Patents by Inventor Keisuke Ebata

Keisuke Ebata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • .alpha.-diazoacetoacetates and photosensitive resin compositions containing the same
    Patent number: 5158855
    Abstract: An .alpha.-diazoacetoacetic acid ester derived from cholic acid, deoxycholic acid, lithocholic acid or a derivative thereof is effective as a sensitizer in a photosensitive resin composition containing an alkali-soluble resin to form a resist for lithography using KrF excimer laser.
    Type: Grant
    Filed: September 22, 1988
    Date of Patent: October 27, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Hisashi Sugiyama, Kazuo Nate, Akiko Mizushima, Keisuke Ebata