Abstract: An ionizer disposed in an ionization chamber separated from an analysis chamber by a partition provided with an ion introduction port, the ionizer including: an electrospray ionization probe 111 configured to charge and nebulize a liquid sample as charged droplets, the electrospray ionization probe being disposed such that a nebulization axis is orthogonal to a central axis of the ion introduction port; and a heated gas supply mechanism configured to blow a heated gas to a position between a tip of the electrospray ionization probe and an intersection point X of the nebulization axis and the central axis, where the position is separated from the tip by a predetermined distance or more.

Abstract: In an ionization device for an ionization chamber (11) separated from an analysis chamber (12-14) by a partition wall having an ion introduction port (113), an ionization probe (111) sprays a liquid sample. A heated-gas supply mechanism (112), which includes a gas supply source and a heating section (1122) for heating a gas supplied from the gas supply source, expels the gas in a direction intersecting with the direction in which the liquid sample is sprayed from the ionization probe. A controller (32) controls an operation of the heated-gas supply mechanism so that the gas is continuously expelled from the heated-gas supply mechanism regardless of the presence or absence of an operation by a user while the liquid sample is sprayed from the ionization probe. The continuous expulsion of the gas from the heated-gas supply mechanism prevents this mechanism from being contaminated by the sprayed liquid.

Abstract: An ionizer disposed in an ionization chamber separated from an analysis chamber by a partition provided with an ion introduction port, the ionizer including: an electrospray ionization probe 111 configured to charge and nebulize a liquid sample as charged droplets, the electrospray ionization probe being disposed such that a nebulization axis is orthogonal to a central axis of the ion introduction port; and a heated gas supply mechanism configured to blow a heated gas to a position between a tip of the electrospray ionization probe and an intersection point X of the nebulization axis and the central axis, where the position is separated from the tip by a predetermined distance or more.

Abstract: In an ionization device for an ionization chamber (11) separated from an analysis chamber (12-14) by a partition wall having an ion introduction port (113), an ionization probe (111) sprays a liquid sample. A heated-gas supply mechanism (112), which includes a gas supply source and a heating section (1122) for heating a gas supplied from the gas supply source, expels the gas in a direction intersecting with the direction in which the liquid sample is sprayed from the ionization probe. A controller (32) controls an operation of the heated-gas supply mechanism so that the gas is continuously expelled from the heated-gas supply mechanism regardless of the presence or absence of an operation by a user while the liquid sample is sprayed from the ionization probe. The continuous expulsion of the gas from the heated-gas supply mechanism prevents this mechanism from being contaminated by the sprayed liquid.

Abstract: A column oven that may enable a heat block to provide the best temperature distribution, and increase temperature evenness of a column is provided. In a column oven 400 that heats or cools a heat block 10 contacting a column 40 and adjusts temperature of the column 40 through heat transmission from the heat block 10, a plurality of temperature adjustment bodies 21 and 22 is separately disposed along the longitudinal direction of the heat block 10, and heats or cools the heat block 10, a plurality of temperature sensors 31 and 32 measuring the temperatures of the heat block 10 adjacent to the temperature adjustment bodies 21 and 22 is also disposed, and the corresponding temperature adjustment bodies 21 and 22 are controlled independently according to the temperatures measured by the temperature sensors 31 and 32.

Abstract: A column oven that may enable a heat block to provide the best temperature distribution, and increase temperature evenness of a column is provided. In a column oven 400 that heats or cools a heat block 10 contacting a column 40 and adjusts temperature of the column 40 through heat transmission from the heat block 10, a plurality of temperature adjustment bodies 21 and 22 is separately disposed along the longitudinal direction of the heat block 10, and heats or cools the heat block 10, a plurality of temperature sensors 31 and 32 measuring the temperatures of the heat block 10 adjacent to the temperature adjustment bodies 21 and 22 is also disposed, and the corresponding temperature adjustment bodies 21 and 22 are controlled independently according to the temperatures measured by the temperature sensors 31 and 32.