Patents by Inventor Keiko Kizawa

Keiko Kizawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210246349
    Abstract: An aspect of the present invention is a resin composition containing an acrylic resin obtained by polymerizing a monomer component including: a first monomer represented by formula (1); and a second monomer copolymerizable with the first monomer and having a reactive group. [In the formula, R1 represents a hydrogen atom or a methyl group, and R2 represents a group having a polyoxyalkylene chain.
    Type: Application
    Filed: May 10, 2019
    Publication date: August 12, 2021
    Applicant: Showa Denko Materials Co., Ltd.
    Inventors: Naoki FURUKAWA, Tsuyoshi MORIMOTO, Atsuko SANO, Hiroshi YOKOTA, Nozomi MATSUBARA, Akira NAGAI, Keiko KIZAWA
  • Publication number: 20210024803
    Abstract: A resin member contains a copolymer of ethylene and an olefin having 3 or more carbon atoms, and a fatty acid ester.
    Type: Application
    Filed: April 4, 2018
    Publication date: January 28, 2021
    Inventors: Keiko KIZAWA, Akira NAGAI, Tsuyoshi MORIMOTO, Naoki FURUKAWA, Nozomi MATSUBARA
  • Publication number: 20200165437
    Abstract: An aspect of the present invention is a resin composition comprising: an acrylic resin; and a curing agent, wherein the acrylic resin is a resin obtained by polymerizing monomer components comprising a first monomer represented by the following formula (1): wherein R1 represents a hydrogen atom or a methyl group, and R2 represents an alkyl group having 12 to 30 carbon atoms, and a second monomer copolymerizable with the first monomer and having a reactive group capable of reacting with the curing agent.
    Type: Application
    Filed: May 10, 2018
    Publication date: May 28, 2020
    Inventors: Naoki FURUKAWA, Akira NAGAI, Tsuyoshi MORIMOTO, Keiko KIZAWA, Nozomi MATSUBARA
  • Patent number: 9608143
    Abstract: The composition for forming an n-type diffusion layer in accordance with the present invention contains a glass powder and a dispersion medium, in which the glass powder includes an donor element and a total amount of the life time killer element in the glass powder is 1000 ppm or less. An n-type diffusion layer and a photovoltaic cell having an n-type diffusion layer are prepared by applying the composition for forming an n-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Grant
    Filed: November 10, 2013
    Date of Patent: March 28, 2017
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Youichi Machii, Masato Yoshida, Takeshi Nojiri, Kaoru Okaniwa, Mitsunori Iwamuro, Shuichiro Adachi, Tetsuya Sato, Keiko Kizawa
  • Patent number: 9520529
    Abstract: The composition for forming a composition for forming a p-type diffusion layer, the composition containing a glass powder and a dispersion medium, in which the glass powder includes an acceptor element and a total amount of a life time killer element in the glass powder is 1000 ppm or less. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Grant
    Filed: November 9, 2013
    Date of Patent: December 13, 2016
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Yoichi Machii, Masato Yoshida, Takeshi Nojiri, Kaoru Okaniwa, Mitsunori Iwamuro, Shuichiro Adachi, Tetsuya Sato, Keiko Kizawa
  • Patent number: 9390829
    Abstract: The paste composition for an electrode are constituted with copper-containing particles having a peak temperature of an exothermic peak showing a maximum area in the simultaneous ThermoGravimetry/Differential Thermal Analysis of 280° C. or higher, glass particles, a solvent, and a resin. Further, the photovoltaic cell has an electrode formed by using the paste composition for a photovoltaic cell electrode.
    Type: Grant
    Filed: January 25, 2011
    Date of Patent: July 12, 2016
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Masato Yoshida, Takeshi Nojiri, Mitsunori Iwamuro, Shuuichirou Adachi, Keiko Kizawa, Takuya Aoyagi, Hiroki Yamamoto, Takashi Naito, Takahiko Kato
  • Patent number: 9224517
    Abstract: A paste composition for an electrode, the paste composition comprising: phosphorous-containing copper alloy particles in which the content of phosphorous is from 6% by mass to 8% by mass; glass particles; a solvent; and a resin.
    Type: Grant
    Filed: April 5, 2012
    Date of Patent: December 29, 2015
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Shuichiro Adachi, Masato Yoshida, Takeshi Nojiri, Mitsunori Iwamuro, Keiko Kizawa, Takuya Aoyagi, Hiroki Yamamoto, Takashi Naito, Takahiko Kato
  • Publication number: 20150214418
    Abstract: The composition for forming a composition for forming a p-type diffusion layer, the composition containing a glass powder and a dispersion medium, in which the glass powder includes an acceptor element and a total amount of a life time killer element in the glass powder is 1000 ppm or less. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Application
    Filed: April 3, 2015
    Publication date: July 30, 2015
    Inventors: Yoichi MACHII, Masato Yoshida, Takeshi Nojiri, Kaoru Okaniwa, Mitsunori Iwamuro, Shuichiro Adachi, Tetsuya Sato, Keiko Kizawa
  • Publication number: 20150214390
    Abstract: The composition for forming an n-type diffusion layer in accordance with the present invention contains a glass powder and a dispersion medium, in which the glass powder includes an donor element and a total amount of the life time killer element in the glass powder is 1000 ppm or less. An n-type diffusion layer and a photovoltaic cell having an n-type diffusion layer are prepared by applying the composition for forming an n-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Application
    Filed: April 3, 2015
    Publication date: July 30, 2015
    Inventors: Yoichi MACHII, Masato YOSHIDA, Takeshi NOJIRI, Kaoru OKANIWA, Mitsunori IWAMURO, Shuichiro ADACHI, Tetsuya SATO, Keiko KIZAWA
  • Publication number: 20140120648
    Abstract: The composition for forming an n-type diffusion layer in accordance with the present invention contains a glass powder and a dispersion medium, in which the glass powder includes an donor element and a total amount of the life time killer element in the glass powder is 1000 ppm or less. An n-type diffusion layer and a photovoltaic cell having an n-type diffusion layer are prepared by applying the composition for forming an n-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Application
    Filed: November 10, 2013
    Publication date: May 1, 2014
    Applicant: Hitachi Chemical Company, Ltd.
    Inventors: Yoichi MACHII, Masato YOSHIDA, Takeshi NOJIRI, Kaoru OKANIWA, Mitsunori IWAMURO, Shuichiro ADACHI, Tetsuya SATO, Keiko KIZAWA
  • Publication number: 20140065761
    Abstract: The composition for forming a composition for forming a p-type diffusion layer, the composition containing a glass powder and a dispersion medium, in which the glass powder includes an acceptor element and a total amount of a life time killer element in the glass powder is 1000 ppm or less. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Application
    Filed: November 9, 2013
    Publication date: March 6, 2014
    Applicant: Hitachi Chemical Company, Ltd.
    Inventors: Yoichi MACHII, Masato YOSHIDA, Takeshi NOJIRI, Kaoru OKANIWA, Mitsunori IWAMURO, Shuichiro ADACHI, Tetsuya SATO, Keiko KIZAWA
  • Patent number: 8410000
    Abstract: The method for producing a photovoltaic cell includes applying, on a partial region of one surface side of a semiconductor substrate, a first p-type diffusion layer forming composition including a p-type impurity-containing glass powder and a dispersion medium; applying, on at least a region other than the partial region on the surface of the semiconductor substrate, a second p-type diffusion layer forming composition which includes a p-type impurity-containing glass powder and a dispersion medium and in which a concentration of the p-type impurity is lower than that of the first p-type diffusion layer forming composition, where the first p-type diffusion layer forming composition is applied; heat-treating the semiconductor substrate on which the first p-type diffusion layer forming composition and the second p-type diffusion layer forming composition are applied to form a p-type diffusion layer; and forming an electrode on the partial region.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: April 2, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Youichi Machii, Masato Yoshida, Takeshi Nojiri, Kaoru Okaniwa, Mitsunori Iwamuro, Shuuichirou Adachi, Akihiro Orita, Tetsuya Satou, Keiko Kizawa
  • Publication number: 20130078759
    Abstract: The composition for forming an n-type diffusion layer in accordance with the present invention contains a glass powder and a dispersion medium, in which the glass powder includes an donor element and a total amount of the life time killer element in the glass powder is 1000 ppm or less. An n-type diffusion layer and a photovoltaic cell having an n-type diffusion layer are prepared by applying the composition for forming an n-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Application
    Filed: April 22, 2011
    Publication date: March 28, 2013
    Inventors: Yoichi Machii, Masato Yoshida, Takeshi Nojiri, Kaoru Okaniwa, Mitsunori Iwamuro, Shuichiro Adachi, Tetsuya Sato, Keiko Kizawa
  • Patent number: 8404599
    Abstract: The method for producing a photovoltaic cell includes applying, on a partial region of one surface side of a semiconductor substrate, a first n-type diffusion layer forming composition including an n-type impurity-containing glass powder and a dispersion medium; applying, on at least a region other than the partial region on the surface of the semiconductor substrate, a second n-type diffusion layer forming composition which includes an n-type impurity-containing glass powder and a dispersion medium and in which a concentration of the n-type impurity is lower than that of the first n-type diffusion layer forming composition, where the first n-type diffusion layer forming composition is applied; heat-treating the semiconductor substrate on which the first n-type diffusion layer forming composition and the second n-type diffusion layer forming composition are applied to form an n-type diffusion layer; and forming an electrode on the partial region.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: March 26, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Youichi Machii, Masato Yoshida, Takeshi Nojiri, Kaoru Okaniwa, Mitsunori Iwamuro, Shuuichirou Adachi, Akihiro Orita, Tetsuya Satou, Keiko Kizawa
  • Publication number: 20130071968
    Abstract: The composition for forming a composition for forming a p-type diffusion layer, the composition containing a glass powder and a dispersion medium, in which the glass powder includes an acceptor element and a total amount of a life time killer element in the glass powder is 1000 ppm or less. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Application
    Filed: April 22, 2011
    Publication date: March 21, 2013
    Inventors: Yoichi Machii, Masato Yoshida, Takeshi Nojiri, Kaoru Okaniwa, Mitsunori Iwamuro, Shuichiro Adachi, Tetsuya Sato, Keiko Kizawa
  • Publication number: 20120260981
    Abstract: The present invention provides a paste composition for an electrode, the paste composition including phosphorus-tin-containing copper alloy particles, glass particles, a solvent and a resin. The present invention also provides a photovoltaic cell element having an electrode formed from the paste composition, and a photovoltaic cell.
    Type: Application
    Filed: April 11, 2012
    Publication date: October 18, 2012
    Inventors: Shuichiro ADACHI, Masato Yoshida, Takeshi Nojiri, Mitsunori Iwamuro, Keiko Kizawa, Takuya Aoyagi, Hiroki Yamamoto, Takashi Naito, Takahiko Kato
  • Publication number: 20120260982
    Abstract: The present invention provides a paste composition for an electrode, the paste composition comprising phosphorus-containing copper alloy particles, tin-containing particles, glass particles, a solvent and a resin. The present invention also provides a photovoltaic cell element having an electrode formed from the paste composition, and a photovoltaic cell.
    Type: Application
    Filed: April 11, 2012
    Publication date: October 18, 2012
    Inventors: Shuichiro ADACHI, Masato Yoshida, Takeshi Nojiri, Mitsunori Iwamuro, Keiko Kizawa, Takuya Aoyagi, Hiroki Yamamoto, Takashi Naito, Takahiko Kato
  • Publication number: 20120260988
    Abstract: A paste composition for an electrode, the paste composition comprising: phosphorous-containing copper alloy particles in which the content of phosphorous is from 6% by mass to 8% by mass; glass particles; a solvent; and a resin.
    Type: Application
    Filed: April 5, 2012
    Publication date: October 18, 2012
    Inventors: Shuichiro Adachi, Masato Yoshida, Takeshi Nojiri, Mitsunori Iwamuro, Keiko Kizawa, Takuya Aoyagi, Hiroki Yamamoto, Takashi Naito, Takahiko Kato
  • Publication number: 20120122265
    Abstract: The method for producing a photovoltaic cell includes applying an n-type diffusion layer forming composition including an n-type impurity-containing glass powder and a dispersion medium onto a first region on one surface side of a semiconductor substrate; applying a p-type diffusion layer forming composition including a p-type impurity-containing glass powder and a dispersion medium onto a second region other than the first region on the surface of the semiconductor substrate where the first region is provided; a thermal diffusion process in which an n-type diffusion layer and a p-type diffusion layer are formed by heat-treating the semiconductor substrate onto which the n-type diffusion layer forming composition and the p-type diffusion layer forming composition are applied; and forming an electrode on each of the first region where the n-type diffusion layer is formed and the second region where the p-type diffusion layer is formed, respectively.
    Type: Application
    Filed: November 17, 2011
    Publication date: May 17, 2012
    Inventors: Youichi Machii, Masato Yoshida, Takeshi Nojiri, Kaoru Okaniwa, Mitsunori Iwamuro, Shuuichirou Adachi, Akihiro Orita, Tetsuya Satou, Keiko Kizawa
  • Publication number: 20120122264
    Abstract: The method for producing a photovoltaic cell includes applying, on a partial region of one surface side of a semiconductor substrate, a first p-type diffusion layer forming composition including a p-type impurity-containing glass powder and a dispersion medium; applying, on at least a region other than the partial region on the surface of the semiconductor substrate, a second p-type diffusion layer forming composition which includes a p-type impurity-containing glass powder and a dispersion medium and in which a concentration of the p-type impurity is lower than that of the first p-type diffusion layer forming composition, where the first p-type diffusion layer forming composition is applied; heat-treating the semiconductor substrate on which the first p-type diffusion layer forming composition and the second p-type diffusion layer forming composition are applied to form a p-type diffusion layer; and forming an electrode on the partial region.
    Type: Application
    Filed: November 17, 2011
    Publication date: May 17, 2012
    Inventors: Youichi MACHII, Masato YOSHIDA, Takeshi NOJIRI, Kaoru OKANIWA, Mitsunori IWAMURO, Shuuichirou ADACHI, Akihiro ORITA, Tetsuya SATOU, Keiko KIZAWA