Patents by Inventor Keiji Maishigi

Keiji Maishigi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11946470
    Abstract: An information processing apparatus detecting presence or absence of abnormality of a vacuum pump derived from a product produced within a target vacuum pump, including: a determination unit configured to determine a normal variation range or a normal time variation behavior of a target state quantity which is a state quantity varying depending on a load of gas flowing into the vacuum pump, based on at least one of past target state quantities of the target vacuum pump or another vacuum pump; and a comparison unit configured to compare a current target state quantity of the target vacuum pump with the normal variation range or the normal time variation behavior and output the comparison result.
    Type: Grant
    Filed: March 13, 2018
    Date of Patent: April 2, 2024
    Assignee: EBARA CORPORATION
    Inventors: Keiji Maishigi, Tetsuro Sugiura, Katsuaki Usui, Masahiro Hatakeyama, Chikako Honma, Toru Osuga, Koichi Iwasaki, Jie Yuan Lin
  • Publication number: 20240077079
    Abstract: An information processing apparatus detecting presence or absence of abnormality of a vacuum pump derived from a product produced within a target vacuum pump, including: a determination unit configured to determine a normal variation range or a normal time variation behavior of a target state quantity which is a state quantity varying depending on a load of gas flowing into the vacuum pump, based on at least one of past target state quantities of the target vacuum pump or another vacuum pump; and a comparison unit configured to compare a current target state quantity of the target vacuum pump with the normal variation range or the normal time variation behavior and output the comparison result.
    Type: Application
    Filed: November 14, 2023
    Publication date: March 7, 2024
    Inventors: Keiji MAISHIGI, Tetsuro SUGIURA, Katsuaki USUI, Masahiro HATAKEYAMA, Chikako HONMA, Toru OSUGA, Koichi IWASAKI, Jie Yuan LIN
  • Patent number: 11396876
    Abstract: A control device that controls a target vacuum pump including a motor, including: a decision unit that decides, using at least one of target state quantities at a time of a past stop process of the target vacuum pump or another vacuum pump wherein the target state quantities are state quantities which fluctuate in accordance with a load at a time of a process of stopping a vacuum pump, a normal fluctuation range or a normal time fluctuation behavior of the target state quantity at the time of the stop process; and a control unit that controls the motor, wherein the control unit compares the target state quantity at the time of the process of stopping the target vacuum pump with the normal fluctuation range or the normal time fluctuation behavior, and changes a method of controlling the motor during the stop process depending on the comparison result.
    Type: Grant
    Filed: June 5, 2019
    Date of Patent: July 26, 2022
    Assignee: EBARA CORPORATION
    Inventors: Keiji Maishigi, Tetsuro Sugiura, Atsushi Shiokawa
  • Publication number: 20200109712
    Abstract: An information processing apparatus detecting presence or absence of abnormality of a vacuum pump derived from a product produced within a target vacuum pump, including: a determination unit configured to determine a normal variation range or a normal time variation behavior of a target state quantity which is a state quantity varying depending on a load of gas flowing into the vacuum pump, based on at least one of past target state quantities of the target vacuum pump or another vacuum pump; and a comparison unit configured to compare a current target state quantity of the target vacuum pump with the normal variation range or the normal time variation behavior and output the comparison result.
    Type: Application
    Filed: March 13, 2018
    Publication date: April 9, 2020
    Inventors: Keiji Maishigi, Tetsuro Sugiura, Katsuaki Usui, Masahiro Hatakeyama, Chikako Honma, Toru Osuga, Koichi Iwasaki, Jie Yuan Lin
  • Publication number: 20190368490
    Abstract: A control device that controls a target vacuum pump including a motor, including: a decision unit that decides, using at least one of target state quantities at a time of a past stop process of the target vacuum pump or another vacuum pump wherein the target state quantities are state quantities which fluctuate in accordance with a load at a time of a process of stopping a vacuum pump, a normal fluctuation range or a normal time fluctuation behavior of the target state quantity at the time of the stop process; and a control unit that controls the motor, wherein the control unit compares the target state quantity at the time of the process of stopping the target vacuum pump with the normal fluctuation range or the normal time fluctuation behavior, and changes a method of controlling the motor during the stop process depending on the comparison result.
    Type: Application
    Filed: June 5, 2019
    Publication date: December 5, 2019
    Inventors: Keiji Maishigi, Tetsuro Sugiura, Atsushi Shiokawa
  • Publication number: 20060243604
    Abstract: The present invention relates to a method and apparatus for removing and recovering metal such as copper from various kinds of waste water containing copper. A method for treating waste water includes treating waste water in a copper treatment step (10) comprising a combination of electrodialysis operation and electrolytic deposition operation to produce treated water (107) having a lowered copper concentration, and recovering copper from the waste water.
    Type: Application
    Filed: April 28, 2004
    Publication date: November 2, 2006
    Inventors: Sota Nakagawa, Masaji Akahori, Makoto Kashiwagi, Keiji Maishigi
  • Patent number: 6673148
    Abstract: An apparatus and method is provided for manufacturing a semiconductor substrate such as web crystals. The apparatus includes a chamber and a growth hardware assembly housed within the chamber. A magnetic field system produces a vertical magnetic field within the chamber.
    Type: Grant
    Filed: September 5, 2002
    Date of Patent: January 6, 2004
    Assignee: Ebara Solar, Inc.
    Inventors: Hilton F. Glavish, Hideyuki Isozaki, Keiji Maishigi, Kentaro Fujita
  • Patent number: 6669776
    Abstract: An apparatus and method is provided for manufacturing a semiconductor substrate such as web crystals. The apparatus includes a chamber and a growth hardware assembly housed within the chamber. A magnetic field system produces a vertical magnetic field within the chamber.
    Type: Grant
    Filed: August 2, 2002
    Date of Patent: December 30, 2003
    Assignee: Ebara Solar, Inc.
    Inventors: Hilton F. Glavish, Hideyuki Isozaki, Keiji Maishigi, Kentaro Fujita
  • Publication number: 20030097978
    Abstract: An apparatus and method is provided for manufacturing a semiconductor substrate such as web crystals. The apparatus includes a chamber and a growth hardware assembly housed within the chamber. A magnetic field system produces a vertical magnetic field within the chamber.
    Type: Application
    Filed: September 5, 2002
    Publication date: May 29, 2003
    Inventors: Hilton F. Glavish, Hideyuki Isozaki, Keiji Maishigi, Kentaro Fujita
  • Publication number: 20030010282
    Abstract: An apparatus and method is provided for manufacturing a semiconductor substrate such as web crystals. The apparatus includes a chamber and a growth hardware assembly housed within the chamber. A magnetic field system produces a vertical magnetic field within the chamber.
    Type: Application
    Filed: August 2, 2002
    Publication date: January 16, 2003
    Inventors: Hilton F. Glavish, Hideyuki Isozaki, Keiji Maishigi, Kentaro Fujita
  • Patent number: 6482261
    Abstract: An apparatus and method is provided for manufacturing a semiconductor substrate such as web crystals. The apparatus includes a chamber and a growth hardware assembly housed within the chamber. A magnetic field system produces a vertical magnetic field within the chamber.
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: November 19, 2002
    Assignee: Ebara Solar, Inc.
    Inventors: Hilton F. Glavish, Hideyuki Isozaki, Keiji Maishigi, Kentaro Fujita
  • Publication number: 20020121237
    Abstract: An apparatus and method is provided for manufacturing a semiconductor substrate such as web crystals. The apparatus includes a chamber and a growth hardware assembly housed within the chamber. A magnetic field system produces a vertical magnetic field within the chamber.
    Type: Application
    Filed: December 29, 2000
    Publication date: September 5, 2002
    Inventors: Hilton F. Glavish, Hideyuki Isozaki, Keiji Maishigi, Kentaro Fujita