Patents by Inventor Keiji Watanabe

Keiji Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240140097
    Abstract: A substrate joint body includes a first substrate that has a first surface and a second surface facing away from the first surface and has an opening in the second surface, and a second substrate joined to the second surface with an adhesive agent, and the opening is covered with the second substrate, wherein a recessed portion extending from a position exposed to the opening toward a position facing an opening edge of the opening on the second surface is formed in a third surface of the second substrate such that an adhesive agent protruding from a joint portion between the first substrate and the second substrate reaches a third surface of the second substrate that faces the opening.
    Type: Application
    Filed: October 30, 2023
    Publication date: May 2, 2024
    Inventor: KEIJI WATANABE
  • Publication number: 20240131632
    Abstract: A TIG welded joint in a high-Mn content steel material that can be formed with reduced occurrence of hot cracking during the welding process and has high strength and excellent cryogenic impact toughness. In the TIG welded joint, the high-Mn content steel material has a chemical composition including, by mass %, C: 0.10 to 0.80%, Si: 0.05 to 1.00%, Mn: 18.0 to 30.0%, P: 0.030% or less, S: 0.0070% or less, Al: 0.010 to 0.070%, Cr: 2.5 to 7.0%, N: 0.0050 to 0.0500%, and O: 0.0050% or less, the balance being Fe and incidental impurities, and a weld metal has a chemical composition including C: 0.10 to 0.80%, Si: 0.05 to 1.00%, Mn: 15.0 to 30.0%, P: 0.030% or less, S: 0.030% or less, Al: 0.100% or less, Cr: 6.0 to 14.0%, and N: 0.100% or less, the balance being Fe and incidental impurities.
    Type: Application
    Filed: February 28, 2022
    Publication date: April 25, 2024
    Applicant: JFE STEEL CORPORATION
    Inventors: Kazufumi WATANABE, Atsushi TAKADA, Akiyoshi ANDO, Takatoshi OKABE, Keiji UEDA
  • Patent number: 11964957
    Abstract: Embodiments provide a pest control agent that is excellent in safety, controlling effect, residual activity, and so on. According to an embodiment, there is provided a pyrazole derivative represented by general formula [I], or an agriculturally acceptable salt thereof, and a pest control agent containing the same as an active ingredient: wherein, p represents an integer of 0 or 1, R1, R2, R3, R4, and R5 represent a hydrogen atom, halogen atom, C1-C6 alkyl group, or the like, A represents an oxygen atom or sulfur atom, Q represents a halogen atom, C6-C10 aryl group that is unsubstituted or substituted with (R8)m, or the like, and R6 and R7 represent a hydrogen atom, C1-C6 alkyl group, or the like.
    Type: Grant
    Filed: May 24, 2019
    Date of Patent: April 23, 2024
    Assignee: KUMIAI CHEMICAL INDUSTRY CO., LTD.
    Inventors: Ryo Ishikawa, Akira Kinpara, Keiji Toriyabe, Akira Watanabe, Masao Nakatani, Akira Takanezawa, Takeshi Matsuda
  • Publication number: 20240075560
    Abstract: A TIG welding filler metal is provided that has a composition including, by mass %, C: 0.20 to 0.80%, Si: 0.15 to 0.90%, Mn: 15.0 to 30.0%, P: 0.030% or less, S: 0.030% or less, Cr: 6.0 to 15.0%, and N: 0.120% or less, the balance being Fe and incidental impurities. Where necessary, the filler metal may contain one or two selected from Ni and Mo, may further contain one, or two or more selected from V, Ti, and Nb, and may additionally contain one, or two or more selected from Cu, Al, Ca, and REM. This configuration reduces the occurrence of welding cracks during TIG welding, that is, realizes excellent hot crack resistance, and allows for easy production of a weld joint having high strength and excellent cryogenic impact toughness.
    Type: Application
    Filed: December 16, 2021
    Publication date: March 7, 2024
    Applicant: JFE Steel Corporation
    Inventors: Kazufumi Watanabe, Atsushi Takada, Akiyoshi Ando, Takatoshi Okabe, Keiji Ueda
  • Publication number: 20220292814
    Abstract: An image processing apparatus applies a learning process to a learning model using training data generated from first original images obtained by capturing a subject of inspection. The apparatus then performs, using the learned learning model, deduction processing on input data generated from a second original image obtained by capturing a subject of inspection. The training data is generated using a plurality of partial images from each of the first original images, and the deduction process uses a partial image of the second original image as the input data. The detection rate of an abnormal portion having a small size included in images of the subject of inspection is thereby improved.
    Type: Application
    Filed: February 28, 2022
    Publication date: September 15, 2022
    Inventors: Keiji Watanabe, Hidekatsu Sugiyama, Keiji Yamasaki
  • Patent number: 11400725
    Abstract: A liquid ejection apparatus that prevents a user's hand from becoming dirty when attaching and detaching a liquid holding container, the liquid ejection apparatus includes a space portion that is open on a side surface of a housing, a liquid holding container that is detachably mounted to the space portion and includes an introduction port for introducing liquid to an inside thereof, on an upper surface, and a discharge portion that is provided at a position facing the introduction port inside the space portion in a state in which the liquid holding container mounted and includes a discharge port for discharging the liquid to the inside of the liquid holding container, in which the discharge portion is configured such that at least the discharge port is movable.
    Type: Grant
    Filed: January 14, 2021
    Date of Patent: August 2, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Keiji Watanabe, Kenji Tamamori, Takashi Sugawara
  • Publication number: 20220144980
    Abstract: A cured product of a curable material is a cured product of a curable material containing a benzoxazine compound and a polymerization initiator. The benzoxazine compound has a polymerizable functional group on a nitrogen atom constituting an oxazine ring. The cured product has a curing rate of 60% or more. The present invention also encompasses a polymer composition including a polymer including repeating units of a polymerizable monomer having a benzoxazine ring.
    Type: Application
    Filed: February 26, 2020
    Publication date: May 12, 2022
    Applicant: NAGASE CHEMTEX CORPORATION
    Inventors: Kazuki YOSHINO, Keiji WATANABE
  • Publication number: 20220032623
    Abstract: A thin film manufacturing method of manufacturing a laminate of a thin film of a coating film member and a support member includes a coating step of coating the coating film member on a surface of the support member, a sandwiching step of sandwiching the coating film member between the support member and a peeled-off member, a film thinning step of reducing a thickness of the coating film member by applying an external force to the coating film member sandwiched between the support member and the peeled-off member in a state where the coating film member is softened, and a peeling step of peeling the peeled-off member off the coating film member after the film thinning step.
    Type: Application
    Filed: July 9, 2021
    Publication date: February 3, 2022
    Inventor: Keiji Watanabe
  • Patent number: 11181441
    Abstract: A sensor system that detects a vibration of a rotating part with a high accuracy even in a case in which a sensor is additionally attached is provided. The invention is directed to a sensor system includes a board that is installed in a rotating part of a cut processing machine; a plurality of acceleration sensors mounted on the board, and a signal processing unit (arithmetic operation). The signal processing unit detects a translational acceleration accompanying moving of the rotating part and a centrifugal acceleration accompanying rotation of the rotating part on the basis of acceleration data detected by each of the acceleration sensors.
    Type: Grant
    Filed: November 16, 2018
    Date of Patent: November 23, 2021
    Assignee: Hitachi, Ltd.
    Inventors: Keiji Watanabe, Hiroaki Hasegawa, Hisanori Matsumoto, Daisuke Ryuzaki
  • Publication number: 20210213765
    Abstract: A liquid ejection apparatus includes a liquid ejection head for ejecting liquid and a mounting section for receiving a waste liquid container to be attached thereto. The waste liquid container is capable of receiving and containing the waste liquid discharged from a discharge port arranged in the mounting section. The liquid ejection apparatus has a blocking member for shielding the discharge port in accordance with an operation of removing the waste liquid container from the mounting section. The liquid ejection apparatus minimizes the risk of staining one or both of the user's hands handling the waste liquid container and the user's clothes with the waste liquid remaining on the discharge port of the liquid ejection apparatus.
    Type: Application
    Filed: January 13, 2021
    Publication date: July 15, 2021
    Inventors: Kenji Tamamori, Tetsushi Ishikawa, Takashi Sugawara, Keiji Watanabe, Masafumi Morisue, Seiichiro Yaginuma
  • Publication number: 20210213744
    Abstract: A liquid ejection apparatus that prevents a user's hand from becoming dirty when attaching and detaching a liquid holding container, the liquid ejection apparatus includes a space portion that is open on a side surface of a housing, a liquid holding container that is detachably mounted to the space portion and includes an introduction port for introducing liquid to an inside thereof, on an upper surface, and a discharge portion that is provided at a position facing the introduction port inside the space portion in a state in which the liquid holding container mounted and includes a discharge port for discharging the liquid to the inside of the liquid holding container, in which the discharge portion is configured such that at least the discharge port is movable.
    Type: Application
    Filed: January 14, 2021
    Publication date: July 15, 2021
    Inventors: Keiji Watanabe, Kenji Tamamori, Takashi Sugawara
  • Publication number: 20210213743
    Abstract: Provided is a liquid ejection apparatus capable of suppressing user's hands, and the like from being contaminated with the waste liquid attached to the waste liquid holding portion when the waste liquid container is detached. A liquid ejection apparatus includes a liquid ejection head that ejects a liquid; a waste liquid holding portion that is provided around the discharge portion that discharges a waste liquid; and a mounting portion on which the waste liquid container that is capable of containing the waste liquid is mounted, in which the waste liquid container is detachable from the mounting portion, the waste liquid container has a wiping portion that moves while being in contact with the waste liquid holding portion, and at least a part of the wiping portion is located on a rear side of the discharge portion in a direction in which the waste liquid container is detached.
    Type: Application
    Filed: January 14, 2021
    Publication date: July 15, 2021
    Inventors: Takashi Sugawara, Kenji Tamamori, Keiji Watanabe
  • Publication number: 20210213742
    Abstract: Provided are a liquid ejection apparatus and a waste liquid container. The liquid ejection apparatus having a liquid ejection head includes an attachment portion to which a waste liquid container for storing a waste liquid collected from the liquid ejection head is fitted and attached in a detachable manner. The attachment portion is formed as an opening formed in the casing and a recess continuous from the opening, and an attaching direction of the waste liquid container when being attached is defined as a first direction. A discharging portion for outputting the collected waste liquid to the waste liquid container is formed at a position on the inward side of the casing along the first direction with respect to a position bisecting a length along the first direction of a region occupied by the attached waste liquid container. The discharging portion faces a direction orthogonal to the first direction.
    Type: Application
    Filed: January 13, 2021
    Publication date: July 15, 2021
    Inventors: Keiji Watanabe, Kenji Tamamori, Takashi Sugawara
  • Patent number: 10990085
    Abstract: A machine-tool-state determination system configured to determine a state associated with a machine tool including a rotation mechanism for processing a member, the system including: a sensor configured to acquire a state value from the machine tool; and an analysis device, in which the analysis device: performs spectral analysis with time series data of the state value, to extract a rotational frequency of the rotation mechanism and a harmonic wave to the rotational frequency; calculates a ratio of an amplitude of the rotational frequency to an amplitude of the harmonic wave; generates feature-amount data including the state value and the ratio as feature amounts; performs clustering with the feature-amount data; and determines a state associated with the machine tool, based on a result of the clustering.
    Type: Grant
    Filed: June 20, 2019
    Date of Patent: April 27, 2021
    Assignee: HITACHI, LTD.
    Inventors: Kenji Otsu, Keiji Watanabe, Hisanori Matsumoto
  • Patent number: 10894409
    Abstract: Provided is a method of manufacturing a liquid ejection head, which is capable of patterning a dry film while suppressing deformation of the dry film caused by a pressure. The method of manufacturing a liquid ejection head includes: preparing a substrate including an ejection orifice member on a first surface; forming, on an ejection orifice surface of the ejection orifice member, a protection film having communicating holes for allowing ejection orifices to communicate to outside; closing an opening of a supply port on a second surface on a side opposite to the first surface of the substrate with a dry film; and patterning the dry film by irradiating the dry film with light under a state in which the protection film is formed on the ejection orifice surface.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: January 19, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Jun Yamamuro, Kazuhiro Asai, Keiji Matsumoto, Kunihito Uohashi, Keiji Watanabe, Masahisa Watanabe, Tetsushi Ishikawa, Yasuaki Tominaga, Manabu Otsuka
  • Patent number: 10737937
    Abstract: A redeposited material is removed so as to electrically observe a microelement without causing foreign matters or metal contamination. An FIB device (charged particle beam device) includes an FIB barrel which discharges the focused ion beam (charged particle beam), a stage which holds a sample (substrate), a microcurrent measuring device (current measuring unit) which measures a leakage current from the sample, and a timer (time measuring unit) which measures a time to emit the focused ion beam and a time to measure the leakage current. Further, the FIB device includes a system control unit (control unit) which synchronizes a time to emit the focused ion beam and a time to measure the leakage current by the microcurrent measuring device.
    Type: Grant
    Filed: November 7, 2018
    Date of Patent: August 11, 2020
    Assignee: HITACHI, LTD.
    Inventors: Toshiyuki Mine, Keiji Watanabe, Koji Fujisaki, Masaharu Kinoshita, Masatoshi Morishita, Daisuke Ryuzaki
  • Patent number: 10662059
    Abstract: The invention is to reduce non-uniformity of a processing shape over a wide range of a single field-of-view. The invention is directed to a method of processing micro electro mechanical systems with a first step and a second step in a processing apparatus including an irradiation unit that irradiates a sample with a charged particle beam, a shape measuring unit that measures a shape of the sample, and a control unit. In the first step, the irradiation unit irradiates a plurality of single field-of-view points with the charged particle beam in a first region of the sample, the shape measuring unit measures the shape of a spot hole formed in the first region of the sample, and the control unit sets, based on measurement results of the shape of the spot hole, a scan condition of the charged particle beam or a forming mask of the charged particle beam at each of the single field-of-view points.
    Type: Grant
    Filed: June 22, 2018
    Date of Patent: May 26, 2020
    Assignee: HITACHI, LTD.
    Inventors: Keiji Watanabe, Hiroyasu Shichi, Misuzu Sagawa, Toshiyuki Mine, Daisuke Ryuzaki
  • Patent number: 10605824
    Abstract: For the purpose of shortening the MEMS manufacturing TAT, the MEMS manufacturing method according to the present invention includes a step of extracting the first MEMS with first characteristic in a range approximate to the required characteristic from the plurality of MEMS preliminarily prepared on the main surface of the substrate, and a step of forming a second MEMS having the required characteristic by directly processing the first MEMS.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: March 31, 2020
    Assignee: Hitachi, Ltd.
    Inventors: Shuntaro Machida, Nobuyuki Sugii, Keiji Watanabe, Daisuke Ryuzaki, Tetsufumi Kawamura, Kazuki Watanabe
  • Patent number: 10549989
    Abstract: A sufficient processing speed and sufficient processing accuracy are obtained in a microstructure manufacturing method using ion beams. The microstructure manufacturing method includes the steps of: (a) irradiating a first region of a sample with a first ion beam (projection ion beam) formed by being passed through a first opening portion of a first mask, and etching the sample; and (b) irradiating a second region that is wider than the first region in a direction along a beam width, with a second ion beam (projection ion beam), and processing the sample. Furthermore, a magnitude of a skirt width of a longitudinal section of the second ion beam is smaller than a magnitude of a skirt width of a longitudinal section of the first ion beam.
    Type: Grant
    Filed: February 16, 2018
    Date of Patent: February 4, 2020
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyasu Shichi, Keiji Watanabe, Daisuke Ryuzaki
  • Patent number: 10546721
    Abstract: The present invention provides a technology for avoiding radiation of an ion beam at a position other than a desired processing position. A microstructure manufacturing method includes a step of radiating an ion beam to a sample; a step of supplying a gas to the sample; a step of stopping supplying the gas to the sample; and a step of stopping radiating the ion beam to the sample. The step of radiating the ion beam is performed earlier than the step of supplying the gas or the step of stopping supplying the gas is performed earlier than the step of stopping radiating the ion beam.
    Type: Grant
    Filed: March 7, 2018
    Date of Patent: January 28, 2020
    Assignee: Hitachi, Ltd.
    Inventors: Keiji Watanabe, Hiroyasu Shichi, Daisuke Ryuzaki