Patents by Inventor Keiji Yamasaki

Keiji Yamasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220292814
    Abstract: An image processing apparatus applies a learning process to a learning model using training data generated from first original images obtained by capturing a subject of inspection. The apparatus then performs, using the learned learning model, deduction processing on input data generated from a second original image obtained by capturing a subject of inspection. The training data is generated using a plurality of partial images from each of the first original images, and the deduction process uses a partial image of the second original image as the input data. The detection rate of an abnormal portion having a small size included in images of the subject of inspection is thereby improved.
    Type: Application
    Filed: February 28, 2022
    Publication date: September 15, 2022
    Inventors: Keiji Watanabe, Hidekatsu Sugiyama, Keiji Yamasaki
  • Publication number: 20080283723
    Abstract: An observation light generated by an observation-purpose light source has a beam cross section where the light intensity (light quantity) is substantially uniform. A mask portion masks a part of the observation light so that the light intensity of a region corresponding to a reticle image at the beam cross section is substantially zero. The observation light including a shadow region formed corresponding to the reticle image is reflected from a beam splitter and applied to an object to be measured. Based on the contrast (difference between light and dark parts) of a reflected image corresponding to the reticle image projected on the object to be measured, the focus state of the measurement light on the object to be measured is determined.
    Type: Application
    Filed: May 15, 2008
    Publication date: November 20, 2008
    Applicant: Otsuka Electronics Co., Ltd.
    Inventors: Tadayoshi FUJIMORI, Yoshimi Sawamura, Keiji Yamasaki
  • Patent number: 5754935
    Abstract: The present invention provides a vane material having an excellent scuffing resistance in a compressor employing an alternative Freon gas as a cooling medium and a process for the preparation thereof. In accordance with the present invention, a vane material is provided having a structure comprising a base material consisting essentially of 1.0 to 4.5% by weight of carbon, not more than 1.5% by weight of silicon, not more than 1.0% by weight of manganese, 3 to 6% by weight of chromium, not more than 30% of tungsten and/or not more than 20% by weight of molybdenum provided that (W+2Mo) is not more than 45% by weight, 2 to 10% by weight of vanadium and/or niobium, not more than 20% by weight of cobalt, and a balance of iron and inavoidable impurities with additive particles of a carbide and additive particles of a nitride and/or a carbonitride, sintered thereto in an amount of more than 0% to not more than 25% by weight and 2 to 25% by weight based on the total weight of the vane material, respectively.
    Type: Grant
    Filed: June 10, 1994
    Date of Patent: May 19, 1998
    Assignee: Hitachi Metals, Ltd.
    Inventors: Yutaka Kubo, Hideki Nakamura, Norimasa Uchida, Keiji Yamasaki
  • Patent number: 5591023
    Abstract: A compressor comprising a roller made of a cast iron which has a hardness of HRC 50 or more after heat treatment, and contains not less than 5 area % of graphite, and not less than 2 area % of crystallized eutectic structure including iron phosphide, and either a vane made of a material which has a hardness of HRC 70 or more after heat treatment and contains not less than 25 area % of undissolved carbides and nitride particles in total, the undissolved carbides including not less than 10 area % of MC type carbides, the nitride particles including at least one of TiN and NbN of not less than 5 area %, the undissolved carbides and the nitride particles having a mean grain size of not more than 5 .mu.m, or a vane made of a material including at least one of TiN and NbN particles of not less than 5 area %, the TiN and NbN particles having a mean grain size of not more than 5 .mu.m, the material essentially consisting of, by weight, 2.0 to 4.0 % of C, not more than 2.0 % of Si, not more than 1.5 % of Mn, 2.5 to 8.
    Type: Grant
    Filed: October 10, 1995
    Date of Patent: January 7, 1997
    Assignees: Hitachi Metals, Ltd., Hitachi, Ltd.
    Inventors: Hideki Nakamura, Keiji Yamasaki, Fujio Yamane, Toshiki Yoshida, Tadashi Iizuka, Akihiko Ishiyama