material of the present invention has an excellent thermal conductive property without impairing the intrinsic practical properties such as the forming processability, lightness in weight and mechanical strength possessed by resins and has an anisotropic thermal conductive property capable of controlling the directionality and the transfer amount of the thermal conduction. The thermally conductive resin material of the present invention is a thermally conductive resin material including a base material of a thermoplastic resin (A) and a fibrous filler (C), wherein an organic compound (B) incompatible with the resin component is present as dispersed particles in the resin component, and two or more elements of the fibrous filler (C) are in contact with the surface of each of the dispersed particles or are located in each of the dispersed particles.Type: ApplicationFiled: April 6, 2007Publication date: November 19, 2009Applicant: NEC CORPORATIONInventors: Akinobu Nakamura, Masatoshi Iji, Tsunenori Yanagisawa, Keiji Hirano
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Patent number: 6992050Abstract: A stripping composition comprising (a) an anticorrosive agent, (b) a stripping agent and (c) a solvent, wherein the anticorrosive agent (a) is a heterocyclic compound having a nitrogen atom-containing six-membered ring.Type: GrantFiled: June 27, 2001Date of Patent: January 31, 2006Assignee: NEC CorporationInventors: Tatsuya Koita, Keiji Hirano, Hidemitsu Aoki, Hiroaki Tomimori
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Patent number: 6949465Abstract: According to this invention, residues generated after selectively removing a low-dielectric-constant film such as SiOC can be effectively removed without damage on an insulating film or metal film. Specifically, residues 126 and 128 generated after forming an interconnect trench in an SiOC film 116 are removed using a fluoride-free weak alkaline amine stripper. After the removing step, the wafer is rinsed with isopropyl alcohol and then dried without drying with pure water.Type: GrantFiled: July 9, 2003Date of Patent: September 27, 2005Assignee: NEC Electronics CorporationInventors: Hidemitsu Aoki, Kenichi Tokioka, Yoshiko Kasama, Tatsuya Koito, Keiji Hirano
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Patent number: 6869921Abstract: A stripping composition comprising at least one of alcohols having an ether-bond in the molecule thereof as component (a), and an anticorrosive as component (b). Furfuryl alcohol or tetrahydrofurfuryl alcohol is preferable as component (a).Type: GrantFiled: August 1, 2002Date of Patent: March 22, 2005Assignees: NEC Electronics Corporation, Sumitomo Chemical Company, LimitedInventors: Tatsuya Koito, Keiji Hirano, Masayuki Takashima, Kenichi Tokioka, Hidemitsu Aoki
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Publication number: 20040029051Abstract: A stripping composition comprising (a) an anticorrosive agent, (b) a stripping agent and (c) a solvent, wherein the anticorrosive agent (a) is a heterocyclic compound having a nitrogen atom-containing six-membered ring.Type: ApplicationFiled: December 26, 2002Publication date: February 12, 2004Inventors: Tatsuya Koita, Keiji Hirano, Hidemitsu Aoki, Hiroaki Tomimori
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Publication number: 20040009658Abstract: According to this invention, residues generated after selectively removing a low-dielectric-constant film such as SiOC can be effectively removed without damage on an insulating film or metal film. Specifically, residues 126 and 128 generated after forming an interconnect trench in an SiOC film 116 are removed using a fluoride-free weak alkaline amine stripper. After the removing step, the wafer is rinsed with isopropyl alcohol and then dried without drying with pure water.Type: ApplicationFiled: July 9, 2003Publication date: January 15, 2004Applicant: NEC Electronics CorporationInventors: Hidemitsu Aoki, Kenichi Tokioka, Yosiko Kasama, Tatsuya Koito, Keiji Hirano
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Patent number: 6652759Abstract: The present invention provides a method of treating waste water including nitrogen-containing organic compounds to convert these compounds into harmless gases without performing a post-treatment. The method comprises spraying waste water in a heated space to gasify the waste water into waste gas, and oxidizing the waste gas by contacting it with a catalyst to convert the nitrogen-containing organic compounds into harmless gases. An apparatus for treating waste water using the method is also disclosed.Type: GrantFiled: April 12, 2001Date of Patent: November 25, 2003Assignees: NEC Corporation, Nippon Shokubai Co., Ltd.Inventors: Tsutomu Taira, Keiji Hirano, Junji Okamura, Mitsuaki Ikeda, Kunio Sano
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Publication number: 20030130147Abstract: A stripping composition comprising at least one of alcohols having an ether-bond in the molecule thereof as component (a), and an anticorrosive as component (b). Furfuryl alcohol or tetrahydrofurfuryl alcohol is preferable as component (a).Type: ApplicationFiled: August 1, 2002Publication date: July 10, 2003Applicant: NEC CORPORATION, SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuya Koito, Keiji Hirano, Masayuki Takashima, Kenichi Tokioka, Hidemitsu Aoki
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Publication number: 20030094610Abstract: A hydrogen dissolving device 2 is connected to a high-purity water processing device 1. Hydrogen is dissolved into the high-purity water in the hydrogen dissolving device 2 to produce hydrogen-dissolved water. The hydrogen-dissolved water is conveyed via a transport line 7 to a wash apparatus 5 or to an immersion apparatus 6. The hydrogen-dissolved water exiting from the transport line 7 inhibits oxidation of semiconductor devices during wash or immersion process.Type: ApplicationFiled: October 25, 2002Publication date: May 22, 2003Inventors: Hidemitsu Aoki, Hiroaki Tomimori, Kenichi Yamamoto, Keiji Hirano, Tsutomu Taira, Yukinari Yamashita, Takashi Futatsuki
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Publication number: 20010040135Abstract: The present invention provides a method of treating waste water including nitrogen-containing organic compounds to convert harmless gases without post-treatment. The method comprises steps of spraying the waste water in a heated space to gasify the waste water to waste gas, and oxidizing the waste gas by contacting with a catalyst to convert the nitrogen-containing organic compound into harmless gases.Type: ApplicationFiled: April 12, 2001Publication date: November 15, 2001Inventors: Tsutomu Taira, Keiji Hirano, Junji Okamura, Mitsuaki Ikeda, Kunio Sano
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Patent number: 5858267Abstract: According to the present invention, there is provided a method for nonbiologically treating an chlorinated organic compound contained in an environment polluted with the chlorinated organic compound, which comprises the step of introducing silicon into the environment to dechlorinate the chlorinated organic compound.Type: GrantFiled: October 10, 1997Date of Patent: January 12, 1999Assignee: NEC CorporationInventors: Keiji Hirano, Noriyuki Nakayama
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Patent number: 5759402Abstract: Method for the remediation of polluted soils by using microorganisms under anaerobic conditions wherein the degradation action of pollutants such as tetrachloroethylene, nitrate or nitrite by microorganisms under anaerobic conditions is induced or promoted by the addition of silicon to said polluted soils, without any risk of secondary pollution.Type: GrantFiled: January 24, 1997Date of Patent: June 2, 1998Assignee: NEC CorporationInventors: Keiji Hirano, Noriyuki Nakayama, Shinya Nakamoto