Abstract: A fiber laser processing device includes: an air purge unit having a low-dew-pointizer section for changing compressed air for purging supplied from the exterior into dry air with a low dew point by means of a gas separation membrane module; a fiber laser oscillator having a combiner for combining and emitting the laser lights respectively outputted from the plurality of fiber laser modules to the exterior, and a distributor for distributing and supplying the dry air respectively to the plurality of fiber laser modules; and a laser processing machine for carrying out laser machining on a workpiece by means of the laser lights emitted from the combiner.

Abstract: A fiber laser processing device includes: an air purge unit having a low-dew-pointizer section for changing compressed air for purging supplied from the exterior into dry air with a low dew point by means of a gas separation membrane module; a fiber laser oscillator having a combiner for combining and emitting the laser lights respectively outputted from the plurality of fiber laser modules to the exterior, and a distributor for distributing and supplying the dry air respectively to the plurality of fiber laser modules; and a laser processing machine for carrying out laser machining on a workpiece by means of the laser lights emitted from the combiner.

Abstract: [Problem to be Solved] When a wood raw material is heat-pressed in order to produce a woody material or woody board, steam is generated in an interior of the wood raw material. The heat-pressed wood raw material is then decompressed with the steam staying in the interior of the wood raw material. This causes a puncture or a rupture of the woody material. The puncture occurs in the last phase of the production process, thus spoiling the entire production process. In order to avoid the puncture, the wood raw material needs to be dried completely. This requires a large amount of energy.

Abstract: A phase-shift mask including a transparent substrate, and a light-shielding film formed on the transparent substrate and provided with first apertures and second apertures which are alternately arranged. The transparent substrate is partially removed through the second apertures to form a recessed portion having a predetermined depth. Light transmitted through the first apertures and light transmitted through the second apertures are enabled to alternately invert in phase thereof. This phase-shift mask is characterized in that a phase shift of transmitted light is set in conformity with a pitch between an edge of the first aperture and an edge of the second aperture of the light-shielding film.

Abstract: [Problem to be Solved] When a wood raw material is heat-pressed in order to produce a woody material or woody board, steam is generated in an interior of the wood raw material. The heat-pressed wood raw material is then decompressed with the steam staying in the interior of the wood raw material. This causes a puncture or a rupture of the woody material. The puncture occurs in the last phase of the production process, thus spoiling the entire production process. In order to avoid the puncture, the wood raw material needs to be dried completely. This requires a large amount of energy.

Abstract: A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The shifter openings and the non-shifter openings repetitively exist in the mask. The shifter openings invert a phase of transmitted light. The Levenson type phase shift mask has a light shielding portions pattern interposed from both sides between the adjacent openings of the same kind. The light shielding portions pattern is subjected to bias correction which expands the light shielding portions pattern to both sides thereof in a predetermined amount with respect to a predetermined design line width set by a design of the mask.

Abstract: A phase-shift mask including a transparent substrate, and a light-shielding film formed on the transparent substrate and provided with first apertures and second apertures which are alternately arranged. The transparent substrate is partially removed through the second apertures to form a recessed portion having a predetermined depth. Light transmitted through the first apertures and light transmitted through the second apertures are enabled to alternately invert in phase thereof. This phase-shift mask is characterized in that a phase shift of transmitted light is set in conformity with a pitch between an edge of the first aperture and an edge of the second aperture of the light-shielding film.

Abstract: A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The shifter openings and the non-shifter openings repetitively exist in the mask. The shifter openings invert a phase of transmitted light. The Levenson type phase shift mask has a light shielding portions pattern interposed from both sides between the adjacent openings of the same kind. The light shielding portions pattern is subjected to bias correction which expands the light shielding portions pattern to both sides thereof in a predetermined amount with respect to a predetermined design line width set by a design of the mask.