Abstract: Provided is an absorption column for body fluid purification by which the saturated adsorption amount of a substance to be adsorbed can be increased or the time required for reaching the saturated adsorption can be shortened, and therefore, the column capacity can be considerably reduced and the treatment time can be considerably shortened. The adsorption column having functional groups 6 specifically binding to a substance to be adsorbed including at least low density lipoprotein, immobilized on the surface of a porous support 5.

Abstract: In the production of semiconductor devices, a pattern-wise exposed resist coating is developed with a developer to form a resist pattern corresponding to the pattern of exposure radiation on an article to be fabricated. The development being carried out with a developer consisting of one or more organic solvents, in at least two stages and in each stage of the development, the development is interrupted when a substantial permeation of the developer of a surface portion of the pattern-forming area of the resist pattern in which the resist pattern remains is completed, and the developed resist coating is dried between this stage and the following development stages. The development of the exposed resist coating is carried out by using a developing apparatus which comprises at least one set of developer-supplying system and rinsing solution-supplying system, and a conveyor means for guiding the article carrying the resist coating.

Abstract: An electroconductive pattern is formed by coating a substrate with a solution comprising 100 parts by weight of a soluble electroconductive polymer containing an organic radical capable of cross-linking with a cross-linking agent, 5 to 1,000 parts by weight of a cross-linking agent, and 100 to 100,000 parts by weight of a solvent; effecting cross-linking of the resultant coated film to obtain a cured electroconductive film having a sheet resistance of 10.sup.10 .OMEGA./.quadrature. or less; forming a pattern as an upper layer on the cured electroconductive layer; and transferring the pattern of the upper layer to the cured electroconductive layer.

Abstract: A composition for forming a conductivity imparting agent comprising:(a) 0.1 to 20 parts by weight of sulfonated polyaniline having a content of a sulfonic acid group of 20 to 80% with respect to an aromatic ring of the sulfonated polyaniline;(b) 100 parts by weight of a solvent;(c) 0.01 to 10 parts by weight of an amine and/or quaternary ammonium salt; and(d) 0.001 to 100 parts by weight of at least one kind of a sulfonic acid group-containing component selected from the following (A) and (B);(A) compounds having a sulfonic acid group; and(B) polymers having a sulfonic acid group.

Abstract: In the production of semiconductor devices, a pattern-wise exposed resist coating is developed with a developer to form a resist pattern corresponding to the pattern of exposure radiation on an article to be fabricated. The development being carried out with a developer consisting of one or more organic solvents, in at least two stages and in each stage of the development, the development is interrupted when a substantial permeation of the developer of a surface portion of the pattern-forming area of the resist pattern in which the resist pattern remains is completed, and the developed resist coating is dried between this stage and the following development stages. The development of the exposed resist coating is carried out by using a developing apparatus which comprises at least one set of developer-supplying system and rinsing solution-supplying system, and a conveyor means for guiding the article carrying the resist coating.

Abstract: A composition for irradiation with an ionizing radiation, characterized by comprising: (a) 0.01 to 30 parts by weight of a soluble aniline polymer which comprises one or both of the repeating units represented by the following general formulae (1) and (2), said repeating units being included at least 80% of the total repeating units, possesses a weight average molecular weight of not less than 10,000, and is solid at room temperature; and (b) 100 parts by weight of a solvent, ##STR1## wherein R.sup.1 to R.sup.4 represent an electron-donating group, Y.sup.1 to Y.sup.4 represent --SO.sub.3 -- or --COO--, and M.sup.1 to M.sup.4 represent a hydrogen ion, an ammonium ion, an a1kyl ammonium ion with 1 to 8 carbon atoms, an aromatic ammonium ion, or a quaternary ion of an aromatic heterocyclic ring.

Abstract: A composition for forming an electrically conductive layer which is used in patterning of a resist with electric charge beam, which comprises:(a) 0.1 to 20 parts by weight of sulfonated polyanilines with a sulfonic group content ranging from 20 to 80% based on the aromatic ring, the sulfonated polyaniline having a weight average molecular weight of 500 to 100,000 and a molecular weight dispersion of not more than 5,(b) 100 parts by weight of a solvent, and(c) 0.01 to 30 parts by weight of amines and/or quaternary ammonium salts,and if desired, it further comprises 0 to 200 parts by weight of the following substance(s) (A) and/or (B) as component (d):(A) a high molecular weight compound soluble in the aforesaid solvent (b),(B) a surface active agent.

Abstract: A composition for forming an electrically conductive layer which is used in patterning of a resist with electric charge beam, which comprises:(a) 0.1 to 20 parts by weight of sulfonated polyanilines with a sulfonic group content ranging from 20 to 80% based on the aromatic ring, the sulfonated polyaniline having a weight average molecular weight of 500 to 100,000 and a molecular weight dispersion of not more than 5,(b) 100 parts by weight of a solvent, and(c) 0.01 to 30 parts by weight of amines and/or quaternary ammonium salts,and if desired, it further comprises 0 to 200 parts by weight of the following substance(s) (A) and/or (B) as component (d):(A) a high molecular weight compound soluble in the aforesaid solvent (b),(B) a surface active agent.

Abstract: An electron beam exposure data processing method includes the steps of inputting exposure data relating to a pattern to be written, and determining whether or not the pattern should be subjected to a framing process. The method further includes performing the framing process when it is determined that the pattern should be subjected to the framing process so that the pattern is partitioned into a frame pattern and an inner pattern surrounded by the frame pattern, reducing the inner pattern by a reduction rate to thereby generate a reduced inner pattern, and determining an exposure dose for the frame pattern and an exposure dose for the reduced inner pattern. There are also provided an electron beam exposure method which employs the electron beam exposure data processing method and an apparatus implementing the same.

Abstract: A pattern-forming method using an electroconductive composition comprising at least one TCNQ complex salt selected from the group consisting of isoquinolinium-TCNQ complex salts, quinolinium-TCNQ complex salts, alkyl pyridinium-TCNQ complex salts, and morpholinium-TCNQ complex salts, a specific polymer, and a solvent are disclosed. This composition gives an electroconductive film having a superior long-term storage stability and electroconductive characteristics.When this electroconductive composition is coated on a resist to form an electroconductive film, and a pattern is formed by an irradiation with charging beams, such as electron beams, an accumulation of charges (charge-up) is prevented and a fine resist pattern in which a misregistration is completely prevented is obtained.