Patents by Inventor Keiji Kabeta
Keiji Kabeta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5802233Abstract: A polysilane optical device comprising a hydrocarbyloxy group-containing polysilane encapsulated with a material having a light transmitting property and air impermeability, such as a glass, a polystyrene, an acryl resin, or a polycarbonate. The optical device has a high durability, and optical characteristics and functions thereof do not greatly change.Type: GrantFiled: September 11, 1996Date of Patent: September 1, 1998Assignee: Toshiba Silicone Co., Ltd.Inventors: Shinichiro Sugi, Keiji Kabeta, Shigeru Wakamatsu, Takafumi Imai
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Patent number: 5759638Abstract: The present invention relates to a process for forming an electronic circuit, which comprises coating a polyorganosilane on at least one surface of a substrate for forming an electronic circuit, followed by drying to form a solid state polysilane thin film, masking a portion for forming a circuit of said thin film and oxidizing a remaining portion to form an insulating portion, and then doping an oxidizing substance to the portion subjected to masking to form a conductive portion, and in order to oxidize a partial portion of the thin film, said thin film is irradiated with UV light in the presence of oxygen, preferably, in the oxidizing step, by carrying out partial oxidation while controlling an oxidation degree, the remaining portion is converted into three or more kinds of portions having different volume resistivities.Type: GrantFiled: March 4, 1997Date of Patent: June 2, 1998Assignee: Toshiba Silicone Co., Ltd.Inventors: Takafumi Imai, Keiji Kabeta, Kiyoaki Syuto, Shigeru Wakamatsu
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Patent number: 5633312Abstract: Disclosed is a process for preparing a polyorganosilane which comprises subjecting a disilane compound having at least two substituted or unsubstituted hydrocarbyloxy groups in one molecule to disproportionation reaction in the presence of a catalyst comprising a reaction product of an organic alkali metal compound represented by the formula (I):RM (I)wherein R represents a substituted or unsubstituted monovalent hydrocarbon group; and M represents an alkali metal,represented by the formula (III):MR.sup.3.sub.p M (III)wherein R.sup.3 represents a saturated or unsaturated chain or cyclic divalent hydrocarbon group or a divalent heterocyclic group, two or more R.sup.3 s may be the same or different and an ether oxygen atom may exist between two or more R.sup.3 s; p represents an integer of 1 or more; and M represents an alkali metal atom,and at least one of a disilane compound and a silane compound both of which have a substituted or unsubstituted hydrocarbyloxy group(s).Type: GrantFiled: April 1, 1996Date of Patent: May 27, 1997Assignee: Toshiba Silicone Co., Ltd.Inventors: Keiji Kabeta, Sigeru Wakamatsu, Takafumi Imai
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Patent number: 5489662Abstract: A process for the preparation of an organosilicon polymer, which comprises reacting one equivalent of a bis(alkoxysilyl) compound represented by the following general formula:R.sup.1 R.sup.2 R.sup.3 Si--(A).sub.p --SiR.sup.1 R.sup.2 R.sup.3wherein R.sup.1, R.sup.2 and R.sup.3 each represents the same or different substituted or unsubstituted monovalent hydrocarbon group or an alkoxy group, with the proviso that at least one of R.sup.1, R.sup.2 and R.sup.3 is an alkoxy group; A represents a divalent aromatic group, a divalent conjugated or nonconjugated unsaturated aliphatic group, or a divalent saturated aliphatic group; and p represents an integer of 1 or more, with one or more equivalents of an alkoxydisilane represented by the following general formula:(OR.sup.4).sub.6-n Si.sub.2 (R.sup.5).sub.nwherein R.sup.4 and R.sup.Type: GrantFiled: August 31, 1994Date of Patent: February 6, 1996Assignee: Toshiba Silicone Co., Ltd.Inventors: Shigeru Wakamatsu, Keiji Kabeta, Takafumi Imai
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Patent number: 5075459Abstract: A treatment agent for inorganic siliconaceous fillers has as its main ingredient an organosilicon compound of general fomrula (I): ##STR1## in which X represents a functional group selected from among H.sub.2 NCH.sub.2 CH.sub.2 --, H.sub.2 NCH.sub.2 CH.sub.2 CH.sub.2 --, ##STR2## Y.sup.1 is CH.sub.2 .dbd.CHCH.sub.2 -- or --CH.sub.2 CH.sub.2 CH.sub.2 SiR.sub.n.sup.1 Z.sub.3-n.sup.1, R.sup.1 is a substituted or nonsubstituted monovalent hydrocarbon group, Z.sup.1 is an alkoxy group having 1-6 carbon atoms and n is an integer from 0-2, or of general formula (II): ##STR3## in which Y.sup.2 is ##STR4## --CH.sub.2 CH.sub.2 CH.sub.2 SiR.sub.m.sup.2 Z.sub.3-m.sup.2 or a substitutent or nonsubstituted monovalent hydrocarbon group, Z.sup.2 is an alkoxy group having 1-6 carbon atoms and m is an integer from 0-2.Type: GrantFiled: November 26, 1990Date of Patent: December 24, 1991Assignee: Toshiba Silicone Co., Ltd.Inventors: Keiji Kabeta, Kiyoaki Syuto
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Patent number: 4997860Abstract: A sand casting caking agent contains an acid-curable resin and an organosilicon compound of the general formula (I): ##STR1## in which R.sup.1 is hydrogen or an alkyl having from 1 to 6 carbon atoms, R is a substituted or nonsubstituted monovalent hydrocarbon group, Y is an alkoxy group having from 1 to 6 carbon atoms, n is an integer of from 1 to 6 and m is either 0 or 1. Casting molds containing the agent of the present invention exhibit superior moisture resistance.Type: GrantFiled: October 11, 1989Date of Patent: March 5, 1991Assignee: Toshiba Silicone Co., Ltd.Inventor: Keiji Kabeta
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Patent number: 4990641Abstract: A new organosilicon compound is defined by the formula (1): ##STR1## in which R.sup.1 is a hydrogen atom or a methyl gorup, X.sup.1 and X.sup.2 each independently are --CH.sub.2 CH.dbd.CH.sub.2 or --(CH.sub.2).sub.2 SiR.sup.2.sub.n Y.sub.3-n, provided at least one of them --(CH.sub.2).sub.3 SiR.sup.2.sub.n Y.sub.3-n, R.sup.2 is a substituted or non-substituted monovalent hydrocarbon group, Y is an alkoxy group or a halogen atom, and n is zero, 1 or 2.Type: GrantFiled: July 7, 1989Date of Patent: February 5, 1991Assignee: Toshiba Silicone Co., Ltd.Inventor: Keiji Kabeta
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Patent number: 4927949Abstract: An improved method of preparing an aminoalkylalkoxy silane of the formula: ##STR1## in which R.sup.1 and R.sup.2 independently are alkyl groups having 1-8 carbon atoms, R.sup.3 is a hydrogen atom or an alkyl group having 1-6 carbon atoms, R.sup.4 and R.sup.5 independently are a member selected from the group consisting of a hydrogen atom, an alkyl group having 1-10 carbon atoms, --CH.sub.2 CH.sub.2 NH.sub.2, --CH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, an allyl group, a substituted phenyl group and a nonsubstituted phenyl group and a is an integer from 0-2, comprises the step of reacting a silane compound with an allylamine in the presence of a catalyst composition selected from the group consisting of (1) a rhodium complex catalyst and a heterocyclic compound containing nitrogen and/or sulfur atoms and (2) a rhodium complex catalyst having a heterocyclic compound containing nitrogen and/or sulfur atoms as a ligand.Type: GrantFiled: September 13, 1989Date of Patent: May 22, 1990Assignee: Toshiba Shilicone Co., Ltd.Inventors: Keiji Kabeta, Michio Zenbayashi
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Patent number: 4927951Abstract: An organosilicon compound which contains a highly reactive (meth)acrylamide and a siloxane group with a molecule has the following formula: ##STR1## where R.sup.1 is a methyl group or hydrogen atom, R.sup.2 is a substituted or unsubstituted monovalent hydrocarbon group, Q is a divalent hydrocarbon group having 1-8 carbon atoms, A is a hydrogen atom, substituted or unsubstituted hydrocarbon carbon group or --QSiR.sup.n.sup.2 [OSi(CH.sub.3).sub.3 ].sub.3-n, and n is an integer from 0-2.Type: GrantFiled: October 20, 1989Date of Patent: May 22, 1990Assignee: Toshiba Silicone Co., Ltd.Inventors: Keiji Kabeta, Kiyoaki Syuto
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Patent number: 4921976Abstract: A silicon compound represented by formula (I): ##STR1## wherein either one of R.sup.1 and R.sup.2 represents a vinyl group with the other representing a hydrogen atom; either one of R.sup.3 and R.sup.4 represents a vinyl group with the other representing a hydrogen atom; and R.sup.5, R.sup.6, and R.sup.7, which may be the same or different, each represents a substituted or unsubstituted monovalent hydrocarbon group, an alkoxy group or a halogen atom. The compound exhibits improved compatibility with polymerizable monomers or organic polymers and is useful as a crosslinking agent or modifier.Type: GrantFiled: November 16, 1988Date of Patent: May 1, 1990Assignee: Toshiba Silicone Co., Ltd.Inventor: Keiji Kabeta
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Patent number: 4814473Abstract: In a process for producing 5-vinylbicyclo[2.2.1]heptyltrichlorosilane by addition-reacting 5-vinylbicyclo[2.2.1]hepta-2-ene with trichlorosilane, a process for producing 5-vinylbicyclo[2.2.1]heptyltrichlorosilane characterized in that a palladium metal or palladium complex is used as a catalyst.Type: GrantFiled: September 19, 1988Date of Patent: March 21, 1989Assignee: Toshiba Silicone Co., Ltd.Inventor: Keiji Kabeta