Patents by Inventor Keiki TAGUCHI

Keiki TAGUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230420595
    Abstract: A semiconductor light receiving element includes: a substrate; a semiconductor stacked portion that is formed on a first region of the substrate; and a first electrode and a second electrode that are electrically connected to the semiconductor stacked portion. Te semiconductor stacked portion includes: a light absorption layer of a first conductivity type including InxGa1-xAs; and a second region of a second conductivity type other than the first conductivity type that is located on the opposite side to the substrate with respect to the light absorption layer and bonded to the light absorption layer. The first electrode is connected to a first portion of the first conductivity type located on the substrate side with respect to the light absorption layer in the semiconductor stacked portion.
    Type: Application
    Filed: November 15, 2021
    Publication date: December 28, 2023
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Keiki TAGUCHI, Hajime ISHIHARA, Yoshiaki OHSHIGE, Kenji MAKINO
  • Patent number: 11450705
    Abstract: A light detection element includes a semiconductor substrate, a light absorbing layer of a first conductivity type formed on the semiconductor substrate, a cap layer of a first conductivity type formed on the light absorbing layer, and a semiconductor region of a second conductivity type formed within the cap layer and forming a pn junction with the cap layer. A depletion layer formed around the semiconductor region does not reach the light absorbing layer in a case where a reverse bias is not applied to the pn junction, and exceeds a position amounting to 50% of a thickness of the light absorbing layer from the cap layer side in a case where a reverse bias of 20 V is applied to the pn junction.
    Type: Grant
    Filed: January 30, 2020
    Date of Patent: September 20, 2022
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Mitsuhito Mase, Keiki Taguchi, Hajime Ishihara, Hiroo Yamamoto, Akihiro Shimada
  • Patent number: 11194026
    Abstract: A light detection device includes a first photodiode, a second photodiode connected in series to the first photodiode, a first light source configured to output first pulsed light to which the first photodiode is sensitive, and a signal output unit configured to output a current as a detection signal, the current that flow through the second photodiode.
    Type: Grant
    Filed: April 13, 2020
    Date of Patent: December 7, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Mitsuhito Mase, Keiki Taguchi, Hajime Ishihara, Hiroo Yamamoto, Akihiro Shimada
  • Publication number: 20210318417
    Abstract: A light detection device includes a first photodiode, a second photodiode connected in series to the first photodiode, a first light source configured to output first pulsed light to which the first photodiode is sensitive, and a signal output unit configured to output a current as a detection signal, the current that flow through the second photodiode.
    Type: Application
    Filed: April 13, 2020
    Publication date: October 14, 2021
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Mitsuhito MASE, Keiki TAGUCHI, Hajime ISHIHARA, Hiroo YAMAMOTO, Akihiro SHIMADA
  • Publication number: 20200168656
    Abstract: A light detection element includes a semiconductor substrate, a light absorbing layer of a first conductivity type formed on the semiconductor substrate, a cap layer of a first conductivity type formed on the light absorbing layer, and a semiconductor region of a second conductivity type formed within the cap layer and forming a pn junction with the cap layer. A depletion layer formed around the semiconductor region does not reach the light absorbing layer in a case where a reverse bias is not applied to the pn junction, and exceeds a position amounting to 50% of a thickness of the light absorbing layer from the cap layer side in a case where a reverse bias of 20 V is applied to the pn junction.
    Type: Application
    Filed: January 30, 2020
    Publication date: May 28, 2020
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Mitsuhito MASE, Keiki TAGUCHI, Hajime ISHIHARA, Hiroo YAMAMOTO, Akihiro SHIMADA