Patents by Inventor Keisuke ENDOU

Keisuke ENDOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260153648
    Abstract: Provided is an antireflective member capable of improving scratch resistance. An antireflective member having a low refractive index layer on an optically transmissive substrate, the low refractive index layer containing a binder resin and hollow particles, wherein the antireflective member satisfies the following condition 1. <condition 1> In a region of 5 ?m×5 ?m on a surface of the antireflective member on a side having the low refractive index layer with respect to the optically transmissive substrate, spatial frequency analysis of elevation is performed to calculate power spectrum intensity of elevation for each wavelength; when a sum of power spectrum intensity of elevation for each wavelength is calculated and the sum is normalized to 1, the power spectrum intensity P1 of elevation at a wavelength of 1.25 ?m is 0.015 or more.
    Type: Application
    Filed: January 23, 2026
    Publication date: June 4, 2026
    Inventors: Sho SUZUKI, Yoshinari MATSUDA, Atsushi HORII, Noriaki KAWAKITA, Keisuke ENDOU
  • Patent number: 12560744
    Abstract: Provided is an antireflective member capable of improving scratch resistance. An antireflective member having a low refractive index layer on an optically transmissive substrate, the low refractive index layer containing a binder resin and hollow particles, wherein the antireflective member satisfies the following condition 1. <condition 1> In a region of 5 ?m×5 ?m on a surface of the antireflective member on a side having the low refractive index layer with respect to the optically transmissive substrate, spatial frequency analysis of elevation is performed to calculate power spectrum intensity of elevation for each wavelength; when a sum of power spectrum intensity of elevation for each wavelength is calculated and the sum is normalized to 1, the power spectrum intensity P1 of elevation at a wavelength of 1.25 ?m is 0.015 or more.
    Type: Grant
    Filed: July 13, 2021
    Date of Patent: February 24, 2026
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Sho Suzuki, Yoshinari Matsuda, Atsushi Horii, Noriaki Kawakita, Keisuke Endou
  • Publication number: 20250189696
    Abstract: To provide an antireflection member which not only has a low reflectance, but also is enhanced in scratch resistance, and an image display device comprising the antireflection member. An antireflection member 100 comprising a low refractive index layer 130 on a transparent substrate 110, in which the low refractive index layer 130 includes a binder resin and silica particles 132 and 134, a ratio of Si element attributed to the silica particles, obtained by analysis of a surface region of the low refractive index layer 130 by X-ray photoelectron spectroscopy, is 10.0 atomic percent or more and 18.0 atomic percent or less and a ratio of C element under the assumption that the ratio of Si element is defined to be 100 atomic percent is 180 atomic percent or more and 500 atomic percent or less.
    Type: Application
    Filed: February 25, 2025
    Publication date: June 12, 2025
    Inventors: Tatsuya KOZAKAI, Tomoyuki HORIO, Michiaki TAKEI, Osamu WATANABE, Keisuke ENDOU, Takanobu TADAKI, Kio MIZUNO, Atsushi WASHIO, Keita IWAHARA, Sho SUZUKI
  • Patent number: 12265203
    Abstract: To provide an antireflection member which not only has a low reflectance, but also is enhanced in scratch resistance, and an image display device comprising the antireflection member. An antireflection member 100 comprising a low refractive index layer 130 on a transparent substrate 110, in which the low refractive index layer 130 includes a binder resin and silica particles 132 and 134, a ratio of Si element attributed to the silica particles, obtained by analysis of a surface region of the low refractive index layer 130 by X-ray photoelectron spectroscopy, is 10.0 atomic percent or more and 18.0 atomic percent or less and a ratio of C element under the assumption that the ratio of Si element is defined to be 100 atomic percent is 180 atomic percent or more and 500 atomic percent or less.
    Type: Grant
    Filed: January 10, 2020
    Date of Patent: April 1, 2025
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Tatsuya Kozakai, Tomoyuki Horio, Michiaki Takei, Osamu Watanabe, Keisuke Endou, Takanobu Tadaki, Kio Mizuno, Atsushi Washio, Keita Iwahara, Sho Suzuki
  • Publication number: 20230258845
    Abstract: Provided is an antireflective member capable of improving scratch resistance. An antireflective member having a low refractive index layer on an optically transmissive substrate, the low refractive index layer containing a binder resin and hollow particles, wherein the antireflective member satisfies the following condition 1. <condition 1> In a region of 5 ?m×5 ?m on a surface of the antireflective member on a side having the low refractive index layer with respect to the optically transmissive substrate, spatial frequency analysis of elevation is performed to calculate power spectrum intensity of elevation for each wavelength; when a sum of power spectrum intensity of elevation for each wavelength is calculated and the sum is normalized to 1, the power spectrum intensity P1 of elevation at a wavelength of 1.25 ?m is 0.015 or more.
    Type: Application
    Filed: July 13, 2021
    Publication date: August 17, 2023
    Inventors: Sho SUZUKI, Yoshinari MATSUDA, Atsushi HORII, Noriaki KAWAKITA, Keisuke ENDOU
  • Publication number: 20220091303
    Abstract: To provide an antireflection member which not only has a low reflectance, but also is enhanced in scratch resistance, and an image display device comprising the antireflection member. An antireflection member 100 comprising a low refractive index layer 130 on a transparent substrate 110, in which the low refractive index layer 130 includes a binder resin and silica particles 132 and 134, a ratio of Si element attributed to the silica particles, obtained by analysis of a surface region of the low refractive index layer 130 by X-ray photoelectron spectroscopy, is 10.0 atomic percent or more and 18.0 atomic percent or less and a ratio of C element under the assumption that the ratio of Si element is defined to be 100 atomic percent is 180 atomic percent or more and 500 atomic percent or less.
    Type: Application
    Filed: January 10, 2020
    Publication date: March 24, 2022
    Inventors: Tatsuya KOZAKAI, Tomoyuki HORIO, Michiaki TAKEI, Osamu WATANABE, Keisuke ENDOU, Takanobu TADAKI, Kio MIZUNO, Atsushi WASHIO, Keita IWAHARA, Sho SUZUKI