Abstract: A thickness measuring apparatus has a thickness measuring unit including a white light source, a diffracting mechanism that diffracts white light emitted from the white light source into diffracted light at time differences corresponding to the wavelengths of light components of the white light, a two-dimensional image sensor having a photodetection area that include a plurality of pixels for detecting return light reflected from upper and lower surfaces of a plate-shaped workpiece, a storage unit that stores, as a spectral interference waveform, intensities of the return light corresponding to the wavelengths of the light components successively received at the time differences by the pixels, and a waveform table recording therein a plurality of kinds of sample spectral interference waveforms corresponding to plate-shaped workpiece thicknesses.

Abstract: A mechanism for detecting the inside of a workpiece includes a wavelength delaying unit for outputting each pulse of a pulsed laser beam emitted from a laser oscillator with time differences imparted to respective wavelengths, and a ring generating unit for generating a ring-shaped pulsed laser beam from the pulsed laser beam with the time differences imparted to the respective wavelengths and diffracting the ring-shaped pulsed laser beam into ring-shaped laser beams ranging from small to large at the respective wavelengths. When the ring-shaped laser beams with the time differences imparted to the respective wavelengths are applied to the workpiece, they produce an interference wave of ultrasonic waves in the workpiece, and vibrations are produced at a position where the interference wave of the ultrasonic waves is converged. A laser beam is applied to an upper surface of the workpiece at a position aligned with the center of the vibrations.

Abstract: An imaging unit for an ultrafast imaging apparatus includes an objective lens opposing a workpiece supported on a chuck table, a beam splitter disposed in a first optical path extending from the objective lens, an image processing unit disposed in a second optical path extending from the beam splitter, and an illumination unit disposed in a third optical path extending from the beam splitter. The illumination unit includes a broadband pulsed light source, and a spectrometer configured to divide a single pulse of light, which has been emitted from the broadband pulsed light source, into a plurality of wavelengths and to produce a time lag between each two adjacent ones of the plurality of wavelengths.

Abstract: A laser applying mechanism which has a laser oscillator adapted to oscillate a pulsed laser and to emit a linearly polarized pulsed laser beam. The laser applying mechanism includes: a polarization plane composing unit adapted to selectively synthesize a pulsed laser beam having a second polarization plane rotated by 90 degrees with respect to a pulsed laser beam having a first polarization plane which is emitted from the laser oscillator; an amplifier adapted to amplify a power of the pulsed laser beam composed by the polarization plane composing unit; and a pulsed laser beam extracting unit adapted to extract a pulsed laser beam having a polarization plane to be utilized, from among the pulsed laser beam having the first polarization plane and the pulsed laser beam having the second polarization plane which are contained in the pulsed laser beam amplified by the amplifier.

Abstract: A thickness measuring apparatus includes a white light source for emitting white light, a dispersing mechanism for producing time differences corresponding to the wavelengths of light components of the white light to thereby generate spectral light, the spectral light being applied to the workpiece and then reflected on the upper surface and the lower surface of the workpiece to obtain return light, a two-dimensional image sensor having a photodetecting area for detecting the return light, the photodetecting area including a plurality of pixels, a storing section for storing the intensity of the return light detected by the plural pixels according to wavelength with time difference, the intensity of the return light detected by each pixel being stored as a spectral interference waveform, and a thickness computing section for computing the thickness of the workpiece from the spectral interference waveform stored in the storing section.

Abstract: A liquid supply mechanism disposed over a holding unit of laser processing apparatus includes a liquid chamber having a circular-disc-shaped transparent plate positioned to form a gap between the circular-disc-shaped transparent plate and an upper surface of the workpiece held by the holding table, a liquid supply nozzle that supplies a liquid from one side of the liquid chamber to the gap, a liquid discharge nozzle that discharges the liquid from the other side of the liquid chamber, and a rotation mechanism that rotates the circular-disc-shaped transparent plate and generates a flow velocity in the liquid supplied to the gap. The laser beam irradiation unit includes a laser oscillator that emits a laser beam and a condenser that condenses the laser beam emitted from the laser oscillator and irradiates the workpiece with the laser beam transmitted through the transparent plate and the liquid supplied to the gap.

Abstract: An image capturing apparatus for capturing an image of a workpiece held on a chuck table includes a camera, an objective lens having a minute hole defined centrally therein and disposed in facing relation to the workpiece held on the chuck table, an optical fiber having an end inserted in the minute hole in the objective lens, a light source optically coupled to another end of the optical fiber, and a beam splitter disposed in the optical fiber for branching off returning light reflected by the workpiece held on the chuck table. The image capturing apparatus further includes a calculating section for calculating a value representing a height or a thickness of the workpiece on the basis of the returning light branched off by the beam splitter, and a focusing mechanism for focusing the objective lens on the workpiece on the basis of the value calculated by the calculating section.

Abstract: An illuminating apparatus adapted to be mounted on an image capturing apparatus for capturing an image of a workpiece held on a chuck table includes a light source, an objective lens having a minute hole defined centrally therein and disposed in facing relation to the workpiece held on the chuck table, and an optical fiber having an end inserted in the minute hole in the objective lens and another end optically coupled to the light source.

Abstract: A processing apparatus includes: a chuck table that is configured to be capable of rotation in a state of supporting the workpiece; a processing unit including a spindle to which a processing tool for grinding or polishing is mounted and a drive source that rotates the spindle; a measuring unit that measures distribution of thickness of the workpiece; a laser beam applying unit that has an adjustor for adjusting power of a laser beam applied to the workpiece; and a control unit including a power setting section that sets the power of the laser beam applied to an arbitrary region of the workpiece based on the distribution of the thickness of the workpiece measured by the measuring unit, and an adjustor control section that controls the adjustor of the laser beam applying unit such as to realize the power of the laser beam set by the power setting section.

Abstract: A laser processing machine includes a condenser and a water pillar forming unit. The condenser condenses a laser beam emitted from a laser oscillator and irradiates it to a workpiece held on a chuck table. The water pillar forming unit is disposed on a lower end of the condenser and is configured to form a thread-shaped water pillar on a front side of the workpiece. The laser oscillator includes a first laser oscillator, which emits a first laser beam having a short pulse width, and a second laser oscillator, which emits a second laser beam having a long pulse width. After the laser beams emitted from the first and second laser oscillators have transmitted through the thread-shaped water pillar formed by the water pillar forming unit and have been irradiated to the workpiece, a plasma occurred in the water pillar forming unit applies processing to the workpiece.

Abstract: A processing method of a workpiece used when the workpiece is processed is provided. The processing method of a workpiece includes a disposing step of disposing the workpiece in a gas containing a substance that generates an active species that reacts with the workpiece, a measurement step of measuring the distribution of the thickness of the workpiece disposed in the gas, and a laser beam irradiation step of irradiating the workpiece in the gas with a laser beam of which the power is adjusted based on the distribution of the thickness measured in the measurement step. In the laser beam irradiation step, the removal amount by which a region irradiated with the laser beam in the workpiece is removed by the active species is controlled by irradiating the workpiece with the laser beam of which the power is adjusted.

Abstract: A thickness measuring apparatus that measures a thickness of a workpiece held by a chuck table. The thickness measuring apparatus includes plural image sensors that detect intensity of light spectrally split on each wavelength basis by plural diffraction gratings and generate a spectral interference waveform and a thickness output unit that outputs thickness information from the spectral interference waveform generated by the plural image sensors.

Abstract: A laser beam applying unit of a laser processing apparatus includes a laser oscillator adapted to emit a laser beam, a condenser adapted to focus the laser beam emitted from the laser oscillator and to thereby apply the laser beam to the workpiece held by a holding unit, and a liquid layer former disposed at a lower end portion of the condenser and adapted to form a layer of a liquid on an upper surface of the workpiece. The liquid layer former includes a casing having a bottom wall that forms a gap between itself and the upper surface of the workpiece, a liquid supply section adapted to supply the liquid to the casing, and a transparent section that is formed at the bottom wall adjacently to the jet port and that permits transmission of the laser beam therethrough.

Abstract: A laser beam applying unit of a laser processing apparatus includes a beam splitter disposed on a first optical path connecting a laser oscillator and a condenser, a wide band light source disposed on a second optical path branched by the beam splitter, a spectroscope that is disposed between the wide band light source and the beam splitter and that branches the laser beam from the second optical path to a third optical path, and a Z position detection unit that is disposed on the third optical path branched by the spectroscope and that detects the position in a Z-axis direction of a workpiece according to an intensity of light corresponding to the wavelength of return light that is generated when the light of the wide band light source is condensed by the condenser and is reflected by the workpiece held by a chuck table.

Abstract: A thickness measuring apparatus including a thickness measuring unit for measuring the thickness of a plate-shaped workpiece. The thickness measuring unit includes a white light source for emitting white light, a dispersing mechanism for producing time differences corresponding to wavelengths of light components of the white light to thereby generate spectral light, a two-dimensional image sensor having a photodetecting area for detecting the return light, the photodetecting area including a plurality of pixels, a storing section for storing the intensity of the return light detected by the plural pixels according to wavelength with time difference, a waveform table previously storing a plurality of kinds of sample spectral interference waveforms respectively corresponding to different thicknesses of the workpiece, and a thickness deciding section for deciding the thickness at an X-Y coordinate position in a two-dimensional area of the workpiece.

Abstract: A measuring apparatus for measuring positional relation between a chuck table for holding a workpiece thereon and a processing tool for processing the workpiece held on the chuck table. The measuring apparatus includes a broadband light source, a mirror for reflecting light emitted from the broadband light source to travel toward the processing tool, a chromatic aberration condensing lens disposed between the broadband light source and the mirror or between the mirror and the processing tool, a light branching unit branching reflected light from the processing tool that has been reflected by the mirror and traveled back through the chromatic aberration condensing lens, and a position detecting unit detecting the position of the processing tool on the basis of intensity of the reflected light that corresponds to a wavelength of the reflected light branched by the light branching unit.

Abstract: There is provided an optical axis adjustment jig including a flat parallel-surface plate having an upper surface and a lower surface with reflective films disposed respectively thereon, and an image capturing unit disposed beneath the flat parallel-surface plate for capturing an image of a laser beam applied thereto. The flat parallel-surface plate is made of a material that is transmissive of a wavelength of the laser beam. The laser beam is applied through the flat parallel-surface plate to the image capturing unit. A tilt of the optical axis of the laser beam is detected on the basis of the shape of the beam spot of the laser beam whose image has been captured by the image capturing unit.

Abstract: A method of confirming an optical axis of a laser processing apparatus includes placing an image capturing unit so as to be movable in X-axis directions, removing a second mirror and capturing an image of a laser beam with the image capturing unit for receiving the laser beam reflected by a first mirror, installing the second mirror and capturing an image of the laser beam with the image capturing unit for receiving the laser beam reflected by a third mirror, and determining whether an optical axis of the laser beam reflected by the first mirror and an optical axis of the laser beam reflected by the third mirror exist in one XZ plane or not on the basis of the captured images and a reference line in the captured images.

Abstract: A liquid supply mechanism is disposed on an upper portion of a holding unit of a laser processing apparatus. The liquid supply mechanism includes: a liquid chamber having a transparent plate positioned such that a gap is formed between the transparent plate and the top surface of a workpiece held on a holding table; a linear-motion mechanism configured to linearly move the transparent plate over the liquid chamber; a liquid supply nozzle configured to supply a liquid from one side of the liquid chamber to the gap; and a liquid discharge nozzle configured to discharge the liquid from another side of the liquid chamber. A laser beam irradiating unit includes a laser oscillator configured to irradiate the workpiece through the transparent plate and the liquid supplied to the gap.

Abstract: A thickness measuring apparatus for measuring a thickness of a wafer includes a light source emitting light having a transmission wavelength region to the wafer, a focusing unit applying the light emitted from the light source to the wafer held on a chuck table, an optical branching section branching the light reflected on the wafer held on the chuck table, a diffraction grating diffracting the reflected light branched by the optical branching section to obtain diffracted light of different wavelengths, an image sensor detecting an intensity of the diffracted light obtained by the diffraction grating to produce a spectral interference waveform, and a computing unit computing the spectral interference waveform produced by the image sensor to output thickness information.