Abstract: A rotor constituting a rotating electric machine includes a rotating shaft and a permanent magnet. A sleeve covering the outer surface of the permanent magnet is attached to the rotating shaft. A resin coating layer is formed on an outer circumferential wall of the sleeve. The resin coating layer includes a base portion and a plurality of ridges formed on the outer circumferential wall of the base portion. A riblet recessed relative to the plurality of ridges is formed between the plurality of ridges.

Abstract: A rotor constituting a rotating electric machine includes a rotating shaft and a permanent magnet. A sleeve covering the outer surface of the permanent magnet is attached to the rotating shaft. The sleeve is made of a carbon fiber reinforced polymer. A resin film is joined to an outer circumferential wall of the sleeve via a joining material. A plurality of ridges are formed on the outer circumferential wall of the resin film. A riblet recessed relatively to the plurality of ridges is formed between the plurality of ridges.

Abstract: A first layer, a second layer, and a third layer of a sleeve of a rotor are integrated side by side in this order from the radial center of the sleeve toward the outside. The first layer includes a first fiber-reinforced resin including a first carbon fiber extending in a direction inclined with respect to both the axis of the rotor shaft and a circumferential direction of the sleeve. The second layer includes a second fiber-reinforced resin including a second carbon fiber extending along the circumferential direction of the sleeve. the third layer includes a third fiber-reinforced resin including a third carbon fiber extending along the circumferential direction of the sleeve. An elastic modulus of the third layer is larger than an elastic modulus of the second layer.

Abstract: The present disclosure is to provide a measurement chip, a measuring device, and a measuring method which can accurately estimate an analyte concentration with a simple configuration. A measurement chip may include a propagation layer, an introductory part, a drawn-out part and a reaction part. Through the propagation layer, light may propagate. The introductory part may introduce the light into the propagation layer. The drawn-out part may draw the light from the propagation layer. The reaction part may have, in a surface of the propagation layer where a reactant that reacts to a substance to be detected is formed, an area where a content of the reactant changes monotonously in a perpendicular direction perpendicular to a propagating direction of the light, over a given length in the propagating direction.

Abstract: The present disclosure is to provide a measurement chip, a measuring device, and a measuring method which can accurately estimate an analyte concentration with a simple configuration. A measurement chip may include a propagation layer, an introductory part, a drawn-out part and a reaction part. Through the propagation layer, light may propagate. The introductory part may introduce the light into the propagation layer. The drawn-out part may draw the light from the propagation layer. The reaction part may have, in a surface of the propagation layer where a reactant that reacts to a substance to be detected is formed, an area where a content of the reactant changes monotonously in a perpendicular direction perpendicular to a propagating direction of the light, over a given length in the propagating direction.

Abstract: A rubbing plate of a side bearer of a railcar bogie is a rubbing plate of a side bearer provided at the railcar bogie so as to slidably contact a slide member arranged above or under the side bearer. The rubbing plate includes a recess-projection provided on an opposing surface of the rubbing plate, the opposing surface being opposed to a sliding surface of the slide member.

Abstract: A rubbing plate of a side bearer of a railcar bogie is a rubbing plate of a side bearer provided at the railcar bogie so as to slidably contact a slide member arranged above or under the side bearer. The rubbing plate includes a recess-projection provided on an opposing surface of the rubbing plate, the opposing surface being opposed to a sliding surface of the slide member.

Abstract: Provided is a measuring chip, a measuring device and a measuring method, which are capable of performing a more simple and highly accurate measurement than the conventional measurement. Light introduced into an incoming part may propagate while totally reflecting within a propagating part of a propagation layer. A phase shift amount in the total internal reflection may be different between sections of an upper surface of the propagation layer where a ligand is formed and where a ligand is not formed. When an analyte is adsorbed to the ligand, the phase shift amount in the reflection may become larger than before attaching the analyte. As a result, a beam pattern of the light outputted from an outgoing part may change.

Abstract: The present disclosure is to provide a measurement chip, a measuring device, and a measuring method which can accurately estimate an analyte concentration with a simple configuration. A measurement chip may include a propagation layer, an introductory part, a drawn-out part and a reaction part. Through the propagation layer, light may propagate. The introductory part may introduce the light into the propagation layer. The drawn-out part may draw the light from the propagation layer. The reaction part may have, in a surface of the propagation layer where a reactant that reacts to a substance to be detected is formed, an area where a content of the reactant changes monotonously in a perpendicular direction perpendicular to a propagating direction of the light, over a given length in the propagating direction.

Abstract: Provided is a measuring chip, a measuring device and a measuring method, which are capable of performing a more simple and highly accurate measurement than the conventional measurement. Light introduced into an incoming part may propagate while totally reflecting within a propagating part of a propagation layer. A phase shift amount in the total internal reflection may be different between sections of an upper surface of the propagation layer where a ligand is formed and where a ligand is not formed. When an analyte is adsorbed to the ligand, the phase shift amount in the reflection may become larger than before attaching the analyte. As a result, a beam pattern of the light outputted from an outgoing part may change.

Abstract: A method of detecting an end point of etching by emission spectroscopy. Using a constant ratio between emission intensities in the course of etching and after the termination thereof, a correction value is computed with data of a waveform already adjusted to be capable of detecting an end point of etching and the corresponding emission intensity in the course of etching treatment thereafter, and the waveform of corresponding emission intensity in the course of etching treatment is processed so that the detection can be conducted on the same level as in the end point detection already adjusted to be capable of detecting the end point of etching at the time of treatment. Thus, irrespective of the reduction of the quantity of emission for an emission detection at each time of treatment, a constant electric signal of the same detecting level can be obtained, making it possible to detect an end point of etching with the same accuracy as in the initial treatment.

Abstract: The present invention relates to a method of and apparatus for detecting an end point of plasma treatment of a specimen.

Abstract: The present invention relates to a method of and apparatus for detecting the end point of plasma treatment. The method includes steps: selecting a plasma spectrum having a characteristic wavelength from the plasma spectrum occurring at the time of the plasma treatment reaction of a specimen; computing a secondary differential value of a function of the quantity of the plasma spectrum selected and the plasma treatment reaction time of the specimen; and detecting the end point of the plasma treatment reaction of the specimen by comparing the secondary differential value computed with preset reference values for judgment.