Patents by Inventor Keiko Ushikubo

Keiko Ushikubo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low-hygroscopicity low-birefringence resin compositions, molding material obtained therefrom, sheet or film, and optical part
    Patent number: 6900273
    Abstract: Low-hygroscopicity low-birefringence resin compositions. One of the compositions is a resin composition (a) comprising the following polymers (A), and (B) and/or (C). Another is a resin composition (b) comprising the following polymers (A), (B) and (H). Still another is a polymer comprising the following polymers (I) and (J), diphenylsilicone (D), and a phenolic antioxidant (E). (A) A polymer comprising one or more kinds of indene and indene derivatives represented by the following general formula (I). (B) A polymer comprising polystyrene or a polystyrene derivative. (C) A polymer comprising a monomer copolymerizable with styrene or a styrene derivative. (H) A graft polymer having a structure wherein a polymer comprising at least one kind of indene and an indene derivative represented by the general formula (I) bonds to a side chain of a polymer comprising a monomer copolymerizable with styrene or a styrene derivative.
    Type: Grant
    Filed: June 27, 2000
    Date of Patent: May 31, 2005
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Yukihiko Yamashita, Shuichi Iwata, Tetsuo Yamanaka, Akihiro Yoshida, Keiko Ushikubo
  • Low-hygroscopicity low-birefringence resin compositions, molding material, sheet or film obtained therefrom, and optical part
    Publication number: 20040220342
    Abstract: Low-hygroscopicity low-birefringence resin compositions. One of the compositions is a resin composition (a) comprising the following polymers (A), and (B) and/or (C). Another is a resin composition (b) comprising the following polymers (A), (B) and (H). Still another is a polymer comprising the following polymers (I) and (J), diphenylsilicone (D), and a phenolic antioxidant (E). (A) A polymer comprising one or more kinds of indene and indene derivatives represented by the following general formula (I). (B) A polymer comprising polystyrene or a polystyrene derivative. (C) A polymer comprising a monomer copolymerizable with styrene or a styrene derivative. (H) A graft polymer having a structure wherein a polymer comprising at least one kind of indene and an indene derivative represented by the general formula (I) bonds to a side chain of a polymer comprising a monomer copolymerizable with styrene or a styrene derivative.
    Type: Application
    Filed: May 17, 2004
    Publication date: November 4, 2004
    Inventors: Yukihiko Yamashita, Shuichi Iwata, Tetsuo Yamanaka, Akihiro Yoshida, Keiko Ushikubo