Patents by Inventor Keiko Sasaki

Keiko Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240327947
    Abstract: Provided is a mineral processing method that allows obtaining a concentrate having a low arsenic grade from a raw material having a high arsenic grade.
    Type: Application
    Filed: June 10, 2024
    Publication date: October 3, 2024
    Applicants: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION, SUMITOMO METAL MINING CO., LTD.
    Inventors: Tsuyoshi HIRAJIMA, Hajime MIKI, Gde Pandhe Wisnu SUYANTARA, Keiko SASAKI, Yoshiyuki TANAKA, Eri TAKIDA
  • Publication number: 20240319606
    Abstract: The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film including a substrate and a patterned film on the substrate, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, wherein the patterned film of the first substrate with a patterned film has a contact angle decreased in the cleaning step, and the patterned film of the second substrate with a patterned film has a contact angle recovered in the heating step.
    Type: Application
    Filed: May 29, 2024
    Publication date: September 26, 2024
    Inventors: Yuzuru KANEKO, Takashi AOKI, Yusuke NOMURA, Keiko SASAKI, Asuka SANO
  • Publication number: 20240319607
    Abstract: The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.
    Type: Application
    Filed: June 4, 2024
    Publication date: September 26, 2024
    Inventors: Yuzuru KANEKO, Takashi AOKI, Yusuke NOMURA, Keiko SASAKI, Asuka SANO
  • Publication number: 20240309016
    Abstract: The present invention provides a heterocyclic compound having an orexin type 2 receptor agonist activity. A compound represented by the formula (I): wherein each symbol is as described in the specification, or a salt thereof has an orexin type 2 receptor agonist activity, and is useful as an agent for the prophylaxis or treatment of narcolepsy.
    Type: Application
    Filed: March 15, 2024
    Publication date: September 19, 2024
    Inventors: Mitsunori KONO, Yusuke SASAKI, Yuya OGURO, Zenichi IKEDA, Osamu KUBO, Masaki SETO, Toru YAMASHITA, Makoto KAMATA, Kenjiro SATO, Matthew Thomas REYNOLDS, Kazuaki TAKAMI, Asato KINA, Takafumi YUKAWA, Minoru NAKAMURA, Taku KAMEI, Hiroyuki KAKEI, Fumie YAMAGUCHI, Tomohiro OHASHI, Keiko KAKEGAWA, Takuto KOJIMA, Florian PÜNNER, Masataka MURAKAMI, Takahiko TANIGUCHI, Tatsuki KOIKE, Yuichi KAJITA, Yuhei MIYANOHANA, Kohei TAKEUCHI, Yoshiteru ITO, Norihito TOKUNAGA, Yasushi HATTORI, Eiji KIMURA, Martin Alexander PAWLICZEK, Marilena PIRA, Shuhei IKEDA, Noriyuki TEZUKA, Yoshikazu WATANABE, Kevin CURRAN, Nicolle DOERING, Maria HOPKINS, Ben JOHNSON, Andre KIRYANOV, Jon LAM, Sean MURPHY, Natasha O'ROURKE, Holly REICHARD, Paul TANIS, Yunlong ZHANG
  • Patent number: 12084436
    Abstract: The present invention provides a heterocyclic compound having a HDAC inhibitory action, which is useful for the treatment of central nervous system diseases including neurodegenerative diseases, and the like, and a medicament comprising the compound. The present invention relates to a compound represented by the formula (I): wherein each symbol is as described in the description, or a salt thereof.
    Type: Grant
    Filed: January 29, 2020
    Date of Patent: September 10, 2024
    Assignee: Takeda Pharmaceutical Company Limited
    Inventors: Masahiro Ito, Takeshi Yamamoto, Keiko Kakegawa, Hideyuki Sugiyama, Tohru Miyazaki, Yasuyoshi Arikawa, Tomohiro Okawa, Jinichi Yonemori, Osamu Kubo, Akinori Toita, Takuto Kojima, Fumiaki Kikuchi, Minoru Sasaki, Misaki Homma, Yasuhiro Imaeda, Hironobu Maezaki, Shiinobu Sasaki, Ayumu Sato, Hirotaka Kamitani, Yasutomi Asano, Hironori Kokubo, Masato Yoshikawa
  • Publication number: 20240270952
    Abstract: An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.
    Type: Application
    Filed: January 30, 2024
    Publication date: August 15, 2024
    Inventors: Yuzuru KANEKO, Satoru MIYAZAWA, Keiko SASAKI, Asuka SANO, Yusuke NOMURA
  • Patent number: 12038692
    Abstract: The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: July 16, 2024
    Assignee: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Yuzuru Kaneko, Takashi Aoki, Yusuke Nomura, Keiko Sasaki, Asuka Sano
  • Patent number: 12038691
    Abstract: The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film including a substrate and a patterned film on the substrate, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, wherein the patterned film of the first substrate with a patterned film has a contact angle decreased in the cleaning step, and the patterned film of the second substrate with a patterned film has a contact angle recovered in the heating step.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: July 16, 2024
    Assignee: Central Glass Company, Limited
    Inventors: Yuzuru Kaneko, Takashi Aoki, Yusuke Nomura, Keiko Sasaki, Asuka Sano
  • Patent number: 11939459
    Abstract: An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: March 26, 2024
    Assignee: Central Glass Company, Limited
    Inventors: Yuzuru Kaneko, Satoru Miyazawa, Keiko Sasaki, Asuka Sano, Yusuke Nomura
  • Publication number: 20230217718
    Abstract: Provided is a method of producing a light-emitting element, the method being capable of producing a light-emitting element including a first light emitting layer and banks on the first light emitting layer, without damaging the first light emitting layer. The method of producing a light-emitting element of the present disclosure includes: preparing a base element including a monochromatic first light emitting layer on a substrate; forming a patterned fluororesin film by disposing a photosensitive resin composition at least containing a fluororesin having a crosslinking site and a repeating unit derived from a hydrocarbon containing a fluorine atom, a solvent, and a photopolymerization initiator on the base element such that photosensitive resin composition partitions at least one region of the base element; and baking the patterned fluororesin film at a temperature of 200° C. or lower to cure the patterned fluororesin film.
    Type: Application
    Filed: May 21, 2021
    Publication date: July 6, 2023
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Yuzuru KANEKO, Yuta SAKAIDA, Keiko SASAKI, Asuka SANO
  • Publication number: 20230027085
    Abstract: An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.
    Type: Application
    Filed: November 18, 2019
    Publication date: January 26, 2023
    Inventors: Yuzuru KANEKO, Satoru MIYAZAWA, Keiko SASAKI, Asuka SANO, Yusuke NOMURA
  • Publication number: 20220355313
    Abstract: Provided is a mineral processing method that can efficiently separate a copper mineral and a molybdenum mineral. A mineral processing method includes a conditioning step of adding a disulfite to a mineral slurry containing a copper mineral and a molybdenum mineral and a flotation step of performing flotation using the mineral slurry after the conditioning step. By selectively enhancing hydrophilicity of the copper mineral with the disulfite, the hydrophilicity between the copper mineral and the molybdenum mineral can be differentiated. Thus, the molybdenum mineral can be selectively floated, and the copper mineral and the molybdenum mineral can be efficiently separated.
    Type: Application
    Filed: November 13, 2020
    Publication date: November 10, 2022
    Applicants: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION, SUMITOMO METAL MINING CO., LTD.
    Inventors: Tsuyoshi HIRAJIMA, Hajime MIKI, Keiko SASAKI, Gde Pandhe Wisnu SUYANTARA, Yuki SEMOTO, Shigeto KUROIWA, Yuji AOKI, Yoshiyuki TANAKA
  • Publication number: 20210317245
    Abstract: The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.
    Type: Application
    Filed: May 23, 2019
    Publication date: October 14, 2021
    Inventors: Yuzuru KANEKO, Takashi AOKI, Yusuke NOMURA, Keiko SASAKI, Asuka SANO
  • Publication number: 20210200099
    Abstract: The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film including a substrate and a patterned film on the substrate, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, wherein the patterned film of the first substrate with a patterned film has a contact angle decreased in the cleaning step, and the patterned film of the second substrate with a patterned film has a contact angle recovered in the heating step.
    Type: Application
    Filed: May 23, 2019
    Publication date: July 1, 2021
    Inventors: Yuzuru KANEKO, Takashi AOKI, Yusuke NOMURA, Keiko SASAKI, Asuka SANO
  • Patent number: 9438763
    Abstract: An image capturing apparatus is disclosed. An image capturing section captures an image of light and obtains image data. An image display section displays the image data obtained by the image capturing section with a predetermined number of pixels. A storage section stores the image data obtained by the image capturing section. An interface section is connectable to an external storage device. A control section causes the image data obtained by the image capturing section to be stored to the external storage device connected through the interface section, when the captured image data are stored to the external storage device, the image data whose number of pixel exceeds the predetermined number of pixels to be converted into image data having the predetermined number of pixels, and the converted image data to be stored to the storage section.
    Type: Grant
    Filed: July 30, 2015
    Date of Patent: September 6, 2016
    Assignees: SONY CORPORATION, SONY MOBILE COMMUNICATIONS INC.
    Inventor: Keiko Sasaki
  • Publication number: 20150341524
    Abstract: An image capturing apparatus is disclosed. An image capturing section captures an image of light and obtains image data. An image display section displays the image data obtained by the image capturing section with a predetermined number of pixels. A storage section stores the image data obtained by the image capturing section. An interface section is connectable to an external storage device. A control section causes the image data obtained by the image capturing section to be stored to the external storage device connected through the interface section, when the captured image data are stored to the external storage device, the image data whose number of pixel exceeds the predetermined number of pixels to be converted into image data having the predetermined number of pixels, and the converted image data to be stored to the storage section.
    Type: Application
    Filed: July 30, 2015
    Publication date: November 26, 2015
    Applicants: SONY CORPORATION, SONY MOBILE COMMUNICATIONS INC.
    Inventor: Keiko SASAKI
  • Patent number: 9113055
    Abstract: An image capturing apparatus is disclosed. An image capturing section captures an image of light and obtains image data. An image display section displays the image data obtained by the image capturing section with a predetermined number of pixels. A storage section stores the image data obtained by the image capturing section. An interface section is connectable to an external storage device. A control section causes the image data obtained by the image capturing section to be stored to the external storage device connected through the interface section, when the captured image data are stored to the external storage device, the image data whose number of pixel exceeds the predetermined number of pixels to be converted into image data having the predetermined number of pixels, and the converted image data to be stored to the storage section.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: August 18, 2015
    Assignees: SONY CORPORATION, SONY MOBILE COMMUNICATIONS INC.
    Inventor: Keiko Sasaki
  • Publication number: 20150009365
    Abstract: An image capturing apparatus is disclosed. An image capturing section captures an image of light and obtains image data. An image display section displays the image data obtained by the image capturing section with a predetermined number of pixels. A storage section stores the image data obtained by the image capturing section. An interface section is connectable to an external storage device. A control section causes the image data obtained by the image capturing section to be stored to the external storage device connected through the interface section, when the captured image data are stored to the external storage device, the image data whose number of pixel exceeds the predetermined number of pixels to be converted into image data having the predetermined number of pixels, and the converted image data to be stored to the storage section.
    Type: Application
    Filed: September 26, 2014
    Publication date: January 8, 2015
    Applicants: SONY CORPORATION, SONY MOBILE COMMUNICATIONS INC.
    Inventor: Keiko Sasaki
  • Patent number: 8902331
    Abstract: An image capturing apparatus is disclosed. An image capturing section captures an image of light and obtains image data. An image display section displays the image data obtained by the image capturing section with a predetermined number of pixels. A storage section stores the image data obtained by the image capturing section. An interface section is connectable to an external storage device. A control section causes the image data obtained by the image capturing section to be stored to the external storage device connected through the interface section, when the captured image data are stored to the external storage device, the image data whose number of pixel exceeds the predetermined number of pixels to be converted into image data having the predetermined number of pixels, and the converted image data to be stored to the storage section.
    Type: Grant
    Filed: April 16, 2009
    Date of Patent: December 2, 2014
    Assignees: Sony Corporation, Sony Mobile Communications Inc.
    Inventor: Keiko Sasaki
  • Patent number: 8685350
    Abstract: Disclosed herein is a method for separating an arsenic mineral from a copper-bearing material, including the steps of grinding a copper-bearing material containing arsenic, adding water to the copper-bearing material to prepare a slurry, and adding a flotation agent including a depressant, a frother, and a collector to the slurry and blowing air into the slurry for performing flotation to obtain a copper concentrate, wherein the depressant is a chelator. As the chelator, a polyethyleneamine or the like is used. Particularly, when triethylenetetramine is used as the chelator, the amount of triethylenetetramine to be added is preferably 1 to 10 equivalents relative to the amount of soluble copper generated by oxidation of the copper-bearing material, and the pH of the slurry is more preferably adjusted to 7 or more but 8 or less before the slurry is subjected to the flotation.
    Type: Grant
    Filed: February 3, 2011
    Date of Patent: April 1, 2014
    Assignees: Sumitomo Metal Mining Co., Ltd., Kyushu University, National University Corporation
    Inventors: Hideyuki Okamoto, Yoshiyuki Tanaka, Tsuyoshi Hirajima, Keiko Sasaki